JP2020507678A5 - - Google Patents

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Publication number
JP2020507678A5
JP2020507678A5 JP2019542079A JP2019542079A JP2020507678A5 JP 2020507678 A5 JP2020507678 A5 JP 2020507678A5 JP 2019542079 A JP2019542079 A JP 2019542079A JP 2019542079 A JP2019542079 A JP 2019542079A JP 2020507678 A5 JP2020507678 A5 JP 2020507678A5
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JP
Japan
Prior art keywords
workpiece
pulse voltage
voltage source
coupled
plasma chamber
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JP2019542079A
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JP2020507678A (ja
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Priority claimed from US15/424,405 external-priority patent/US10373804B2/en
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Publication of JP2020507678A publication Critical patent/JP2020507678A/ja
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Claims (1)

  1. 調整可能なワークピースバイアス用システムであって、
    ワークピースにプラズマ処理を実施するプラズマチャンバと、
    前記プラズマチャンバ内で、ワークピースに直接に結合され、ワークピースの上方に位置する電極と結合された第１のパルス電圧源と、
    前記ワークピースに容量結合された第２のパルス電圧源と、
    前記ワークピースに向けられたイオンフラックスのイオンエネルギー分布を調整するために、前記第１のパルス電圧源及び前記第２のパルス電圧源の１つ以上のパラメータに基づいて、前記第１のパルス電圧源及び前記第２のパルス電圧源を独立に制御するバイアス制御装置とを備えるシステム。
JP2019542079A 2017-02-03 2018-01-29 プラズマリアクタ内での調整可能なワークピースバイアス用システム Pending JP2020507678A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/424,405 2017-02-03
US15/424,405 US10373804B2 (en) 2017-02-03 2017-02-03 System for tunable workpiece biasing in a plasma reactor
PCT/US2018/015688 WO2018144374A1 (en) 2017-02-03 2018-01-29 System for tunable workpiece biasing in a plasma reactor

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JP2020507678A JP2020507678A (ja) 2020-03-12
JP2020507678A5 true JP2020507678A5 (ja) 2021-02-25

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JP2019542079A Pending JP2020507678A (ja) 2017-02-03 2018-01-29 プラズマリアクタ内での調整可能なワークピースバイアス用システム

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US (3) US10373804B2 (ja)
JP (1) JP2020507678A (ja)
KR (1) KR20190105243A (ja)
CN (1) CN110249407A (ja)
TW (1) TW201832620A (ja)
WO (1) WO2018144374A1 (ja)

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