JP2021006903A5 - - Google Patents
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- JP2021006903A5 JP2021006903A5 JP2020110384A JP2020110384A JP2021006903A5 JP 2021006903 A5 JP2021006903 A5 JP 2021006903A5 JP 2020110384 A JP2020110384 A JP 2020110384A JP 2020110384 A JP2020110384 A JP 2020110384A JP 2021006903 A5 JP2021006903 A5 JP 2021006903A5
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- JP
- Japan
- Prior art keywords
- mask
- image
- focal
- focus
- imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000003384 imaging method Methods 0.000 description 65
- 238000000034 method Methods 0.000 description 46
- 230000003287 optical effect Effects 0.000 description 33
- 238000005286 illumination Methods 0.000 description 10
- 238000001459 lithography Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001393 microlithography Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 230000004075 alteration Effects 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 238000010606 normalization Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000003518 caustics Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102019117293.4A DE102019117293B3 (de) | 2019-06-27 | 2019-06-27 | Vorrichtung zur Vermessung von Masken für die Mikrolithographie und Autofokussierverfahren |
| DE102019117293.4 | 2019-06-27 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021006903A JP2021006903A (ja) | 2021-01-21 |
| JP2021006903A5 true JP2021006903A5 (https=) | 2022-04-26 |
| JP7382904B2 JP7382904B2 (ja) | 2023-11-17 |
Family
ID=72839203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020110384A Active JP7382904B2 (ja) | 2019-06-27 | 2020-06-26 | マイクロリソグラフィ用マスクを測定するためのデバイス、および自動合焦方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11647288B2 (https=) |
| JP (1) | JP7382904B2 (https=) |
| KR (1) | KR20210002345A (https=) |
| CN (1) | CN112147858B (https=) |
| DE (1) | DE102019117293B3 (https=) |
| TW (1) | TWI794612B (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102021128222B4 (de) * | 2021-10-29 | 2023-10-19 | Carl Zeiss Smt Gmbh | Verfahren zur Vermessung eines Substrates für die Halbleiterlithografie |
| DE102023119683B4 (de) * | 2023-07-25 | 2025-12-18 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Lage einer Objektoberfläche |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6677565B1 (en) * | 1998-08-18 | 2004-01-13 | Veeco Tucson Inc. | High speed autofocus and tilt for an optical imaging system |
| US6124924A (en) * | 1998-12-24 | 2000-09-26 | Applied Materials, Inc. | Focus error correction method and apparatus |
| JP3688185B2 (ja) * | 2000-05-08 | 2005-08-24 | 株式会社東京精密 | 焦点検出装置及び自動焦点顕微鏡 |
| DE10153113A1 (de) * | 2001-08-15 | 2003-03-13 | Aglaia Ges Fuer Bildverarbeitu | Verfahren und Vorrichtung zur Entfernungsbestimmung |
| US6688565B1 (en) | 2002-10-01 | 2004-02-10 | Kupo Co., Ltd. | Multi-leg stand |
| US7142315B1 (en) * | 2004-01-16 | 2006-11-28 | Kla-Tencor Technologies Corporation | Slit confocal autofocus system |
| JP2009031169A (ja) | 2007-07-28 | 2009-02-12 | Nikon Corp | 位置検出装置、露光装置、及びデバイスの製造方法 |
| US9229209B2 (en) * | 2008-01-21 | 2016-01-05 | Carl Zeiss Smt Gmbh | Autofocus device and autofocusing method for an imaging device |
| WO2009093594A1 (ja) * | 2008-01-24 | 2009-07-30 | Nikon Corporation | 面位置検出装置、露光装置、およびデバイス製造方法 |
| JP5498044B2 (ja) | 2009-03-26 | 2014-05-21 | 株式会社東芝 | 自動焦点調節機構及び光学画像取得装置 |
| JP5757099B2 (ja) * | 2010-02-15 | 2015-07-29 | 株式会社ニコン | 焦点調節装置、及び焦点調節プログラム |
| JP5293782B2 (ja) * | 2011-07-27 | 2013-09-18 | 三星ダイヤモンド工業株式会社 | 合焦位置調整方法、合焦位置調整装置、およびレーザー加工装置 |
| DE102011082414A1 (de) | 2011-09-09 | 2013-03-14 | Carl Zeiss Sms Gmbh | Autofokuseinrichtung und Autofokussierverfahren für eine Abbildungsvorrichtung |
| DE102012223128B4 (de) | 2012-12-13 | 2022-09-01 | Carl Zeiss Microscopy Gmbh | Autofokusverfahren für Mikroskop und Mikroskop mit Autofokuseinrichtung |
| DE102014114864B4 (de) * | 2014-10-14 | 2016-06-02 | Carl Zeiss Sms Gmbh | Verfahren und Vorrichtung zum Ermitteln eines lateralen Versatzes eines Musters auf einem Substrat relativ zu einer Sollposition |
| CN106772923B (zh) | 2015-11-24 | 2021-01-01 | 睿励科学仪器（上海）有限公司 | 基于倾斜狭缝的自动对焦方法和系统 |
| DE102016120730A1 (de) | 2016-10-31 | 2018-02-08 | Carl Zeiss Smt Gmbh | Autofokussiereinrichtung für eine Abbildungsvorrichtung sowie Autofokussierverfahren |
| JP7079569B2 (ja) * | 2017-04-21 | 2022-06-02 | 株式会社ニューフレアテクノロジー | 検査方法 |
-
2019
- 2019-06-27 DE DE102019117293.4A patent/DE102019117293B3/de active Active
-
2020
- 2020-06-24 TW TW109121561A patent/TWI794612B/zh active
- 2020-06-24 CN CN202010593805.7A patent/CN112147858B/zh active Active
- 2020-06-26 KR KR1020200078351A patent/KR20210002345A/ko not_active Ceased
- 2020-06-26 JP JP2020110384A patent/JP7382904B2/ja active Active
- 2020-06-26 US US16/912,837 patent/US11647288B2/en active Active
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