JP2020077870A5 - - Google Patents

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JP2020077870A5
JP2020077870A5 JP2019194479A JP2019194479A JP2020077870A5 JP 2020077870 A5 JP2020077870 A5 JP 2020077870A5 JP 2019194479 A JP2019194479 A JP 2019194479A JP 2019194479 A JP2019194479 A JP 2019194479A JP 2020077870 A5 JP2020077870 A5 JP 2020077870A5
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solder particles
solid
bonding material
anisotropic bonding
electronic component
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JP2019194479A
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JP6898413B2 (en
JP2020077870A (en
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Priority to PCT/JP2019/042035 priority Critical patent/WO2020090684A1/en
Priority to KR1020217007724A priority patent/KR102568476B1/en
Priority to TW108139034A priority patent/TWI843762B/en
Publication of JP2020077870A publication Critical patent/JP2020077870A/en
Publication of JP2020077870A5 publication Critical patent/JP2020077870A5/ja
Priority to JP2021097132A priority patent/JP7420764B2/en
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Claims (20)

常温で固形であり、温度190℃、荷重2.16kgの条件で測定されたメルトフローレートが10g/10min以上である熱可塑性樹脂、固形ラジカル重合性樹脂、及び固形エポキシ樹脂から選ばれる少なくとも1種の固形樹脂と、はんだ粒子と、フラックス化合物とを含有する異方性接合材料を、第1の電子部品の電極と第2の電子部品の電極との間に前記はんだ粒子の平均粒径の50%以上300%以下の厚みで介在させ、
前記第1の電子部品の電極と前記第2の電子部品の電極とを無荷重で加熱接合させる接続体の製造方法。
At least one selected from a thermoplastic resin, a solid radical polymerizable resin, and a solid epoxy resin, which are solid at room temperature and have a melt flow rate of 10 g / 10 min or more measured under the conditions of a temperature of 190 ° C. and a load of 2.16 kg. An anisotropic bonding material containing the solid resin, the solder particles, and the flux compound is placed between the electrodes of the first electronic component and the electrodes of the second electronic component, and the average particle size of the solder particles is 50. Intervening with a thickness of% or more and 300% or less,
A method for manufacturing a connector in which an electrode of the first electronic component and an electrode of the second electronic component are heat-bonded without a load.
前記異方性接合材料が、前記はんだ粒子の平均粒径の50%以上300%以下の厚みを有する異方性接合フィルムである請求項1記載の接続体の製造方法。 The method for producing a connector according to claim 1, wherein the anisotropic bonding material is an anisotropic bonding film having a thickness of 50% or more and 300% or less of the average particle size of the solder particles. 前記第2の電子部品が、基板であり、
前記基板上に前記異方性接合フィルムをラミネートし、前記異方性接合フィルム上に複数の前記第1の電子部品を搭載し、加熱接合させる請求項2記載の接続体の製造方法。
The second electronic component is a substrate.
The method for manufacturing a connector according to claim 2, wherein the anisotropic bonding film is laminated on the substrate, and a plurality of the first electronic components are mounted on the anisotropic bonding film and heat-bonded.
前記フラックス化合物が、カルボン酸である請求項1乃至3のいずれか1項に記載の接続体の製造方法。 The method for producing a connector according to any one of claims 1 to 3, wherein the flux compound is a carboxylic acid. 前記フラックス化合物が、カルボキシル基がアルキルビニルエーテルでブロック化されたブロック化カルボン酸である請求項1乃至3のいずれか1項に記載の接続体の製造方法。 The method for producing a connector according to any one of claims 1 to 3, wherein the flux compound is a blocked carboxylic acid in which a carboxyl group is blocked with an alkyl vinyl ether. 常温で固形であり、温度190℃、荷重2.16kgの条件で測定されたメルトフローレートが10g/10min以上である熱可塑性樹脂、固形ラジカル重合性樹脂、及び固形エポキシ樹脂から選ばれる少なくとも1種の固形樹脂と、はんだ粒子と、フラックス化合物とを含有し、
厚みが、前記はんだ粒子の平均粒径の50%以上300%以下である異方性接合材料。
At least one selected from a thermoplastic resin, a solid radical polymerizable resin, and a solid epoxy resin, which are solid at room temperature and have a melt flow rate of 10 g / 10 min or more measured under the conditions of a temperature of 190 ° C. and a load of 2.16 kg. Containing solid resin, solder particles, and flux compound,
An anisotropic bonding material having a thickness of 50% or more and 300% or less of the average particle size of the solder particles.
前記フラックス化合物が、カルボン酸である請求項6記載の異方性接合材料。 The anisotropic bonding material according to claim 6, wherein the flux compound is a carboxylic acid. 前記フラックス化合物が、カルボキシル基がアルキルビニルエーテルでブロック化されたブロック化カルボン酸である請求項6記載の異方性接合材料。 The anisotropic bonding material according to claim 6, wherein the flux compound is a blocked carboxylic acid in which a carboxyl group is blocked with an alkyl vinyl ether. 常温で液状の液状ラジカル重合性樹脂と、重合開始剤とをさらに含有する請求項6乃至8のいずれか1項に記載の異方性接合材料。 The anisotropic bonding material according to any one of claims 6 to 8, further containing a liquid radical polymerizable resin liquid at room temperature and a polymerization initiator. 常温で液状エポキシ樹脂と、硬化剤とをさらに含有する請求項6乃至8のいずれか1項に記載の異方性接合材料。 The anisotropic bonding material according to any one of claims 6 to 8, further containing a liquid epoxy resin at room temperature and a curing agent. 前記硬化剤が、カルボン酸、又はカルボキシル基がアルキルビニルエーテルでブロック化されたブロック化カルボン酸である請求項10記載の異方性接合材料。 The anisotropic bonding material according to claim 10, wherein the curing agent is a carboxylic acid or a blocked carboxylic acid in which the carboxyl group is blocked with an alkyl vinyl ether. 請求項6乃至11のいずれか1項に記載の異方性接合材料がフィルム状である異方性接合フィルム。 An anisotropic bonded film in which the anisotropic bonded material according to any one of claims 6 to 11 is in the form of a film. 請求項6乃至11のいずれか1項に記載の異方性接合材料、又は請求項12に記載の異方性接合フィルムを用いて、第1の電子部品の電極と第2の電子部品の電極とが接合されてなる接続体。 The electrode of the first electronic component and the electrode of the second electronic component are used by using the anisotropic bonding material according to any one of claims 6 to 11 or the anisotropic bonding film according to claim 12. A connection body that is joined to and from. 常温で固形であり、温度190℃、荷重2.16kgの条件で測定されたメルトフローレートが10g/10min以上である熱可塑性樹脂、固形ラジカル重合性樹脂、及び固形エポキシ樹脂から選ばれる少なくとも1種の固形樹脂と、はんだ粒子と、フラックス化合物とを含有する異方性接合材料を、第1の電子部品の電極と第2の電子部品の電極との間に前記はんだ粒子の平均粒径の50%以上300%以下の厚みで介在させ、At least one selected from a thermoplastic resin, a solid radical polymerizable resin, and a solid epoxy resin, which are solid at room temperature and have a melt flow rate of 10 g / 10 min or more measured under the conditions of a temperature of 190 ° C. and a load of 2.16 kg. An anisotropic bonding material containing the solid resin, the solder particles, and the flux compound is placed between the electrodes of the first electronic component and the electrodes of the second electronic component, and the average particle size of the solder particles is 50. Intervening with a thickness of% or more and 300% or less,
加熱により前記固形樹脂を溶融させ、前記第1の電子部品又は前記第2の電子部品の自重によりはんだ粒子を電極間に挟持させ、前記はんだ粒子の溶融温度以上の本加熱により前記はんだ粒子を溶融させ、冷却により前記第1の電子部品の電極と前記第2の電子部品の電極とを接合させる接続体の製造方法。The solid resin is melted by heating, the solder particles are sandwiched between the electrodes by the weight of the first electronic component or the second electronic component, and the solder particles are melted by the main heating above the melting temperature of the solder particles. A method for manufacturing a connector in which an electrode of the first electronic component and an electrode of the second electronic component are joined by cooling.
前記異方性接合材料における前記はんだ粒子の配合量が、40wt%以上60wt%以下である請求項14記載の接続体の製造方法。The method for manufacturing a connector according to claim 14, wherein the blending amount of the solder particles in the anisotropic bonding material is 40 wt% or more and 60 wt% or less. 前記異方性接合材料が、前記はんだ粒子の平均粒径の90%以上150%以下の厚みを有する異方性接合フィルムである請求項14又は15記載の接続体の製造方法。The method for producing a connector according to claim 14 or 15, wherein the anisotropic bonding material is an anisotropic bonding film having a thickness of 90% or more and 150% or less of the average particle size of the solder particles. 常温で固形であり、温度190℃、荷重2.16kgの条件で測定されたメルトフローレートが10g/10min以上である熱可塑性樹脂、固形ラジカル重合性樹脂、及び固形エポキシ樹脂から選ばれる少なくとも1種の固形樹脂と、はんだ粒子と、フラックス化合物とを含有し、At least one selected from a thermoplastic resin, a solid radical polymerizable resin, and a solid epoxy resin, which are solid at room temperature and have a melt flow rate of 10 g / 10 min or more measured under the conditions of a temperature of 190 ° C. and a load of 2.16 kg. Containing solid resin, solder particles, and flux compound,
厚みが、前記はんだ粒子の平均粒径の50%以上300%以下であり、The thickness is 50% or more and 300% or less of the average particle size of the solder particles.
前記はんだ粒子の配合量が、40wt%以上60wt%以下である異方性接合材料。An anisotropic bonding material in which the blending amount of the solder particles is 40 wt% or more and 60 wt% or less.
前記はんだ粒子の平均粒径の90%以上150%以下の厚みを有する請求項17記載の異方性接合材料。The anisotropic bonding material according to claim 17, which has a thickness of 90% or more and 150% or less of the average particle size of the solder particles. 前記厚みが、前記はんだ粒子の平均粒径の200%以下である請求項6記載の異方性接合材料。The anisotropic bonding material according to claim 6, wherein the thickness is 200% or less of the average particle size of the solder particles. 前記厚みが、前記はんだ粒子の平均粒径の150%以下である請求項6記載の異方性接合材料。The anisotropic bonding material according to claim 6, wherein the thickness is 150% or less of the average particle size of the solder particles.
JP2019194479A 2018-10-31 2019-10-25 Manufacturing method of connecting body, anisotropic bonded film, connecting body Active JP6898413B2 (en)

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PCT/JP2019/042035 WO2020090684A1 (en) 2018-10-31 2019-10-25 Method for manufacturing connected body, anisotropic bonding film, and connected body
KR1020217007724A KR102568476B1 (en) 2018-10-31 2019-10-25 Manufacturing method of connected body, anisotropic bonding film, connected body
TW108139034A TWI843762B (en) 2018-10-31 2019-10-29 Method for manufacturing connection structure
JP2021097132A JP7420764B2 (en) 2018-10-31 2021-06-10 Connection body manufacturing method, anisotropic bonding film, connection body

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