CN110313048B - 在多射束柱中减少的库仑相互作用 - Google Patents

在多射束柱中减少的库仑相互作用 Download PDF

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Publication number
CN110313048B
CN110313048B CN201880009523.9A CN201880009523A CN110313048B CN 110313048 B CN110313048 B CN 110313048B CN 201880009523 A CN201880009523 A CN 201880009523A CN 110313048 B CN110313048 B CN 110313048B
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China
Prior art keywords
electron beam
lens array
limiting aperture
source
electron
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CN201880009523.9A
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English (en)
Chinese (zh)
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CN110313048A (zh
Inventor
A·D·布罗迪
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KLA Corp
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KLA Tencor Corp
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Publication of CN110313048A publication Critical patent/CN110313048A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0435—Multi-aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
  • Radiation-Therapy Devices (AREA)
  • Particle Accelerators (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN201880009523.9A 2017-05-05 2018-01-12 在多射束柱中减少的库仑相互作用 Active CN110313048B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/587,720 2017-05-05
US15/587,720 US10242839B2 (en) 2017-05-05 2017-05-05 Reduced Coulomb interactions in a multi-beam column
PCT/US2018/013425 WO2018203936A1 (en) 2017-05-05 2018-01-12 Reduced coulomb interactions in a multi-beam column

Publications (2)

Publication Number Publication Date
CN110313048A CN110313048A (zh) 2019-10-08
CN110313048B true CN110313048B (zh) 2021-03-12

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880009523.9A Active CN110313048B (zh) 2017-05-05 2018-01-12 在多射束柱中减少的库仑相互作用

Country Status (7)

Country Link
US (1) US10242839B2 (enExample)
EP (1) EP3549154A4 (enExample)
JP (2) JP2020518990A (enExample)
KR (1) KR102352097B1 (enExample)
CN (1) CN110313048B (enExample)
IL (1) IL267815B (enExample)
WO (1) WO2018203936A1 (enExample)

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US11615938B2 (en) * 2019-12-20 2023-03-28 Nuflare Technology, Inc. High-resolution multiple beam source
US11984295B2 (en) 2020-01-06 2024-05-14 Asml Netherlands B.V. Charged particle assessment tool, inspection method
US12451319B2 (en) 2020-10-05 2025-10-21 Kla Corporation Electron source with magnetic suppressor electrode
US11699564B2 (en) * 2020-10-23 2023-07-11 Nuflare Technology, Inc. Schottky thermal field emitter with integrated beam splitter
US11869743B2 (en) * 2021-05-11 2024-01-09 Kla Corporation High throughput multi-electron beam system
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

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CN101414533A (zh) * 2002-10-30 2009-04-22 迈普尔平版印刷Ip有限公司 电子束曝光系统
CN101496129A (zh) * 2006-07-25 2009-07-29 迈普尔平版印刷Ip有限公司 多光束带电粒子光学系统

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JP4647820B2 (ja) * 2001-04-23 2011-03-09 キヤノン株式会社 荷電粒子線描画装置、および、デバイスの製造方法
JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
JP4459568B2 (ja) * 2003-08-06 2010-04-28 キヤノン株式会社 マルチ荷電ビームレンズおよびそれを用いた荷電ビーム露光装置
GB2408143B (en) * 2003-10-20 2006-11-15 Ims Nanofabrication Gmbh Charged-particle multi-beam exposure apparatus
US7176459B2 (en) 2003-12-25 2007-02-13 Ebara Corporation Electron beam apparatus
EP2267751A3 (en) 2005-09-06 2011-01-05 Carl Zeiss SMT AG Particle-optical component
US8134135B2 (en) * 2006-07-25 2012-03-13 Mapper Lithography Ip B.V. Multiple beam charged particle optical system
KR101118692B1 (ko) * 2006-10-11 2012-03-12 전자빔기술센터 주식회사 자기 렌즈층을 포함한 전자 칼럼
JP5103033B2 (ja) * 2007-03-02 2012-12-19 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
US7821187B1 (en) * 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
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CN101414533A (zh) * 2002-10-30 2009-04-22 迈普尔平版印刷Ip有限公司 电子束曝光系统
CN101019203A (zh) * 2004-05-17 2007-08-15 迈普尔平版印刷Ip有限公司 带电粒子束曝光系统
CN101496129A (zh) * 2006-07-25 2009-07-29 迈普尔平版印刷Ip有限公司 多光束带电粒子光学系统

Also Published As

Publication number Publication date
KR20190138898A (ko) 2019-12-16
US20180323034A1 (en) 2018-11-08
CN110313048A (zh) 2019-10-08
JP2022058874A (ja) 2022-04-12
JP2020518990A (ja) 2020-06-25
EP3549154A4 (en) 2020-07-22
KR102352097B1 (ko) 2022-01-14
IL267815A (en) 2019-09-26
WO2018203936A1 (en) 2018-11-08
JP7329637B2 (ja) 2023-08-18
US10242839B2 (en) 2019-03-26
IL267815B (en) 2022-08-01
EP3549154A1 (en) 2019-10-09

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