JP2020149041A - 表示装置 - Google Patents
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- JP2020149041A JP2020149041A JP2019219352A JP2019219352A JP2020149041A JP 2020149041 A JP2020149041 A JP 2020149041A JP 2019219352 A JP2019219352 A JP 2019219352A JP 2019219352 A JP2019219352 A JP 2019219352A JP 2020149041 A JP2020149041 A JP 2020149041A
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- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
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- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
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- H01L29/76—Unipolar devices, e.g. field effect transistors
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- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
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- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1216—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors
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Abstract
Description
前記バッファー層上に配置され、互いに離隔している第1のアクティブパターン及び第2のアクティブパターンと、前記第1のアクティブパターン及び前記第2のアクティブパターンの上に配置される第1のゲート絶縁層と、前記第1のゲート絶縁層上に配置され、前記第1のアクティブパターン及び前記第2のアクティブパターンにそれぞれ重なる第1のゲート電極及び第2のゲート電極と、前記第1のゲート電極及び前記第2のゲート電極の上に配置される第2のゲート絶縁層と、前記第2のゲート絶縁層上に配置され、前記第1のゲート電極と重なるキャパシタ電極とを含む。前記高誘電率絶縁層の誘電率は、前記バッファー層の誘電率よりも大きい。
そして、駆動TFTは、駆動電圧範囲を大きく保つ必要があり、スイッチングTFTは、特性曲線の勾配を急峻に保つ必要がある。このようにして、残像などの問題の発生を抑制または防止する必要がある。
そして、これらの半導体活性層パターン(アクティブパターン121,122)を覆う箇所にて、ゲート絶縁膜(第1のゲート絶縁層130)は、比誘電率が低い酸化シリコンなどからなる無機絶縁膜(第1の無機絶縁層132)と、比誘電率が高い材料からなる無機絶縁膜(第1または第2の高誘電率絶縁層131,133)との積層膜となっている。
高誘電率の無機絶縁膜(第1または第2の高誘電率絶縁層131,133)は、ゲート電極(第1及び第2のゲート電極141,142)の近傍で、半導体活性層パターン(アクティブパターン121,122)とその周辺部を覆うように島状に配置される。
例えば、低誘電率の無機絶縁膜の厚みが100〜150nmであって、高誘電率の無機絶縁膜の厚みは、低誘電率の無機絶縁膜の厚みの1/10〜1/30、または、3〜8nmである。
そして、スイッチングTFT(第2のトランジスタTR2)では、高誘電率の無機絶縁膜が、ゲート電極に接するように上層に配置される。
そして、駆動TFT(第1のトランジスタTR1)では、ゲート電極(第1のゲート電極141)と重なり合うように、島状のキャパシタ電極160が、「第2のゲート絶縁膜150」の上に配置される。
これにより、高誘電率の無機絶縁膜について、比誘電率を10〜40、10〜20、例えば13〜18とすることができる。一方、低誘電率の無機絶縁膜(第1及び第2の無機絶縁層132,152)について、比誘電率を8以下、5以下、または4以下とすることができる。
105: 高誘電率絶縁層
110: バッファー層
121: 第1のアクティブパターン
122: 第2のアクティブパターン
130: 第1のゲート絶縁層
141: 第1のゲート電極
142: 第2のゲート電極
150: 第2のゲート絶縁層
160: キャパシタ電極
Claims (10)
- 基板と、
前記基板上に配置されるバッファー層と、
前記バッファー層上に配置され、互いに離隔している第1のアクティブパターン及び第2のアクティブパターンと、
前記第1のアクティブパターン及び前記第2のアクティブパターンの上に配置される第1のゲート絶縁層と、
前記第1のゲート絶縁層上に配置され、前記第1のアクティブパターン及び前記第2のアクティブパターンとそれぞれ重なる第1のゲート電極及び第2のゲート電極と、
前記第1のゲート電極及び前記第2のゲート電極の上に配置される第2のゲート絶縁層と、
前記第2のゲート絶縁層上に配置され、前記第1のゲート電極と重なるキャパシタ電極とを含み、
前記第1のゲート絶縁層の誘電率は、前記バッファー層の誘電率よりも大きいことを特徴とする表示装置。 - 前記第1のゲート絶縁層は、第1の高誘電率絶縁層と、前記第1の高誘電率絶縁層上に配置され、前記第1の高誘電率絶縁層の誘電率よりも小さい誘電率を有する無機絶縁層とを含むことを特徴とする請求項1に記載の表示装置。
- 前記第1の高誘電率絶縁層は、前記第1のアクティブパターンと重なるようにパターニングされることを特徴とする請求項2に記載の表示装置。
- 前記第1のゲート絶縁層は、前記無機絶縁層上に配置され、前記無機絶縁層の誘電率よりも大きい誘電率を有する第2の高誘電率絶縁層を更に含むことを特徴とする請求項2に記載の表示装置。
- 前記第2の高誘電率絶縁層は、前記第2のアクティブパターンと重なるようにパターニングされることを特徴とする請求項4に記載の表示装置。
- 基板と、
前記基板上に配置されるバッファー層と、
前記バッファー層上に配置され、互いに離隔している第1のアクティブパターン及び第2のアクティブパターンと、
前記第1のアクティブパターン及び前記第2のアクティブパターンの上に配置される第1のゲート絶縁層と、
前記第1のゲート絶縁層上に配置され、前記第1のアクティブパターン及び前記第2のアクティブパターンとそれぞれ重なる第1のゲート電極及び第2のゲート電極と、
前記第1のゲート電極及び前記第2のゲート電極の上に配置される第2のゲート絶縁層と、
前記第2のゲート絶縁層上に配置され、前記第1のゲート電極と重なるキャパシタ電極とを含み、
前記第2のゲート絶縁層の誘電率は、前記バッファー層の誘電率よりも大きいことを特徴とする表示装置。 - 前記第2のゲート絶縁層は、無機絶縁層と、前記無機絶縁層の誘電率よりも大きい誘電率を有する高誘電率絶縁層とを含むことを特徴とする請求項6に記載の表示装置。
- 前記高誘電率絶縁層は、前記第1のゲート電極と重なるようにパターニングされることを特徴とする請求項7に記載の表示装置。
- 基板と、
前記基板上に配置される高誘電率絶縁層と、
前記高誘電率絶縁層上に配置されるバッファー層と、
前記バッファー層上に配置され、互いに離隔している第1のアクティブパターン及び第2のアクティブパターンと、
前記第1のアクティブパターン及び前記第2のアクティブパターンの上に配置される第1のゲート絶縁層と、
前記第1のゲート絶縁層上に配置され、前記第1のアクティブパターン及び前記第2のアクティブパターンとそれぞれ重なる第1のゲート電極及び第2のゲート電極と、
前記第1のゲート電極及び前記第2のゲート電極の上に配置される第2のゲート絶縁層と、
前記第2のゲート絶縁層上に配置され、前記第1のゲート電極と重なるキャパシタ電極とを含み、
前記高誘電率絶縁層の誘電率は、前記バッファー層の誘電率よりも大きいことを特徴とする表示装置。 - 前記高誘電率絶縁層の密度は、前記バッファー層の密度よりも大きいことを特徴とする請求項9に記載の表示装置。
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