JP2020184626A - 基板処理装置及び基板処理方法 - Google Patents
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- 238000003384 imaging method Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 description 12
- 238000005530 etching Methods 0.000 description 11
- 230000003028 elevating effect Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
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- 238000004380 ashing Methods 0.000 description 1
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
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- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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Abstract
Description
300 基板処理装置
310 支持ユニット
340 レーザーユニット
350 ビジョンユニット
360 調節ユニット
361 ボディー
362 光反射部
363 制御部
Claims (13)
- 基板が処理される空間を提供するチャンバーと、
前記チャンバー内部で基板を支持する支持ユニットと、
前記基板のエッジ領域にレーザーを照射するレーザーユニットと、
前記基板のエッジ領域を撮像して前記基板のオフセット(Offset)値を測定するビジョンユニットと、
前記基板のオフセット値に基づいて前記レーザーの照射位置を調節する調節ユニットと、を含む基板処理装置。 - 前記調節ユニットは、
ボディーと、
前記ボディー内に提供され、前記レーザーの照射方向及び前記ビジョンユニットの撮像方向を同軸に変更する光反射部と、
前記ボディーを駆動して前記レーザーの照射位置を調節する制御部と、を含む請求項1に記載の基板処理装置。 - 前記制御部は、
前記ボディーの勾配を調節して前記レーザーの照射位置を変更する請求項2に記載の基板処理装置。 - 前記制御部は、
前記ビジョンユニットで撮像された映像で既設定された基準点及び前記基板の端部の間の最短距離を前記基板のオフセット値として算出し、前記オフセット値及び前記ボディーと前記基板との間の距離に基づいて前記ボディーの勾配を調節する請求項3に記載の基板処理装置。 - 前記制御部は、
前記ボディーの位置を変更して前記レーザーの照射位置を変更する請求項2に記載の基板処理装置。 - 前記制御部は、
前記ボディーの位置を前記基板のオフセット値に対応される距離ぐらい移動させる請求項5に記載の基板処理装置。 - 前記支持ユニットは、前記基板を回転させるスピンヘッドを含み、
前記調節ユニットは、
前記基板のオフセット値に基づいて前記スピンヘッドと同期制御される基板請求項1乃至請求項6のいずれかの一項に記載の処理装置。 - 前記調節ユニットは、
前記基板の回転角度に対応されるオフセット値に対するプロファイルを生成し、前記プロファイルに応じて前記レーザーの照射位置を調節する請求項7に記載の基板処理装置。 - 請求項1の基板処理装置を利用して基板のエッジ領域にレーザーを照射する基板処理方法において、
基板を回転させながら前記基板のエッジ領域を撮像する段階と、
前記基板のエッジ領域で基板の回転角度に応じる基板のオフセット値に関するプロファイルを生成する段階と、
前記基板のオフセット値に関するプロファイルに基づいて前記レーザーの照射位置を調節する段階と、
前記レーザーを照射して基板を処理する段階と、を含む基板処理方法。 - 前記レーザーの照射位置を調節する段階は、
前記調節ユニットの勾配を調節して前記レーザーの照射位置を変更する段階を含む請求項9に記載の基板処理方法。 - 前記基板のオフセット値に関するプロファイルを生成する段階は、
前記ビジョンユニットで撮像された映像で既設定された基準点及び前記基板の端部の間の最短距離を前記基板のオフセット値として算出する段階を含み、
前記レーザーの照射位置を変更する段階は、
前記オフセット値及び前記調節ユニットと前記基板との間の距離に基づいて前記調節ユニットの勾配を調節する請求項10に記載の基板処理方法。 - 前記レーザーの照射位置を調節する段階は、
前記調節ユニットの位置を変更して前記レーザーの照射位置を変更する段階を含む請求項9に記載の基板処理方法。 - 前記レーザーの照射位置を変更する段階は、
前記調節ユニットの位置を前記基板のオフセット値に対応される距離ぐらい移動させる請求項12に記載の基板処理方法。
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