JP2020536030A - 原子層の研磨方法及びそのための研磨装置 - Google Patents
原子層の研磨方法及びそのための研磨装置 Download PDFInfo
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- 238000005498 polishing Methods 0.000 title claims abstract description 81
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000012495 reaction gas Substances 0.000 claims abstract description 101
- 239000007789 gas Substances 0.000 claims abstract description 46
- 239000011261 inert gas Substances 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 10
- 230000001678 irradiating effect Effects 0.000 claims abstract description 6
- 238000002347 injection Methods 0.000 claims description 47
- 239000007924 injection Substances 0.000 claims description 47
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 37
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 35
- 150000002500 ions Chemical class 0.000 claims description 31
- 229910052731 fluorine Inorganic materials 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 230000007935 neutral effect Effects 0.000 claims description 2
- 238000007517 polishing process Methods 0.000 claims description 2
- 229910052724 xenon Inorganic materials 0.000 claims description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 2
- 238000010586 diagram Methods 0.000 abstract description 6
- 238000005259 measurement Methods 0.000 abstract description 4
- 125000004429 atom Chemical group 0.000 description 28
- 238000005530 etching Methods 0.000 description 18
- OBOXTJCIIVUZEN-UHFFFAOYSA-N [C].[O] Chemical compound [C].[O] OBOXTJCIIVUZEN-UHFFFAOYSA-N 0.000 description 12
- 230000003746 surface roughness Effects 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000010926 purge Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical group O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 229910003923 SiC 4 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007519 figuring Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract
Description
Claims (21)
- 原子層の研磨方法において、
試料の表面をスキャンして前記試料表面のピーク位置を測定するステップと、
前記試料の材料の成分である第1の原子と結合することができる第1の反応ガスを前記測定されたピークの位置に向けて噴射して、前記ピークの表面に前記第1の反応ガスが前記第1の原子と結合した第1の反応ガス層を形成するステップと、及び
前記第1の反応ガス層が蒸着された前記ピーク位置にエネルギーをかけて、前記第1の反応ガスと結合された前記第1の原子を前記試料から分離させるステップとを含むことを特徴とする、前記原子層の研磨方法。 - 前記試料がお互いに異なる二つの元素を含む材料である場合、前記第1の反応ガスは、前記試料の第1の原子と結合するガスとして、前記第1の原子以外の他の原子より第1の原子と結合率が高いガスであり、前記第1の原子を分離するステップの後に、前記試料の材料の成分である第2の原子と結合することができるガスとして、前記第2の原子以外の他の原子より第2の原子と結合率が高いガスを前記測定されたピークの位置に向けて噴射して、前記ピークの表面に前記第2の反応ガスが前記第2の原子と結合した第2の反応ガス層を形成するステップと、及び
前記第2の反応ガス層が蒸着された前記ピーク位置にエネルギーをかけて、前記第2の反応ガスと結合された前記第2の原子を前記試料から分離させるステップとを含むことを特徴とする
請求項1に記載の原子層の研磨方法。 - 前記第1の反応ガス層から前記第2の原子の分離ステップを繰り返して、平坦化の精度を増加させることを含むことを特徴とする
請求項2に記載の原子層の研磨方法。 - 前記第1の原子を分離するステップと前記第2の反応ガス層を形成するステップとの間に、前記試料に残っている第1の反応ガス層を除去するステップを含むことを特徴とする
請求項2に記載の原子層の研磨方法。 - 前記第1の原子を分離するステップと前記第2の反応ガス層を形成するステップとの間に、前記試料に残っている第1の反応ガス層を除去するステップを含み、及び
前記第2の原子を分離するステップと前記第1の反応ガス層を形成するステップとの間に、前記試料に残っている第2の反応ガス層を除去するステップを含むことを特徴とする
請求項3に記載の原子層の研磨方法。 - 前記複数の反応ガス層を除去するステップは、前記複数の反応ガスと反応することができるガスのプラズマを照射することを含むことを特徴とする
請求項4または請求項5に記載の原子層の研磨方法。 - 前記第1の反応ガス及び第2の反応ガスは、前記第1の原子及び第2の原子とそれぞれ結合して揮発性気体を形成することができるガスであることを特徴とする
請求項1または請求項2に記載の原子層の研磨方法。 - 前記エネルギーをかけるには、不活性ガスのイオンを照射することを特徴とする
請求項1または請求項2に記載の原子層の研磨方法。 - 前記不活性ガスのイオンの照射は、スパッタリングされない程度のエネルギーで行われることを特徴とする
請求項8に記載の原子層の研磨方法。 - 前記不活性ガスのイオンの照射エネルギーは、1〜100 eVであることを特徴とする
請求項9に記載の原子層の研磨方法。 - 前記不活性ガスは、アルゴン、ヘリウム、及びキセノン中のいずれかの一つを含むガスであることを特徴とする
請求項8に記載の原子層の研磨方法。 - 前記エネルギーをかけるには、電子を照射することを特徴とする、
請求項1または請求項2に記載の原子層の研磨方法。 - 前記エネルギーをかけるには、光エネルギーを照射することを特徴とする、
請求項1または請求項2に記載の原子層の研磨方法。 - 前記エネルギーは、不活性ガスの中性粒子を照射することを特徴とする、
請求項1または請求項2に記載の原子層の研磨方法。 - 前記試料の原子と結合された反応ガスのみ残るように前記反応ガス層の形成後、チャンバーを排気させるステップを含むことを特徴とする、
請求項1または請求項2に記載の原子層の研磨方法。 - 請求項2の原子層の研磨方法によるシリコンカーバイドの平坦化方法において、
前記試料は、シリコンカーバイドであり、
前記第1の反応ガスは、フッ素を含むガスであり、
前記第2の反応ガスは、酸素であることを特徴とする、前記シリコンカーバイドの平坦化方法。 - 前記フッ素を含むガスによるステップを開始すると、前記酸素によるステップを実行することを特徴とする
請求項16に記載のシリコンカーバイドの平坦化方法。 - 請求項1の原子層研磨のための装置において、
前記試料が位置するチャンバーと、
前記チャンバー内部を真空状態に維持するか、前記試料の原子と結合された反応ガスのみ残るように前記反応ガス層の形成後、チャンバーを排気させるように構成されるポンプを含む前記試料の表面をスキャンして前記試料表面のピーク位置を測定する試料スキャン部と、及び
前記試料の表面に向けて、前記反応ガス及び前記エネルギーを伝達するように構成される噴射部を含むことを特徴とする、前記原子層研磨のための装置。 - 前記噴射部は、エネルギー伝達ノズル及び前記反応ガス噴射ノズルを含むことを特徴とする
請求項18に記載の原子層研磨のための装置。 - 前記噴射部は、前記試料に残っている反応ガス層を除去するための前記複数の反応ガスと反応することができるガスのプラズマ照射手段を含むことを特徴とする
請求項18に記載の原子層研磨のための装置。 - 前記噴射部は、前記ピーク点に移動するために、x軸、y軸、及びz軸に沿って移動可能であり、垂直方向を基準にθの角度に傾いられるように構成されることを特徴とする
請求項18に記載の原子層研磨のための装置。
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