JP2020025121A5 - - Google Patents

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Publication number
JP2020025121A5
JP2020025121A5 JP2019194259A JP2019194259A JP2020025121A5 JP 2020025121 A5 JP2020025121 A5 JP 2020025121A5 JP 2019194259 A JP2019194259 A JP 2019194259A JP 2019194259 A JP2019194259 A JP 2019194259A JP 2020025121 A5 JP2020025121 A5 JP 2020025121A5
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JP
Japan
Prior art keywords
electronic device
semiconductor material
electron transport
metal
compartment
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JP2019194259A
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English (en)
Japanese (ja)
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JP2020025121A (ja
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Priority claimed from EP14171326.3A external-priority patent/EP2887416B1/en
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Publication of JP2020025121A publication Critical patent/JP2020025121A/ja
Publication of JP2020025121A5 publication Critical patent/JP2020025121A5/ja
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JP2019194259A 2013-12-23 2019-10-25 ホスフィンオキシド母材及び金属ドーパントを含むn−ドープされた半導体材料 Pending JP2020025121A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP13199413.9 2013-12-23
EP13199413 2013-12-23
EP14171326.3A EP2887416B1 (en) 2013-12-23 2014-06-05 N-doped semiconducting material comprising phosphine oxide matrix and metal dopant
EP14171326.3 2014-06-05

Related Parent Applications (1)

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JP2016542211A Division JP6832704B2 (ja) 2013-12-23 2014-12-23 ホスフィンオキシド母材及び金属ドーパントを含むn−ドープされた半導体材料

Publications (2)

Publication Number Publication Date
JP2020025121A JP2020025121A (ja) 2020-02-13
JP2020025121A5 true JP2020025121A5 (https=) 2020-10-08

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JP2016542211A Active JP6832704B2 (ja) 2013-12-23 2014-12-23 ホスフィンオキシド母材及び金属ドーパントを含むn−ドープされた半導体材料
JP2019194259A Pending JP2020025121A (ja) 2013-12-23 2019-10-25 ホスフィンオキシド母材及び金属ドーパントを含むn−ドープされた半導体材料

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JP2016542211A Active JP6832704B2 (ja) 2013-12-23 2014-12-23 ホスフィンオキシド母材及び金属ドーパントを含むn−ドープされた半導体材料

Country Status (7)

Country Link
US (3) US20160322568A1 (https=)
EP (2) EP2887416B1 (https=)
JP (2) JP6832704B2 (https=)
KR (1) KR102339316B1 (https=)
CN (1) CN106062986B (https=)
ES (1) ES2673573T3 (https=)
WO (1) WO2015097232A1 (https=)

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