JP2020529702A5 - - Google Patents

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Publication number
JP2020529702A5
JP2020529702A5 JP2020503802A JP2020503802A JP2020529702A5 JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5 JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020503802 A JP2020503802 A JP 2020503802A JP 2020529702 A5 JP2020529702 A5 JP 2020529702A5
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JP
Japan
Prior art keywords
electron beam
lens
electrostatic
electron
source
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JP2020503802A
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English (en)
Japanese (ja)
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JP7116154B2 (ja
JP2020529702A (ja
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Priority claimed from US15/666,666 external-priority patent/US10096447B1/en
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Publication of JP2020529702A5 publication Critical patent/JP2020529702A5/ja
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JP2020503802A 2017-08-02 2018-07-24 高解像度の電子ビーム装置 Active JP7116154B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/666,666 2017-08-02
US15/666,666 US10096447B1 (en) 2017-08-02 2017-08-02 Electron beam apparatus with high resolutions
PCT/US2018/043353 WO2019027714A1 (en) 2017-08-02 2018-07-24 HIGH RESOLUTION ELECTRON BEAM APPARATUS

Publications (3)

Publication Number Publication Date
JP2020529702A JP2020529702A (ja) 2020-10-08
JP2020529702A5 true JP2020529702A5 (cg-RX-API-DMAC7.html) 2021-08-26
JP7116154B2 JP7116154B2 (ja) 2022-08-09

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ID=63685156

Family Applications (1)

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JP2020503802A Active JP7116154B2 (ja) 2017-08-02 2018-07-24 高解像度の電子ビーム装置

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US (1) US10096447B1 (cg-RX-API-DMAC7.html)
EP (1) EP3662326A4 (cg-RX-API-DMAC7.html)
JP (1) JP7116154B2 (cg-RX-API-DMAC7.html)
KR (1) KR102363263B1 (cg-RX-API-DMAC7.html)
CN (1) CN111051985B (cg-RX-API-DMAC7.html)
IL (1) IL272051B2 (cg-RX-API-DMAC7.html)
SG (1) SG11202000608VA (cg-RX-API-DMAC7.html)
TW (1) TWI751362B (cg-RX-API-DMAC7.html)
WO (1) WO2019027714A1 (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12165838B2 (en) * 2018-12-14 2024-12-10 Kla Corporation Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
US11830699B2 (en) * 2021-07-06 2023-11-28 Kla Corporation Cold-field-emitter electron gun with self-cleaning extractor using reversed e-beam current
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US11664186B1 (en) * 2022-08-07 2023-05-30 Borries Pte. Ltd. Apparatus of electron beam comprising pinnacle limiting plate and method of reducing electron-electron interaction
WO2025203155A1 (ja) * 2024-03-25 2025-10-02 中和科学株式会社 荷電粒子源制御装置
CN120413392A (zh) * 2025-04-27 2025-08-01 电子科技大学 一种用于回旋波保护器的新型电子枪

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426583A (en) * 1982-05-10 1984-01-17 International Business Machines Corporation Electron beam potential switching apparatus
GB8401578D0 (en) 1984-01-19 1984-02-22 Cleaver J R A Ion and electron beam electrostatic and magnetic lens systems
US5493116A (en) * 1993-10-26 1996-02-20 Metrologix, Inc. Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices
EP0821393B1 (en) * 1996-07-25 1999-06-16 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Detector objective lens
US6664546B1 (en) 2000-02-10 2003-12-16 Kla-Tencor In-situ probe for optimizing electron beam inspection and metrology based on surface potential
WO2001060456A1 (en) 2000-02-19 2001-08-23 Ion Diagnostics, Inc. Multi-beam multi-column electron beam inspection system
TWI297167B (en) 2000-06-27 2008-05-21 Ebara Corp Inspection apparatus and inspection method
EP1271604A4 (en) 2001-01-10 2005-05-25 Ebara Corp APPARATUS AND METHOD FOR INSPECTING ELECTRON BEAM, AND DEVICE MANUFACTURING METHOD COMPRISING THE INSPECTION APPARATUS
US6897442B2 (en) 2003-04-25 2005-05-24 Applied Materials Israel, Ltd. Objective lens arrangement for use in a charged particle beam column
US7462848B2 (en) * 2003-10-07 2008-12-09 Multibeam Systems, Inc. Optics for generation of high current density patterned charged particle beams
JP2006216396A (ja) 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
WO2007055154A1 (ja) * 2005-11-08 2007-05-18 Advantest Corporation 電子銃、電子ビーム露光装置及び露光方法
JP4616180B2 (ja) * 2006-01-20 2011-01-19 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US7825386B2 (en) * 2006-10-25 2010-11-02 Hermes-Microvision, Inc. System and method for a charged particle beam
JP4685115B2 (ja) * 2007-02-20 2011-05-18 株式会社アドバンテスト 電子ビーム露光方法
KR101118698B1 (ko) * 2007-05-29 2012-03-12 전자빔기술센터 주식회사 시엔티 팁을 이용한 전자 칼럼 및 시엔티 팁을 정렬하는방법
US7821187B1 (en) * 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
KR100962243B1 (ko) * 2008-06-09 2010-06-11 한국기계연구원 포컬 렌스를 활용한 전자빔 전류 제어 장치 및 방법
WO2010070837A1 (ja) * 2008-12-16 2010-06-24 株式会社日立ハイテクノロジーズ 電子線装置およびそれを用いた電子線応用装置
WO2010132265A2 (en) * 2009-05-12 2010-11-18 Carl Zeiss Nts, Llc. Gas delivery in a microscope system
JP5063715B2 (ja) * 2010-02-04 2012-10-31 株式会社日立ハイテクノロジーズ 電子源，電子銃、それを用いた電子顕微鏡装置及び電子線描画装置
EP2492950B1 (en) * 2011-02-25 2018-04-11 FEI Company Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
US8664594B1 (en) 2011-04-18 2014-03-04 Kla-Tencor Corporation Electron-optical system for high-speed and high-sensitivity inspections
US8519333B2 (en) * 2011-05-03 2013-08-27 Hermes Microvision Inc. Charged particle system for reticle/wafer defects inspection and review
US8455838B2 (en) 2011-06-29 2013-06-04 Kla-Tencor Corporation Multiple-column electron beam apparatus and methods
JP5687157B2 (ja) * 2011-08-22 2015-03-18 株式会社日立ハイテクノロジーズ 電子銃、電界放出電子銃、荷電粒子線装置および透過型電子顕微鏡
US9053900B2 (en) * 2012-04-03 2015-06-09 Kla-Tencor Corporation Apparatus and methods for high-resolution electron beam imaging
US8859982B2 (en) 2012-09-14 2014-10-14 Kla-Tencor Corporation Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
EP2779204A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron gun arrangement
EP2801997B1 (en) 2013-05-06 2016-03-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam wafer inspection system and method for operation thereof
US9105440B2 (en) 2013-08-30 2015-08-11 Hermes Microvision, Inc. Apparatus of plural charged particle beams with multi-axis magnetic lens
US10056228B2 (en) * 2014-07-29 2018-08-21 Applied Materials Israel Ltd. Charged particle beam specimen inspection system and method for operation thereof
US9437395B2 (en) 2014-12-09 2016-09-06 Hermes Microvision Inc. Method and compound system for inspecting and reviewing defects
US9595417B2 (en) 2014-12-22 2017-03-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution charged particle beam device and method of operating the same

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