JP2020518990A5 - - Google Patents

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Publication number
JP2020518990A5
JP2020518990A5 JP2019560662A JP2019560662A JP2020518990A5 JP 2020518990 A5 JP2020518990 A5 JP 2020518990A5 JP 2019560662 A JP2019560662 A JP 2019560662A JP 2019560662 A JP2019560662 A JP 2019560662A JP 2020518990 A5 JP2020518990 A5 JP 2020518990A5
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JP
Japan
Prior art keywords
electron beam
limiting aperture
lens array
source
holes
Prior art date
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Pending
Application number
JP2019560662A
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English (en)
Japanese (ja)
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JP2020518990A (ja
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Publication date
Priority claimed from US15/587,720 external-priority patent/US10242839B2/en
Application filed filed Critical
Publication of JP2020518990A publication Critical patent/JP2020518990A/ja
Publication of JP2020518990A5 publication Critical patent/JP2020518990A5/ja
Priority to JP2022015515A priority Critical patent/JP7329637B2/ja
Pending legal-status Critical Current

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JP2019560662A 2017-05-05 2018-01-12 マルチビームカラムにおけるクーロン相互作用の低減 Pending JP2020518990A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022015515A JP7329637B2 (ja) 2017-05-05 2022-02-03 電子ビームシステム及び方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/587,720 US10242839B2 (en) 2017-05-05 2017-05-05 Reduced Coulomb interactions in a multi-beam column
US15/587,720 2017-05-05
PCT/US2018/013425 WO2018203936A1 (en) 2017-05-05 2018-01-12 Reduced coulomb interactions in a multi-beam column

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022015515A Division JP7329637B2 (ja) 2017-05-05 2022-02-03 電子ビームシステム及び方法

Publications (2)

Publication Number Publication Date
JP2020518990A JP2020518990A (ja) 2020-06-25
JP2020518990A5 true JP2020518990A5 (enExample) 2021-02-18

Family

ID=64014281

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019560662A Pending JP2020518990A (ja) 2017-05-05 2018-01-12 マルチビームカラムにおけるクーロン相互作用の低減
JP2022015515A Active JP7329637B2 (ja) 2017-05-05 2022-02-03 電子ビームシステム及び方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022015515A Active JP7329637B2 (ja) 2017-05-05 2022-02-03 電子ビームシステム及び方法

Country Status (7)

Country Link
US (1) US10242839B2 (enExample)
EP (1) EP3549154A4 (enExample)
JP (2) JP2020518990A (enExample)
KR (1) KR102352097B1 (enExample)
CN (1) CN110313048B (enExample)
IL (1) IL267815B (enExample)
WO (1) WO2018203936A1 (enExample)

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US11615938B2 (en) * 2019-12-20 2023-03-28 Nuflare Technology, Inc. High-resolution multiple beam source
US11984295B2 (en) 2020-01-06 2024-05-14 Asml Netherlands B.V. Charged particle assessment tool, inspection method
US12451319B2 (en) 2020-10-05 2025-10-21 Kla Corporation Electron source with magnetic suppressor electrode
US11699564B2 (en) * 2020-10-23 2023-07-11 Nuflare Technology, Inc. Schottky thermal field emitter with integrated beam splitter
US11869743B2 (en) * 2021-05-11 2024-01-09 Kla Corporation High throughput multi-electron beam system
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

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JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
CN101414534B (zh) 2002-10-30 2012-10-03 迈普尔平版印刷Ip有限公司 电子束曝光系统
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US7176459B2 (en) 2003-12-25 2007-02-13 Ebara Corporation Electron beam apparatus
ATE441202T1 (de) * 2004-05-17 2009-09-15 Mapper Lithography Ip Bv Belichtungssystem mit einem geladenen teilchenstrahl
EP2270833A3 (en) 2005-09-06 2011-01-26 Carl Zeiss SMT AG Particle-optical component
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JP5103033B2 (ja) * 2007-03-02 2012-12-19 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
US7821187B1 (en) * 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
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