JP2020503459A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2020503459A5 JP2020503459A5 JP2019535815A JP2019535815A JP2020503459A5 JP 2020503459 A5 JP2020503459 A5 JP 2020503459A5 JP 2019535815 A JP2019535815 A JP 2019535815A JP 2019535815 A JP2019535815 A JP 2019535815A JP 2020503459 A5 JP2020503459 A5 JP 2020503459A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- ethylenediamine
- hydroxyethyl
- copper
- complexing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- QQVDJLLNRSOCEL-UHFFFAOYSA-N (2-aminoethyl)phosphonic acid Chemical compound [NH3+]CCP(O)([O-])=O QQVDJLLNRSOCEL-UHFFFAOYSA-N 0.000 description 2
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- BYACHAOCSIPLCM-UHFFFAOYSA-N 2-[2-[bis(2-hydroxyethyl)amino]ethyl-(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)CCN(CCO)CCO BYACHAOCSIPLCM-UHFFFAOYSA-N 0.000 description 1
- CYOIAXUAIXVWMU-UHFFFAOYSA-N 2-[2-aminoethyl(2-hydroxyethyl)amino]ethanol Chemical compound NCCN(CCO)CCO CYOIAXUAIXVWMU-UHFFFAOYSA-N 0.000 description 1
- LTPDITOEDOAWRU-UHFFFAOYSA-N 3,4-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(S(O)(=O)=O)C=C1O LTPDITOEDOAWRU-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 229940048195 n-(hydroxyethyl)ethylenediaminetriacetic acid Drugs 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- HBROZNQEVUILML-UHFFFAOYSA-N salicylhydroxamic acid Chemical compound ONC(=O)C1=CC=CC=C1O HBROZNQEVUILML-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1663525 | 2016-12-29 | ||
| FR1663525A FR3061601B1 (fr) | 2016-12-29 | 2016-12-29 | Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve |
| PCT/EP2017/084580 WO2018122216A1 (en) | 2016-12-29 | 2017-12-26 | Copper electrodeposition solution and process for high aspect ratio patterns |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020503459A JP2020503459A (ja) | 2020-01-30 |
| JP2020503459A5 true JP2020503459A5 (enExample) | 2020-10-22 |
| JP7138108B2 JP7138108B2 (ja) | 2022-09-15 |
Family
ID=59579658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019535815A Active JP7138108B2 (ja) | 2016-12-29 | 2017-12-26 | 銅電着溶液及び高アスペクト比パターンのためのプロセス |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10883185B2 (enExample) |
| EP (1) | EP3562975A1 (enExample) |
| JP (1) | JP7138108B2 (enExample) |
| KR (1) | KR102562158B1 (enExample) |
| CN (1) | CN110168146B (enExample) |
| FR (1) | FR3061601B1 (enExample) |
| IL (1) | IL267531A (enExample) |
| TW (1) | TWI737880B (enExample) |
| WO (1) | WO2018122216A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110724983B (zh) * | 2019-10-12 | 2022-02-08 | 天津大学 | 一种利用脉冲电沉积法制备纳米铜包覆碳化钨核壳结构粉体的方法 |
| CN111041533B (zh) * | 2019-12-31 | 2021-06-29 | 苏州清飙科技有限公司 | 电镀纯钴用电镀液及其应用 |
| CN111244547B (zh) * | 2020-01-21 | 2021-09-17 | 四川虹微技术有限公司 | 一种含芳香肟类添加剂的电解液及其制备方法和用途 |
| US12070609B2 (en) * | 2020-07-30 | 2024-08-27 | Medtronic, Inc. | Electrical component and method of forming same |
| KR20240172193A (ko) | 2022-04-05 | 2024-12-09 | 맥더미드 엔쏜 인코포레이티드 | 상향식 구리 전기도금을 위한 촉진제를 포함하는 전해질 |
| JP2025137155A (ja) * | 2024-03-08 | 2025-09-19 | 三菱マテリアル株式会社 | 酸性電解銅めっき液 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6897151B2 (en) * | 2002-11-08 | 2005-05-24 | Wayne State University | Methods of filling a feature on a substrate with copper nanocrystals |
| US6897152B2 (en) | 2003-02-05 | 2005-05-24 | Enthone Inc. | Copper bath composition for electroless and/or electrolytic filling of vias and trenches for integrated circuit fabrication |
| JP4650275B2 (ja) * | 2004-08-10 | 2011-03-16 | 日立金属株式会社 | 銅めっき被膜を表面に有する希土類系永久磁石 |
| FR2890983B1 (fr) | 2005-09-20 | 2007-12-14 | Alchimer Sa | Composition d'electrodeposition destinee au revetement d'une surface d'un substrat par un metal. |
| FR2890984B1 (fr) * | 2005-09-20 | 2009-03-27 | Alchimer Sa | Procede d'electrodeposition destine au revetement d'une surface d'un substrat par un metal. |
| US7579274B2 (en) | 2006-02-21 | 2009-08-25 | Alchimer | Method and compositions for direct copper plating and filing to form interconnects in the fabrication of semiconductor devices |
| CN101275255A (zh) * | 2007-12-20 | 2008-10-01 | 广州市二轻工业科学技术研究所 | 一种碱性无氰镀铜的维护方法 |
| EP2305856A1 (en) * | 2009-09-28 | 2011-04-06 | ATOTECH Deutschland GmbH | Process for applying a metal coating to a non-conductive substrate |
| JP2013091820A (ja) * | 2011-10-24 | 2013-05-16 | Kanto Chem Co Inc | 銅層および／または銅合金層を含む金属膜用エッチング液組成物およびそれを用いたエッチング方法 |
| FR2995912B1 (fr) * | 2012-09-24 | 2014-10-10 | Alchimer | Electrolyte et procede d'electrodeposition de cuivre sur une couche barriere |
| KR101493358B1 (ko) * | 2013-07-16 | 2015-02-13 | 한국생산기술연구원 | 무전해 구리도금액을 이용한 구리 도금층 형성방법 |
| EP3080340B1 (en) * | 2013-12-09 | 2018-04-18 | Aveni | Copper electrodeposition bath containing an electrochemically inert cation |
| US9869026B2 (en) * | 2014-07-15 | 2018-01-16 | Rohm And Haas Electronic Materials Llc | Electroless copper plating compositions |
-
2016
- 2016-12-29 FR FR1663525A patent/FR3061601B1/fr active Active
-
2017
- 2017-12-26 CN CN201780082322.7A patent/CN110168146B/zh active Active
- 2017-12-26 KR KR1020197020176A patent/KR102562158B1/ko active Active
- 2017-12-26 JP JP2019535815A patent/JP7138108B2/ja active Active
- 2017-12-26 WO PCT/EP2017/084580 patent/WO2018122216A1/en not_active Ceased
- 2017-12-26 US US15/745,836 patent/US10883185B2/en active Active
- 2017-12-26 EP EP17818596.3A patent/EP3562975A1/en active Pending
- 2017-12-29 TW TW106146399A patent/TWI737880B/zh active
-
2019
- 2019-06-19 IL IL267531A patent/IL267531A/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2020503459A5 (enExample) | ||
| MX367712B (es) | Composiciones y metodos de inhibicion de la corrosion. | |
| JP2016135874A5 (enExample) | ||
| PH12015501252A1 (en) | Method for indicating time for washing or indicating delivery of antibacterial agent | |
| CA2948016C (en) | Household articles with antimicrobial coating and associated manufacturing methods | |
| CN106796835A8 (zh) | 具有不同磁性质的区域的磁体以及用于形成这种磁体的方法 | |
| JP2012087153A5 (enExample) | ||
| MY182675A (en) | Antifouling paint composition, copolymer for antifouling paint composition and method for manufacturing same, and painted object having on surface antifouling paint film formed using said composition | |
| IL215017A (en) | A preparation containing a source of metal ions and a concealer, its use for metal coating on substrates containing sub-micron sized keyboards and a process for this coating | |
| EA201591658A1 (ru) | Стекло с покрытием, содержащее частично лишенные покрытия области | |
| EP3250730B8 (fr) | Procédé de préparation d'une tôle revêtue comprenant l'application d'une solution aqueuse comprenant un aminoacide et utilisation associée pour améliorer la résistance à la corrosion | |
| MX2016013883A (es) | Metodo para inhibir el deposito de cobre en el cabello. | |
| WO2012095667A3 (en) | Improvements in coating technology | |
| CL2011001306A1 (es) | Composicion antimicrobiana que comprende una sal de plata soluble, una alcanolamida, y/o aminoalcohol, un ph 6 o superior; composicion limpiadora que comprende un surfactante, una sal de plata soluble, una alcanolamida, y/o aminoalcohol. | |
| MX389943B (es) | Composiciones micronutrientes y sistemas y métodos para utilizar las mismas. | |
| DE502006007963D1 (de) | Verwendung von hydrophobinen zur schmutzabweisenden behandlung von harten oberflächen | |
| BR112016026042A8 (pt) | preparação de rocurônio em forma líquida e método | |
| MX381315B (es) | Método para recubrir resina. | |
| Chaker | On high frequency estimation of the frictionless price: The use of observed liquidity variables | |
| EP3603801A4 (en) | METAL OXIDE CATALYST, ITS PRODUCTION PROCESS AND ALCOHOL PRODUCTION PROCESS USING IT | |
| WO2014204019A3 (ja) | 皮膚洗浄組成物を調製するためのキット、皮膚洗浄組成物、及び皮膚洗浄組成物の調製方法 | |
| ATE529712T1 (de) | Verfahren zur herstellung von trockenen freifliessenden hydrophobinzubereitungen | |
| EP3250725B8 (fr) | Procédé de préparation d'une tôle revêtue comprenant l'application d'une solution aqueuse comprenant un aminoacide et utilisation associée pour améliorer les propriétés tribologiques | |
| MY163470A (en) | Curing process for concrete | |
| Kim et al. | What options to trade and when: Evidence from seasoned equity offerings |