JP2020179398A - 重原子を含有する化合物のプラズマ軽減 - Google Patents
重原子を含有する化合物のプラズマ軽減 Download PDFInfo
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- JP2020179398A JP2020179398A JP2020116103A JP2020116103A JP2020179398A JP 2020179398 A JP2020179398 A JP 2020179398A JP 2020116103 A JP2020116103 A JP 2020116103A JP 2020116103 A JP2020116103 A JP 2020116103A JP 2020179398 A JP2020179398 A JP 2020179398A
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- reagent
- mitigation
- plasma source
- plasma
- volatilization
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- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/64—Heavy metals or compounds thereof, e.g. mercury
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/70—Organic halogen compounds
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
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- H01J37/32082—Radio frequency generated discharge
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- H—ELECTRICITY
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- H—ELECTRICITY
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
- H05H1/473—Cylindrical electrodes, e.g. rotary drums
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- B—PERFORMING OPERATIONS; TRANSPORTING
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Abstract
Description
本明細書に開示する実施形態はまた、処理チャンバからの廃水を軽減するシステムを含む。システムは、処理チャンバのフォアラインに結合された磁気強化プラズマ源を含む。処理チャンバは、堆積チャンバである。システムはまた、プラズマ源の上流に位置決めされてプラズマ源に結合された試薬源を含む。試薬源は、プラズマ源へ軽減試薬を送出するように構成される。
本開示の上記の特徴を詳細に理解することができるように、いくつかを添付の図面に示す実施形態を参照することによって、上記で簡単に要約した本開示のより具体的な説明を得ることができる。しかし、本開示は他の等しく有効な実施形態も許容することができるため、添付の図面は、本開示の典型的な実施形態のみを示し、したがって本開示の範囲を限定すると見なされるべきではないことに留意されたい。
本明細書に開示する実施形態は、処理チャンバから出る廃水中に存在する物質に対するプラズマ軽減プロセスを含む。プラズマ軽減プロセスは、堆積チャンバ、エッチングチャンバ、または他の真空処理チャンバなどの処理チャンバからのフォアライン廃水を取り込み、フォアライン経路内に配置されたプラズマチャンバ内で廃水を反応させる。プラズマは、廃水中に存在する物質にエネルギーを与え、より環境に優しい形態への物質の変換をより効率的にする。いくつかの実施形態では、プラズマは、廃水中に存在する物質を少なくとも部分的に解離することができ、それによってより環境に優しい形態へ廃水中の物質を変換する効率を増大させる。軽減試薬は、廃水中に存在する物質の軽減を助けることができる。軽減プロセスは、揮発または凝縮による軽減プロセスとすることができる。
いくつかの実施形態では、制御弁112は、ガスの使用を最小にするために、試薬送出システム106からの試薬が流れているときにのみガスを通すように、コントローラ118によって制御することができる。たとえば、試薬送出システム106の制御弁103とキット108の制御弁112との間に破線によって示すように、制御弁112は、制御弁103が開けられた(または締められた)ことに応答して開ける(または締める)ことができる。
図1の実施形態は概略的に表されており、話を簡単にするために、いくつかの構成要素は省略されている。たとえば、処理チャンバ101から排ガスを除去するために、ターボ分子ポンプなどの高速真空ポンプを、処理チャンバ101とフォアライン102との間に配置することができる。加えて、フォアラインガス、試薬、および/またはプラズマを供給するために、構成要素の他の変形形態を設けることができる。
図3は、処理チャンバから出る廃水を軽減する揮発方法300の一実施形態を示す流れ図である。方法300は、ブロック302で、処理チャンバ101などの処理チャンバからの廃水をプラズマ源104などのプラズマ源内へ流すことによって始まる。ブロック304で、揮発軽減試薬が、プラズマ源内へ流される。ブロック306で、プラズマ源内で揮発軽減試薬からプラズマが生成され、それによって軽減試薬にエネルギーを与え、いくつかの実施形態では廃水にもエネルギーを与える。いくつかの実施形態では、軽減試薬および/または廃水中に同伴される物質の少なくとも一部が、少なくとも部分的に解離される。廃水中の物質は、プラズマ源内で形成されたプラズマの存在下で異なる物質に変換される。廃水中の物質は、次いで、プラズマ源から出て、真空源120などの真空源内へ流れることができ、かつ/またはさらに処置することができる。
Claims (15)
- 処理チャンバからの排出物を軽減する方法であって、
軽減すべき少なくとも1つの物質を含む処理チャンバからの排出物をプラズマ源内へ流すステップと、
前記プラズマ源内へ軽減試薬を流すステップと、
前記プラズマ源内に形成されたプラズマの存在下で前記排出物中の前記物質を前記軽減試薬と反応させ、前記排出物中の前記物質を異なる物質に変換するステップとを含む方法。 - 前記排出物中の軽減すべき前記物質が、アルミニウム原子と少なくとも同じ重さである重原子を含む、請求項1に記載の方法。
- 前記処理チャンバ内で堆積プロセスまたはエッチングプロセスを実行するステップをさらに含む、請求項1に記載の方法。
- 前記軽減試薬が、揮発軽減試薬を含み、前記揮発軽減試薬が、H2、H2O、アンモニア、またはメタンの少なくとも1つを含む、請求項1に記載の方法。
- 前記軽減試薬が、揮発軽減試薬を含み、前記揮発軽減試薬が、BCl3、CCl4、SiCl4、NF3、SF4、SF6、またはSF8の少なくとも1つを含む、請求項1に記載の方法。
- 前記軽減試薬が、揮発軽減試薬を含み、前記揮発軽減試薬が、
第1の1つまたは複数の化合物であって、前記第1の1つまたは複数の化合物の少なくとも1つが、CHxFy、CxClyFz、およびCFxからなる群から選択される、第1の1つまたは複数の化合物と、
第2の1つまたは複数の化合物であって、前記第2の1つまたは複数の化合物の少なくとも1つが、O2およびH2Oからなる群から選択される、第2の1つまたは複数の化合物との組合せとを含む、請求項1に記載の方法。 - 前記軽減試薬が、揮発軽減試薬を含み、前記揮発軽減試薬が、F2、Cl2、Br2、I2、HCl、HF、HBr、またはHIの少なくとも1つを含む、請求項1に記載の方法。
- 前記軽減試薬が、揮発軽減試薬を含み、前記揮発軽減試薬が、メタンより高次のアルカンを含む、請求項1に記載の方法。
- 前記軽減試薬が、凝縮軽減試薬を含み、前記凝縮軽減試薬が、O2、N2、O3、CO、CO2、NH3、またはN2Oの少なくとも1つを含む、請求項1に記載の方法。
- 前記軽減試薬が、凝縮軽減試薬を含み、前記凝縮軽減試薬が、H2、H2O、またはアルカンの少なくとも1つを含む、請求項1に記載の方法。
- 前記排出物中の軽減すべき前記物質が、シリコンまたはシランを含み、前記軽減試薬が、O2を含む、請求項1に記載の方法。
- 処理チャンバからの排出物を軽減する方法であって、
軽減すべき少なくとも1つの物質を含む処理チャンバからの排出物をプラズマ源内へ流すステップと、
前記プラズマ源内へ軽減試薬を流すステップと、
前記プラズマ源内に形成されたプラズマの存在下で前記排出物中の前記物質を前記軽減試薬と反応させて前記排出物中の前記物質を異なる物質に変換するステップとを含み、前記プラズマ源が、磁気強化容量結合プラズマ源である、方法。 - 前記排出物中の軽減すべき前記物質が、アルミニウム原子と少なくとも同じ重さである重原子を含む、請求項12に記載の方法。
- 前記処理チャンバ内で堆積プロセスまたはエッチングプロセスを実行するステップをさらに含む、請求項12に記載の方法。
- 処理チャンバからの排出物を軽減する装置であって、
堆積チャンバのフォアラインに結合されたプラズマ源であって、
外側エッジおよび内側エッジを有する第1の板、
前記第1の板に平行であり、外側エッジおよび内側エッジを有する第2の板、
前記第1および第2の板の前記外側エッジ間に配置された外壁、
前記第1および第2の板の前記内側エッジ間に配置された電極、
前記第1の板上に配置された第1の複数の磁石、ならびに
前記第2の板上に配置された第2の複数の磁石を備えるプラズマ源と、
前記プラズマ源の上流に位置決めされた試薬源とを備え、前記試薬源が、前記プラズマ源に結合され、前記試薬源が、前記プラズマ源へ軽減試薬を送出するように構成され、前記軽減試薬が、BCl3、CCl4、SiCl4、NF3、SF4、SF6、SF8、還元化合物、ハロゲン化エッチング化合物、CH4、H2、F2、HCl、HF、Cl2、HBr、O2、N2、O3、CO、CO2、NH3、N2O、CH4、およびこれらの組合せを含む群から選択される、装置。
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