JP2020510992A - 水蒸気および酸素の反応物を利用するプラズマ軽減技術 - Google Patents
水蒸気および酸素の反応物を利用するプラズマ軽減技術 Download PDFInfo
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32412—Plasma immersion ion implantation
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- H01J2237/32—Processing objects by plasma generation
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- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Abstract
Description
Claims (15)
- プラズマ軽減システムに対する水および酸素送達システムであって、
密閉された領域を画定する床面および複数の側壁を含むハウジングと、
前記床面上に位置決めされた円柱水槽であり、前記円柱水槽の長手方向軸が、前記床面によって画定される平面に対して平行であり、前記水槽の長さが、前記円柱水槽の直径より1.5倍以上大きい、円柱水槽と、
前記ハウジング内で前記円柱水槽の上に位置決めされた流量制御システムとを備える水および酸素送達システム。 - 前記流量制御システムが、
酸素質量流量コントローラと、
水蒸気質量流量コントローラとを備える、請求項1に記載の水および酸素送達システム。 - 前記水槽が、水蒸気を生じさせる低圧ボイラである、請求項1に記載の水および酸素送達システム。
- 前記円柱水槽が、
円柱形の側壁と、
第1の円形の壁と、
反対側の第2の円形の壁とを含み、前記円柱形の側壁、前記第1の円形の壁、および前記第2の円形の壁が、密閉された領域を画定する、請求項3に記載の水および酸素送達システム。 - 前記水槽内の液位を測定するために前記水槽内に位置決めされた液位センサをさらに備える、請求項4に記載の水および酸素送達システム。
- 前記水槽内の圧力を測定するために前記水槽内に位置決めされた真空圧力計をさらに備える、請求項5に記載の水および酸素送達システム。
- 前記水槽からの水蒸気の生成、前記真空圧力計、前記液位センサ、および前記流量制御システムを制御および監視するために前記ハウジング内に位置決めされた電子コントローラをさらに備える、請求項6に記載の水および酸素送達システム。
- 密閉された領域を画定する床面および複数の側壁を含むハウジング、
前記床面上に位置決めされた円柱水槽であり、前記円柱水槽の長手方向軸が、前記床面によって画定される平面に対して平行であり、前記水槽の長さが、前記円柱水槽の直径より1.5倍以上大きい、円柱水槽、および
前記ハウジング内で前記円柱水槽の上に位置決めされた流量制御システム
を備える水および酸素送達システムと、
導管を介して前記水および酸素送達システムに連結されたプラズマ源と
を備える軽減システム。 - 前記流量制御システムが、
酸素質量流量コントローラと、
水蒸気質量流量コントローラとを備える、請求項8に記載の軽減システム。 - 前記水槽が、水蒸気を生じさせる低圧ボイラである、請求項8に記載の軽減システム。
- 前記円柱水槽が、
円柱形の側壁と、
第1の円形の壁と、
反対側の第2の円形の壁とを含み、前記円柱形の側壁、前記第1の円形の壁、および前記第2の円形の壁が、密閉された領域を画定する、請求項8に記載の軽減システム。 - 前記水槽内の液位を測定するために前記水槽内に位置決めされた液位センサをさらに備える、請求項11に記載の軽減システム。
- 前記水槽内の圧力を測定するために前記水槽内に位置決めされた真空圧力計をさらに備える、請求項12に記載の軽減システム。
- 前記水槽からの水蒸気の生成、前記真空圧力計、前記液位センサ、および前記流量制御システムを制御および監視するために前記ハウジング内に位置決めされた電子コントローラをさらに備える、請求項13に記載の軽減システム。
- 処理チャンバと、
真空源と、
前記処理チャンバを前記真空源に連結するフォアラインと、
導管を介して前記フォアラインに連結された軽減システムとを備え、前記軽減システムが、
密閉された領域を画定する床面および複数の側壁を含むハウジング、
前記床面上に位置決めされた円柱水槽であり、前記円柱水槽の長手方向軸が、前記床面によって画定される平面に対して平行であり、前記水槽の長さが、前記円柱水槽の直径より1.5倍以上大きい、円柱水槽、および
前記ハウジング内で前記円柱水槽の上に位置決めされた流量制御システム
を備える水および酸素送達システムと、
導管を介して前記水および酸素送達システムに連結されたプラズマ源とを備える、真空処理システム。
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US201762457036P | 2017-02-09 | 2017-02-09 | |
US62/457,036 | 2017-02-09 | ||
PCT/US2018/015982 WO2018148062A1 (en) | 2017-02-09 | 2018-01-30 | Plasma abatement technology utilizing water vapor and oxygen reagent |
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JP2020510992A true JP2020510992A (ja) | 2020-04-09 |
JP7021237B2 JP7021237B2 (ja) | 2022-02-16 |
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JP (1) | JP7021237B2 (ja) |
KR (1) | KR102210393B1 (ja) |
CN (2) | CN114797403A (ja) |
TW (2) | TWI696056B (ja) |
WO (1) | WO2018148062A1 (ja) |
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2018
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KR20190107163A (ko) | 2019-09-18 |
CN114797403A (zh) | 2022-07-29 |
US20180366307A1 (en) | 2018-12-20 |
US20200357615A1 (en) | 2020-11-12 |
TWI730759B (zh) | 2021-06-11 |
JP7021237B2 (ja) | 2022-02-16 |
TWI696056B (zh) | 2020-06-11 |
WO2018148062A1 (en) | 2018-08-16 |
TW202036196A (zh) | 2020-10-01 |
US10685818B2 (en) | 2020-06-16 |
CN110291611A (zh) | 2019-09-27 |
KR102210393B1 (ko) | 2021-02-01 |
US20180226234A1 (en) | 2018-08-09 |
TW201839537A (zh) | 2018-11-01 |
CN110291611B (zh) | 2022-05-17 |
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