JP2020518727A - 高温セラミックヒータ上の集積化基板温度測定 - Google Patents
高温セラミックヒータ上の集積化基板温度測定 Download PDFInfo
- Publication number
- JP2020518727A JP2020518727A JP2019560118A JP2019560118A JP2020518727A JP 2020518727 A JP2020518727 A JP 2020518727A JP 2019560118 A JP2019560118 A JP 2019560118A JP 2019560118 A JP2019560118 A JP 2019560118A JP 2020518727 A JP2020518727 A JP 2020518727A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- light guide
- substrate support
- temperature
- fiber optic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 217
- 238000009529 body temperature measurement Methods 0.000 title description 3
- 239000000919 ceramic Substances 0.000 title 1
- 238000012545 processing Methods 0.000 claims abstract description 84
- 238000000034 method Methods 0.000 claims abstract description 53
- 239000000835 fiber Substances 0.000 claims abstract description 47
- 238000012544 monitoring process Methods 0.000 claims abstract description 35
- 238000001816 cooling Methods 0.000 claims abstract description 19
- 230000008569 process Effects 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 13
- 239000013307 optical fiber Substances 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 9
- 229910052594 sapphire Inorganic materials 0.000 claims description 5
- 239000010980 sapphire Substances 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000005137 deposition process Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 abstract description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 13
- 230000015654 memory Effects 0.000 description 10
- 238000003860 storage Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000003070 Statistical process control Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 108091028072 EteRNA Proteins 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007619 statistical method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
- C23C16/463—Cooling of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0255—Sample holders for pyrometry; Cleaning of sample
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/041—Mountings in enclosures or in a particular environment
- G01J5/042—High-temperature environment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/046—Materials; Selection of thermal materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/048—Protective parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/061—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0818—Waveguides
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0818—Waveguides
- G01J5/0821—Optical fibres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4266—Thermal aspects, temperature control or temperature monitoring
- G02B6/4268—Cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (15)
- 基板支持アセンブリであって、
支持シャフト、
前記支持シャフト上に配置された基板支持体、及び
前記基板支持体上に配置されるべき基板の温度を測定するための基板温度モニタリングシステムであって、
光ファイバチューブと、
前記光ファイバチューブに結合された光ガイドであって、前記光ガイドの少なくとも一部が、前記支持シャフトを通って前記基板支持体の中へと延びる開口内に配置される、光ガイドと、
前記光ファイバチューブと前記光ガイドとの接合部の周りに配置された冷却アセンブリであって、基板処理中、前記光ファイバチューブを約100℃未満の温度に維持する、冷却アセンブリと
を備えた基板温度モニタリングシステム
を備えている基板支持アセンブリ。 - 前記光ガイドが、サファイアチューブである、請求項1に記載の基板支持アセンブリ。
- 前記基板温度モニタリングシステムが、
前記光ガイドの側方移動を制限することによって前記光ガイドを損傷から保護するように前記開口内に配置されたシース
をさらに備えている、請求項1に記載の基板支持アセンブリ。 - 前記光ガイドが、少なくとも約400mmの長さ、及び少なくとも約40mmの内径を有する、請求項1に記載の基板支持アセンブリ。
- 前記基板支持体上に基板が配置されたとき、前記光ガイドの端部が、前記基板から1mm以内にある、請求項1に記載の基板支持アセンブリ。
- 前記光ファイバチューブと前記光ガイドとの前記接合部が、真空密封によって、前記開口から隔離されている、請求項1に記載の基板支持アセンブリ。
- 前記基板支持体が、基板受容面と同一平面上に又は前記基板受容面の下方に位置付けされた窓をさらに備えている、請求項1に記載の基板支持アセンブリ。
- 処理チャンバであって、
処理空間を画定するチャンバ本体、及び
前記処理空間内に配置された基板支持アセンブリ
を備え、
前記基板支持アセンブリが、
支持シャフトと、
前記支持シャフト上に配置された基板支持体と、
前記基板支持体上に配置されるべき基板の温度を測定するための基板温度モニタリングシステムであって、
光ファイバチューブ、
前記光ファイバチューブに結合された光ガイドであって、前記光ガイドの少なくとも一部が、前記支持シャフトを通って前記基板支持体の中へと延びる開口内に配置される、光ガイド、及び
前記光ファイバチューブと前記光ガイドとの接合部の周りに配置された冷却アセンブリであって、基板処理中、前記光ファイバチューブを約100℃未満の温度に維持する、冷却アセンブリ
を備えた基板温度モニタリングシステムと
を備えている、処理チャンバ。 - 前記光ガイドが、サファイアチューブである、請求項8に記載の基板支持アセンブリ。
- 前記光ガイドが、少なくとも約400mmの長さ、及び少なくとも約40mmの内径を有する、請求項8に記載の基板支持アセンブリ。
- 前記基板支持体上に基板が配置されたとき、前記光ガイドの端部が、前記基板から1mm以内にある、請求項8に記載の基板支持アセンブリ。
- 前記光ファイバチューブと前記光ガイドとの前記接合部が、真空密封によって、前記開口から隔離されている、請求項8に記載の基板支持アセンブリ。
- 前記基板支持体が、基板受容面と同一平面上に又は前記基板受容面の下方に位置付けされた窓をさらに備えている、請求項8に記載の基板支持アセンブリ。
- 基板を処理する方法であって、
処理チャンバの処理空間内に配置された基板支持アセンブリの基板受容面上に基板を位置付けすることであって、
前記基板支持アセンブリが、
支持シャフト、
前記支持シャフト上に配置された基板支持体、及び
前記基板支持体上に配置されるべき基板の温度を測定するための基板温度モニタリングシステムであって、
光ファイバチューブと、
前記光ファイバチューブに結合された光ガイドであって、前記光ガイドの少なくとも一部が、前記支持シャフトを通って前記基板支持体の中へと延びる開口内に配置される、光ガイドと、
前記光ファイバチューブと前記光ガイドとの接合部の周りに配置された冷却アセンブリであって、基板処理中、前記光ファイバチューブを約100℃未満の温度に維持する、冷却アセンブリと
を備えた基板温度モニタリングシステムを備えている、
基板を位置付けすることと、
1つ又は複数の処理ガスを前記処理空間内に流すことと、
前記1つ又は複数の処理ガスのプラズマを形成することと、
前記光ファイバチューブを使用して、前記基板の温度を測定することであって、前記基板の温度が、約110℃を越え、前記光ファイバチューブが、約100℃未満の温度で維持される、前記基板の温度を測定することと、
前記基板上に材料層を堆積することと
を含む方法。 - 前記基板の温度を測定することが、前記光ファイバチューブによって受信した光学情報を前記処理チャンバに連結されたコントローラに伝達することを含む、請求項14に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762500682P | 2017-05-03 | 2017-05-03 | |
US62/500,682 | 2017-05-03 | ||
PCT/US2018/030899 WO2018204651A1 (en) | 2017-05-03 | 2018-05-03 | Integrated substrate temperature measurement on high temperature ceramic heater |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2020518727A true JP2020518727A (ja) | 2020-06-25 |
JP2020518727A5 JP2020518727A5 (ja) | 2021-07-26 |
JP7175283B2 JP7175283B2 (ja) | 2022-11-18 |
Family
ID=64014870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019560118A Active JP7175283B2 (ja) | 2017-05-03 | 2018-05-03 | 高温セラミックヒータ上の集積化基板温度測定 |
Country Status (5)
Country | Link |
---|---|
US (2) | US10510567B2 (ja) |
JP (1) | JP7175283B2 (ja) |
KR (1) | KR20190138315A (ja) |
CN (1) | CN110603634A (ja) |
WO (1) | WO2018204651A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10622214B2 (en) | 2017-05-25 | 2020-04-14 | Applied Materials, Inc. | Tungsten defluorination by high pressure treatment |
US10276411B2 (en) | 2017-08-18 | 2019-04-30 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
WO2019036157A1 (en) | 2017-08-18 | 2019-02-21 | Applied Materials, Inc. | HIGH PRESSURE AND HIGH TEMPERATURE RECOVERY CHAMBER |
JP7274461B2 (ja) | 2017-09-12 | 2023-05-16 | アプライド マテリアルズ インコーポレイテッド | 保護バリア層を使用して半導体構造を製造する装置および方法 |
KR102396319B1 (ko) | 2017-11-11 | 2022-05-09 | 마이크로머티어리얼즈 엘엘씨 | 고압 프로세싱 챔버를 위한 가스 전달 시스템 |
WO2019099125A1 (en) | 2017-11-16 | 2019-05-23 | Applied Materials, Inc. | High pressure steam anneal processing apparatus |
JP2021503714A (ja) | 2017-11-17 | 2021-02-12 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 高圧処理システムのためのコンデンサシステム |
KR102536820B1 (ko) | 2018-03-09 | 2023-05-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 금속 함유 재료들을 위한 고압 어닐링 프로세스 |
US10950429B2 (en) | 2018-05-08 | 2021-03-16 | Applied Materials, Inc. | Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom |
US10748783B2 (en) | 2018-07-25 | 2020-08-18 | Applied Materials, Inc. | Gas delivery module |
US10675581B2 (en) | 2018-08-06 | 2020-06-09 | Applied Materials, Inc. | Gas abatement apparatus |
WO2020117462A1 (en) | 2018-12-07 | 2020-06-11 | Applied Materials, Inc. | Semiconductor processing system |
US11901222B2 (en) | 2020-02-17 | 2024-02-13 | Applied Materials, Inc. | Multi-step process for flowable gap-fill film |
US20240110836A1 (en) * | 2022-09-30 | 2024-04-04 | Applied Materials, Inc. | Vacuum sealing integrity of cryogenic electrostatic chucks using non-contact surface temperature measuring probes |
TW202424481A (zh) * | 2022-12-14 | 2024-06-16 | 美商Mks儀器公司 | 氣體濃度感測器及其使用方法 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5355425A (en) * | 1992-09-04 | 1994-10-11 | Braiman Mark S | Light coupling device for optical fibers |
JPH06331457A (ja) * | 1993-05-19 | 1994-12-02 | Hitachi Ltd | 温度検出装置と、この温度検出装置を用いた半導体製造方法及び装置 |
JPH0831919A (ja) * | 1994-07-11 | 1996-02-02 | Souzou Kagaku:Kk | 静電チャック |
JPH08255800A (ja) * | 1994-12-19 | 1996-10-01 | Applied Materials Inc | 基板温度測定のための方法及び装置 |
JPH09297072A (ja) * | 1996-05-01 | 1997-11-18 | Sony Corp | 温度測定用光ファイバープローブ |
US6086246A (en) * | 1998-05-26 | 2000-07-11 | Novellus Systems, Inc. | Two-element plasma resistant lightpipe assembly |
JP2001308024A (ja) * | 2000-04-21 | 2001-11-02 | Tokyo Electron Ltd | 熱処理装置及び方法 |
JP2002542620A (ja) * | 1999-04-20 | 2002-12-10 | ステアーグ シーヴイディー システムズ リミテッド | 制御された温度で材料を処理するための装置 |
US20040004990A1 (en) * | 2001-08-29 | 2004-01-08 | Khan Abid L. | Temperature sensing in controlled environment |
US20040184028A1 (en) * | 2001-07-24 | 2004-09-23 | Fink Steven T. | Method and apparatus for monitoring the condition of plasma equipment |
JP2010533863A (ja) * | 2007-07-19 | 2010-10-28 | ラム リサーチ コーポレーション | 熱的に分離されたチップを有する温度プローブ |
WO2015116428A1 (en) * | 2014-01-31 | 2015-08-06 | Applied Materials, Inc. | Temperature measurement using silicon wafer reflection interference |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5556204A (en) * | 1990-07-02 | 1996-09-17 | Hitachi, Ltd. | Method and apparatus for detecting the temperature of a sample |
US5317656A (en) | 1991-05-17 | 1994-05-31 | Texas Instruments Incorporated | Fiber optic network for multi-point emissivity-compensated semiconductor wafer pyrometry |
US5253312A (en) * | 1992-06-26 | 1993-10-12 | Cytocare, Inc. | Optical fiber tip for use in a laser delivery system and a method for forming same |
CA2125508C (en) * | 1993-06-16 | 2004-06-08 | Shinji Ishikawa | Process for producing glass preform for optical fiber |
US5755511A (en) * | 1994-12-19 | 1998-05-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
US5830277A (en) * | 1995-05-26 | 1998-11-03 | Mattson Technology, Inc. | Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
US5893643A (en) * | 1997-03-25 | 1999-04-13 | Applied Materials, Inc. | Apparatus for measuring pedestal temperature in a semiconductor wafer processing system |
US6226453B1 (en) * | 1997-09-16 | 2001-05-01 | Applied Materials, Inc. | Temperature probe with fiber optic core |
US6107606A (en) * | 1998-01-05 | 2000-08-22 | Texas Instruments Incorporated | Method and apparatus for measuring temperatures during electronic package assembly |
JP3774094B2 (ja) * | 1999-12-02 | 2006-05-10 | 株式会社日立製作所 | 膜厚、加工深さ測定装置及び成膜加工方法 |
US6481886B1 (en) | 2000-02-24 | 2002-11-19 | Applied Materials Inc. | Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system |
JP3605752B2 (ja) * | 2000-03-10 | 2004-12-22 | ノーリツ鋼機株式会社 | 画像形成装置 |
US6695886B1 (en) * | 2002-08-22 | 2004-02-24 | Axcelis Technologies, Inc. | Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool |
US20090274590A1 (en) | 2008-05-05 | 2009-11-05 | Applied Materials, Inc. | Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feed |
US20090316749A1 (en) * | 2008-06-23 | 2009-12-24 | Matthew Fenton Davis | Substrate temperature measurement by infrared transmission in an etch process |
KR101514098B1 (ko) * | 2009-02-02 | 2015-04-21 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치와 온도 측정 방법 및 장치 |
GB2499391B (en) * | 2012-02-14 | 2015-11-04 | Symetrica Ltd | Neutron detector |
US10494719B2 (en) * | 2014-05-23 | 2019-12-03 | Board Of Trustees Of Michigan State University | Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors |
WO2016007462A1 (en) * | 2014-07-08 | 2016-01-14 | Watlow Electric Manufacturing Company | Bonded assembly with integrated temperature sensing in bond layer |
US10497606B2 (en) * | 2015-02-09 | 2019-12-03 | Applied Materials, Inc. | Dual-zone heater for plasma processing |
JP6537329B2 (ja) | 2015-04-07 | 2019-07-03 | 東京エレクトロン株式会社 | 温度制御装置、温度制御方法およびプログラム |
US20170316963A1 (en) * | 2016-04-28 | 2017-11-02 | Applied Materials, Inc. | Direct optical heating of substrates |
US10184183B2 (en) * | 2016-06-21 | 2019-01-22 | Applied Materials, Inc. | Substrate temperature monitoring |
-
2018
- 2018-05-03 JP JP2019560118A patent/JP7175283B2/ja active Active
- 2018-05-03 CN CN201880029349.4A patent/CN110603634A/zh active Pending
- 2018-05-03 WO PCT/US2018/030899 patent/WO2018204651A1/en active Application Filing
- 2018-05-03 US US15/970,496 patent/US10510567B2/en not_active Expired - Fee Related
- 2018-05-03 KR KR1020197035495A patent/KR20190138315A/ko not_active Application Discontinuation
-
2019
- 2019-12-16 US US16/715,456 patent/US20200118850A1/en not_active Abandoned
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5355425A (en) * | 1992-09-04 | 1994-10-11 | Braiman Mark S | Light coupling device for optical fibers |
JPH06331457A (ja) * | 1993-05-19 | 1994-12-02 | Hitachi Ltd | 温度検出装置と、この温度検出装置を用いた半導体製造方法及び装置 |
JPH0831919A (ja) * | 1994-07-11 | 1996-02-02 | Souzou Kagaku:Kk | 静電チャック |
JPH08255800A (ja) * | 1994-12-19 | 1996-10-01 | Applied Materials Inc | 基板温度測定のための方法及び装置 |
JPH09297072A (ja) * | 1996-05-01 | 1997-11-18 | Sony Corp | 温度測定用光ファイバープローブ |
US6086246A (en) * | 1998-05-26 | 2000-07-11 | Novellus Systems, Inc. | Two-element plasma resistant lightpipe assembly |
JP2002542620A (ja) * | 1999-04-20 | 2002-12-10 | ステアーグ シーヴイディー システムズ リミテッド | 制御された温度で材料を処理するための装置 |
JP2001308024A (ja) * | 2000-04-21 | 2001-11-02 | Tokyo Electron Ltd | 熱処理装置及び方法 |
US20040184028A1 (en) * | 2001-07-24 | 2004-09-23 | Fink Steven T. | Method and apparatus for monitoring the condition of plasma equipment |
US20040004990A1 (en) * | 2001-08-29 | 2004-01-08 | Khan Abid L. | Temperature sensing in controlled environment |
JP2010533863A (ja) * | 2007-07-19 | 2010-10-28 | ラム リサーチ コーポレーション | 熱的に分離されたチップを有する温度プローブ |
WO2015116428A1 (en) * | 2014-01-31 | 2015-08-06 | Applied Materials, Inc. | Temperature measurement using silicon wafer reflection interference |
Also Published As
Publication number | Publication date |
---|---|
US20200118850A1 (en) | 2020-04-16 |
KR20190138315A (ko) | 2019-12-12 |
JP7175283B2 (ja) | 2022-11-18 |
CN110603634A (zh) | 2019-12-20 |
WO2018204651A1 (en) | 2018-11-08 |
US10510567B2 (en) | 2019-12-17 |
US20180323093A1 (en) | 2018-11-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7175283B2 (ja) | 高温セラミックヒータ上の集積化基板温度測定 | |
TWI449886B (zh) | 溫度探針及使用其之基板支撐體 | |
KR102586827B1 (ko) | 저항 열 측정들을 통해 샤워헤드 가열 제어 | |
KR200478069Y1 (ko) | 플라즈마 처리 장치의 교체가능한 상부 체임버 부품 | |
US20190206706A1 (en) | Temperature measurement in multi-zone heater | |
TW201243955A (en) | Apparatus for monitoring and controlling substrate temperature | |
TWI756962B (zh) | 進階溫度監測系統及用於半導體製造生產力的方法 | |
JP2005183946A (ja) | 基板加工工程の終点検出装置 | |
US20100265988A1 (en) | Substrate cool down control | |
US20210265144A1 (en) | Temperature-tuned substrate support for substrate processing systems | |
TW202201460A (zh) | 用於電漿腔室條件監測的電容感測器及電容感測位置 | |
JP2009147170A (ja) | 半導体装置の製造方法および半導体装置の製造装置 | |
TW202332887A (zh) | 用於溫度測量值的真空中發射率設定的原位校正/最佳化 | |
US8344300B2 (en) | Device to reduce shadowing during radiative heating of a substrate | |
KR101803513B1 (ko) | 기판 처리 장치 | |
CN221447101U (zh) | 温度监测系统 | |
TW202430850A (zh) | 利用非接觸式表面溫度測量探測器的低溫靜電吸盤的改進真空密封完整性 | |
TWI673754B (zh) | 加熱過濾器組件 | |
TW202407842A (zh) | 半導體處理腔室用之液冷式光學窗 | |
JP2006114638A (ja) | 熱処理装置、熱処理方法及び昇温レートの算出方法 | |
WO2024072646A1 (en) | Improved vacuum sealing integrity of cryogenic electrostatic chucks using non-contact surface temperature measuring probes | |
KR20040031386A (ko) | 반도체 기판에 막을 형성하는 장치 | |
KR20030032274A (ko) | 반도체 공정챔버 가열용 히팅챔버 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210506 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210506 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220524 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220524 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220817 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20221011 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221108 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7175283 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |