JP2020529702A5 - - Google Patents

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Publication number
JP2020529702A5
JP2020529702A5 JP2020503802A JP2020503802A JP2020529702A5 JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5 JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5
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JP
Japan
Prior art keywords
electron beam
lens
electrostatic
electron
source
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JP2020503802A
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English (en)
Japanese (ja)
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JP2020529702A (ja
JP7116154B2 (ja
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Priority claimed from US15/666,666 external-priority patent/US10096447B1/en
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Publication of JP2020529702A5 publication Critical patent/JP2020529702A5/ja
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JP2020503802A 2017-08-02 2018-07-24 高解像度の電子ビーム装置 Active JP7116154B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/666,666 2017-08-02
US15/666,666 US10096447B1 (en) 2017-08-02 2017-08-02 Electron beam apparatus with high resolutions
PCT/US2018/043353 WO2019027714A1 (en) 2017-08-02 2018-07-24 HIGH RESOLUTION ELECTRON BEAM APPARATUS

Publications (3)

Publication Number Publication Date
JP2020529702A JP2020529702A (ja) 2020-10-08
JP2020529702A5 true JP2020529702A5 (cg-RX-API-DMAC7.html) 2021-08-26
JP7116154B2 JP7116154B2 (ja) 2022-08-09

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ID=63685156

Family Applications (1)

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JP2020503802A Active JP7116154B2 (ja) 2017-08-02 2018-07-24 高解像度の電子ビーム装置

Country Status (9)

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US (1) US10096447B1 (cg-RX-API-DMAC7.html)
EP (1) EP3662326A4 (cg-RX-API-DMAC7.html)
JP (1) JP7116154B2 (cg-RX-API-DMAC7.html)
KR (1) KR102363263B1 (cg-RX-API-DMAC7.html)
CN (1) CN111051985B (cg-RX-API-DMAC7.html)
IL (1) IL272051B2 (cg-RX-API-DMAC7.html)
SG (1) SG11202000608VA (cg-RX-API-DMAC7.html)
TW (1) TWI751362B (cg-RX-API-DMAC7.html)
WO (1) WO2019027714A1 (cg-RX-API-DMAC7.html)

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US11830699B2 (en) * 2021-07-06 2023-11-28 Kla Corporation Cold-field-emitter electron gun with self-cleaning extractor using reversed e-beam current
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US11664186B1 (en) * 2022-08-07 2023-05-30 Borries Pte. Ltd. Apparatus of electron beam comprising pinnacle limiting plate and method of reducing electron-electron interaction

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