JP2020030066A - 圧力センサ - Google Patents
圧力センサ Download PDFInfo
- Publication number
- JP2020030066A JP2020030066A JP2018154479A JP2018154479A JP2020030066A JP 2020030066 A JP2020030066 A JP 2020030066A JP 2018154479 A JP2018154479 A JP 2018154479A JP 2018154479 A JP2018154479 A JP 2018154479A JP 2020030066 A JP2020030066 A JP 2020030066A
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- pressure sensor
- sensor
- sensor according
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012530 fluid Substances 0.000 claims abstract description 11
- 230000008021 deposition Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000012528 membrane Substances 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 19
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 19
- 238000004088 simulation Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- 238000005452 bending Methods 0.000 description 15
- 238000004364 calculation method Methods 0.000 description 13
- 238000006073 displacement reaction Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 4
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L7/00—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements
- G01L7/02—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges
- G01L7/08—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges of the flexible-diaphragm type
- G01L7/082—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges of the flexible-diaphragm type construction or mounting of diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018154479A JP2020030066A (ja) | 2018-08-21 | 2018-08-21 | 圧力センサ |
KR1020190096048A KR102233599B1 (ko) | 2018-08-21 | 2019-08-07 | 압력 센서 |
CN201910728798.4A CN110849530B (zh) | 2018-08-21 | 2019-08-08 | 压力传感器 |
JP2022194073A JP7417698B2 (ja) | 2018-08-21 | 2022-12-05 | 圧力センサ用ダイアフラムの撓みを抑制する方法および圧力センサ用ダイアフラム |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018154479A JP2020030066A (ja) | 2018-08-21 | 2018-08-21 | 圧力センサ |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022194073A Division JP7417698B2 (ja) | 2018-08-21 | 2022-12-05 | 圧力センサ用ダイアフラムの撓みを抑制する方法および圧力センサ用ダイアフラム |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2020030066A true JP2020030066A (ja) | 2020-02-27 |
Family
ID=69594664
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018154479A Pending JP2020030066A (ja) | 2018-08-21 | 2018-08-21 | 圧力センサ |
JP2022194073A Active JP7417698B2 (ja) | 2018-08-21 | 2022-12-05 | 圧力センサ用ダイアフラムの撓みを抑制する方法および圧力センサ用ダイアフラム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022194073A Active JP7417698B2 (ja) | 2018-08-21 | 2022-12-05 | 圧力センサ用ダイアフラムの撓みを抑制する方法および圧力センサ用ダイアフラム |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP2020030066A (zh) |
KR (1) | KR102233599B1 (zh) |
CN (1) | CN110849530B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113280969A (zh) * | 2020-02-19 | 2021-08-20 | 阿自倍尔株式会社 | 压力传感器 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114641883B (zh) | 2020-02-21 | 2024-05-28 | 株式会社Lg新能源 | 锂二次电池用非水性电解液和包含它的锂二次电池 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002323395A (ja) * | 2001-04-27 | 2002-11-08 | Yazaki Corp | 静電容量型センサ |
JP2007132697A (ja) * | 2005-11-08 | 2007-05-31 | Denso Corp | 圧力センサ |
JP2008107214A (ja) * | 2006-10-26 | 2008-05-08 | Yamatake Corp | 静電容量型圧力センサ |
JP2009524024A (ja) * | 2006-01-18 | 2009-06-25 | インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング | ダイヤフラムを備える真空測定セル |
JP2016118494A (ja) * | 2014-12-22 | 2016-06-30 | 株式会社デンソー | 圧力センサ及びその製造方法 |
JP2016180651A (ja) * | 2015-03-24 | 2016-10-13 | アズビル株式会社 | 堆積物状態推定装置、堆積物状態推定方法および堆積物状態推定システム |
US20180024021A1 (en) * | 2015-02-12 | 2018-01-25 | Honeywell International Inc. | Micro mechanical devices with an improved recess or cavity structure |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5520054A (en) * | 1994-03-29 | 1996-05-28 | Rosemount Inc. | Increased wall thickness for robust bond for micromachined sensor |
US5507090A (en) * | 1994-07-20 | 1996-04-16 | Thiokol Corporation | Method for making stress sensors |
US6443015B1 (en) | 1999-09-10 | 2002-09-03 | Mks Instruments, Inc. | Baffle for a capacitive pressure sensor |
US6965189B2 (en) * | 2002-09-20 | 2005-11-15 | Monodrive Inc. | Bending actuators and sensors constructed from shaped active materials and methods for making the same |
US20100233029A1 (en) * | 2006-09-12 | 2010-09-16 | The Regents Of The University Of California | Compensated membrane capacitive bio-chemical sensor |
JP2009265041A (ja) | 2008-04-28 | 2009-11-12 | Yamatake Corp | 静電容量型圧力センサ |
JP5336242B2 (ja) | 2009-03-30 | 2013-11-06 | アズビル株式会社 | 静電容量型圧力センサ |
KR101257608B1 (ko) * | 2009-03-30 | 2013-04-29 | 아즈빌주식회사 | 정전 용량형 압력 센서 |
JP6002016B2 (ja) | 2012-11-30 | 2016-10-05 | アズビル株式会社 | 静電容量型圧力センサ |
JP2014126504A (ja) | 2012-12-27 | 2014-07-07 | Azbil Corp | 静電容量型圧力センサ |
US10107315B2 (en) | 2013-04-30 | 2018-10-23 | Mks Instruments, Inc. | MEMS pressure sensors with integrated baffles |
JP6147110B2 (ja) * | 2013-06-20 | 2017-06-14 | 日立オートモティブシステムズ株式会社 | 圧力検出装置 |
JP6231812B2 (ja) | 2013-08-09 | 2017-11-15 | アズビル株式会社 | 静電容量型圧力センサ |
CN106017747A (zh) * | 2015-03-25 | 2016-10-12 | 松下知识产权经营株式会社 | 感压传感器 |
JP2017134014A (ja) * | 2016-01-29 | 2017-08-03 | 株式会社鷺宮製作所 | 圧力センサ |
-
2018
- 2018-08-21 JP JP2018154479A patent/JP2020030066A/ja active Pending
-
2019
- 2019-08-07 KR KR1020190096048A patent/KR102233599B1/ko active IP Right Grant
- 2019-08-08 CN CN201910728798.4A patent/CN110849530B/zh active Active
-
2022
- 2022-12-05 JP JP2022194073A patent/JP7417698B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002323395A (ja) * | 2001-04-27 | 2002-11-08 | Yazaki Corp | 静電容量型センサ |
JP2007132697A (ja) * | 2005-11-08 | 2007-05-31 | Denso Corp | 圧力センサ |
JP2009524024A (ja) * | 2006-01-18 | 2009-06-25 | インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング | ダイヤフラムを備える真空測定セル |
JP2008107214A (ja) * | 2006-10-26 | 2008-05-08 | Yamatake Corp | 静電容量型圧力センサ |
JP2016118494A (ja) * | 2014-12-22 | 2016-06-30 | 株式会社デンソー | 圧力センサ及びその製造方法 |
US20180024021A1 (en) * | 2015-02-12 | 2018-01-25 | Honeywell International Inc. | Micro mechanical devices with an improved recess or cavity structure |
JP2016180651A (ja) * | 2015-03-24 | 2016-10-13 | アズビル株式会社 | 堆積物状態推定装置、堆積物状態推定方法および堆積物状態推定システム |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113280969A (zh) * | 2020-02-19 | 2021-08-20 | 阿自倍尔株式会社 | 压力传感器 |
US11573142B2 (en) * | 2020-02-19 | 2023-02-07 | Azbil Corporation | Capacitive diaphragm vacuum gauge including a pressure sensor with multiple recesses being formed in the diaphragm |
CN113280969B (zh) * | 2020-02-19 | 2023-11-14 | 阿自倍尔株式会社 | 压力传感器 |
Also Published As
Publication number | Publication date |
---|---|
KR102233599B1 (ko) | 2021-03-30 |
KR20200021885A (ko) | 2020-03-02 |
JP2023014372A (ja) | 2023-01-26 |
CN110849530B (zh) | 2022-01-25 |
JP7417698B2 (ja) | 2024-01-18 |
CN110849530A (zh) | 2020-02-28 |
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