JP2019528444A5 - - Google Patents
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- JP2019528444A5 JP2019528444A5 JP2019508928A JP2019508928A JP2019528444A5 JP 2019528444 A5 JP2019528444 A5 JP 2019528444A5 JP 2019508928 A JP2019508928 A JP 2019508928A JP 2019508928 A JP2019508928 A JP 2019508928A JP 2019528444 A5 JP2019528444 A5 JP 2019528444A5
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- JP
- Japan
- Prior art keywords
- channel
- illumination source
- filtering
- illumination
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000005286 illumination Methods 0.000 claims 90
- 238000001914 filtration Methods 0.000 claims 64
- 238000005303 weighing Methods 0.000 claims 31
- 230000003287 optical effect Effects 0.000 claims 16
- 238000001228 spectrum Methods 0.000 claims 16
- 230000010287 polarization Effects 0.000 claims 15
- 230000003595 spectral effect Effects 0.000 claims 12
- 238000009826 distribution Methods 0.000 claims 8
- 239000006185 dispersion Substances 0.000 claims 6
- 230000001427 coherent effect Effects 0.000 claims 4
- 238000002834 transmittance Methods 0.000 claims 4
- 230000005540 biological transmission Effects 0.000 claims 3
- 230000000903 blocking effect Effects 0.000 claims 2
- 238000012423 maintenance Methods 0.000 claims 2
- 230000007935 neutral effect Effects 0.000 claims 2
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662375996P | 2016-08-17 | 2016-08-17 | |
| US62/375,996 | 2016-08-17 | ||
| US15/387,180 | 2016-12-21 | ||
| US15/387,180 US10371626B2 (en) | 2016-08-17 | 2016-12-21 | System and method for generating multi-channel tunable illumination from a broadband source |
| PCT/US2017/046084 WO2018034908A1 (en) | 2016-08-17 | 2017-08-09 | System and method for generating multi-channel tunable illumination from a broadband source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019528444A JP2019528444A (ja) | 2019-10-10 |
| JP2019528444A5 true JP2019528444A5 (enExample) | 2020-09-17 |
| JP6782834B2 JP6782834B2 (ja) | 2020-11-11 |
Family
ID=61191521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019508928A Active JP6782834B2 (ja) | 2016-08-17 | 2017-08-09 | 広帯域光源を基にマルチチャネル可調照明を生成するシステム及び方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10371626B2 (enExample) |
| JP (1) | JP6782834B2 (enExample) |
| KR (1) | KR102265871B1 (enExample) |
| CN (1) | CN109564157B (enExample) |
| SG (1) | SG11201900804WA (enExample) |
| TW (1) | TWI728171B (enExample) |
| WO (1) | WO2018034908A1 (enExample) |
Families Citing this family (35)
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| US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
| US10871395B2 (en) * | 2017-04-14 | 2020-12-22 | Kla Corporation | Filter assembly for providing adjustable spectral capabilities in a broadband inspection system |
| US10401738B2 (en) * | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| US10714327B2 (en) * | 2018-03-19 | 2020-07-14 | Kla-Tencor Corporation | System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination |
| US10840055B2 (en) * | 2018-03-20 | 2020-11-17 | Kla Corporation | System and method for photocathode illumination inspection |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| US11327012B2 (en) * | 2018-05-07 | 2022-05-10 | Unm Rainforest Innovations | Method and system for in-line optical scatterometry |
| KR102207041B1 (ko) * | 2019-05-17 | 2021-01-25 | 주식회사 더웨이브톡 | 광학 측정 장치 |
| CN110554552A (zh) | 2018-05-30 | 2019-12-10 | 台达电子工业股份有限公司 | 投影装置 |
| TWI660230B (zh) * | 2018-05-30 | 2019-05-21 | 台達電子工業股份有限公司 | 投影裝置 |
| KR102120551B1 (ko) * | 2018-09-14 | 2020-06-09 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| JP7595599B2 (ja) | 2019-02-14 | 2024-12-06 | ケーエルエー コーポレイション | トポグラフィ半導体デバイスウェハの製造における位置ずれの測定方法 |
| US11156846B2 (en) | 2019-04-19 | 2021-10-26 | Kla Corporation | High-brightness illumination source for optical metrology |
| US20200340858A1 (en) * | 2019-04-24 | 2020-10-29 | Applied Materials, Inc. | Plasma emission monitoring system with cross-dispersion grating |
| KR102528000B1 (ko) * | 2019-05-17 | 2023-05-03 | 주식회사 더웨이브톡 | 광학 측정 장치 |
| SG11202111021UA (en) * | 2019-05-23 | 2021-11-29 | Tokyo Electron Ltd | Optical diagnostics of semiconductor process using hyperspectral imaging |
| KR102721975B1 (ko) * | 2019-08-21 | 2024-10-28 | 삼성전자주식회사 | 단색화 장치 |
| EP3783438A1 (en) * | 2019-08-21 | 2021-02-24 | ASML Netherlands B.V. | Wavelength selection module, illumination system and metrology system |
| US11662562B2 (en) * | 2020-02-09 | 2023-05-30 | Kla Corporation | Broadband illumination tuning |
| US11300405B2 (en) * | 2020-08-03 | 2022-04-12 | Kla Corporation | Grey-mode scanning scatterometry overlay metrology |
| FI129324B (en) | 2021-01-08 | 2021-11-30 | Timegate Instr Oy | APPARATUS AND METHOD FOR MEASURING THE SPECTRUM COMPONENTS OF RADIATED LIGHT |
| US12111580B2 (en) * | 2021-03-11 | 2024-10-08 | Kla Corporation | Optical metrology utilizing short-wave infrared wavelengths |
| DE102021203620A1 (de) * | 2021-04-13 | 2022-10-13 | Carl Zeiss Microscopy Gmbh | Vorrichtung und Verfahren zur Multispot-Scanning-Mikroskopie |
| CN113237548A (zh) * | 2021-04-28 | 2021-08-10 | 航天科工深圳(集团)有限公司 | 基于声光可调谐滤波器的高分辨光学系统 |
| US12188818B2 (en) | 2021-06-18 | 2025-01-07 | Samsung Electronics Co., Ltd. | Spectrometer, metrology system, and semiconductor inspection method |
| US11913834B2 (en) * | 2021-08-16 | 2024-02-27 | Endress+Hauser Optical Analysis, Inc. | Spatially offset Raman probe with coaxial excitation and collection apertures |
| US11531275B1 (en) | 2021-08-25 | 2022-12-20 | Kla Corporation | Parallel scatterometry overlay metrology |
| JP7410625B2 (ja) * | 2021-09-28 | 2024-01-10 | キヤノン株式会社 | 照明装置、計測装置、基板処理装置、および物品の製造方法 |
| FI131148B1 (en) | 2021-11-17 | 2024-10-30 | Teknologian Tutkimuskeskus Vtt Oy | Improved hyperspectral light source |
| KR102750985B1 (ko) * | 2023-03-29 | 2025-01-09 | (주) 오로스테크놀로지 | 파장 가변형 광섬유 광원 및 이를 구비한 오버레이 측정 장치 |
| CN116540504B (zh) * | 2023-07-04 | 2024-04-26 | 之江实验室 | 一种基于连续谱光源的可变波长激光直写光刻系统与应用 |
| US12411420B2 (en) * | 2023-09-29 | 2025-09-09 | Kla Corporation | Small in-die target design for overlay measurement |
| US20250147382A1 (en) * | 2023-11-07 | 2025-05-08 | Iism Inc. | Tunable duv laser system using angle-dependent wavelength selector |
| US20250164410A1 (en) * | 2023-11-22 | 2025-05-22 | Tokyo Electron Limited | Optical metrology |
| US20250216189A1 (en) * | 2023-12-28 | 2025-07-03 | Onto Innovation Inc. | Metrology device with wavelength-frequency multiplexing |
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| GB2043288B (en) * | 1979-03-02 | 1983-01-26 | Pye Electronic Prod Ltd | Ebert monochromator |
| JP2550651B2 (ja) | 1988-03-28 | 1996-11-06 | 株式会社島津製作所 | ダブルモノクロメータ |
| GB9015793D0 (en) * | 1990-07-18 | 1990-09-05 | Medical Res Council | Confocal scanning optical microscope |
| JPH0783622A (ja) | 1993-09-20 | 1995-03-28 | Mitsubishi Electric Corp | 膜厚測定装置 |
| US6879619B1 (en) * | 1999-07-27 | 2005-04-12 | Intel Corporation | Method and apparatus for filtering an optical beam |
| CA2385004A1 (en) * | 1999-09-14 | 2001-03-22 | Bradley A. Scott | Dual grating light filtering system |
| US6989898B2 (en) * | 2003-01-23 | 2006-01-24 | Agilent Technologies, Inc. | Dynamic method for changing the operation of a multiple-pass monochromator between additive and subtractive modes |
| JP2005156607A (ja) * | 2003-11-20 | 2005-06-16 | Nec Viewtechnology Ltd | 色分離装置及びプロジェクタ |
| JP2007537455A (ja) * | 2004-05-14 | 2007-12-20 | ケイエルエイ−テンコー・テクノロジーズ・コーポレーション | 試験体の測定または分析のためのシステムおよび方法 |
| DE102004047820A1 (de) * | 2004-09-29 | 2006-03-30 | Leica Microsystems Cms Gmbh | Rastermikroskop und rastermikroskopisches Verfahren |
| US20070091325A1 (en) * | 2005-01-07 | 2007-04-26 | Mehrdad Nikoonahad | Multi-channel optical metrology |
| US7382456B2 (en) * | 2005-12-29 | 2008-06-03 | Honeywell Asca, Inc. | Spectroscopic sensor for measuring sheet properties |
| WO2008089393A2 (en) * | 2007-01-19 | 2008-07-24 | Thorlabs, Inc. | An optical coherence tomography imaging system and method |
| US7570358B2 (en) * | 2007-03-30 | 2009-08-04 | Asml Netherlands Bv | Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor |
| WO2009001390A1 (en) | 2007-06-28 | 2008-12-31 | Gian Luca Ferri | Adjustable multi-band excitation and visualization / imaging system for simultaneous viewing multiple fluorescence |
| EP2053447B1 (de) * | 2007-10-22 | 2010-11-24 | Tecan Trading AG | Laser Scanner-Gerät für Fluoreszenzmessungen |
| US8896832B2 (en) * | 2010-06-17 | 2014-11-25 | Kla-Tencor Corp. | Discrete polarization scatterometry |
| US9372118B1 (en) * | 2011-03-07 | 2016-06-21 | Fluxdata, Inc. | Apparatus and method for multispectral based detection |
| TW201247016A (en) * | 2011-04-12 | 2012-11-16 | Koninkl Philips Electronics Nv | Apparatus, system and method for pulse width modulated lighting control |
| CN105045024B (zh) * | 2011-07-08 | 2017-08-29 | 深圳市绎立锐光科技开发有限公司 | 投影系统、光源系统以及光源组件 |
| WO2014125729A1 (ja) * | 2013-02-13 | 2014-08-21 | ソニー株式会社 | 測定装置及び測定方法 |
| US9512985B2 (en) * | 2013-02-22 | 2016-12-06 | Kla-Tencor Corporation | Systems for providing illumination in optical metrology |
| US9354177B2 (en) * | 2013-06-26 | 2016-05-31 | Kla-Tencor Corporation | System and method for defect detection and photoluminescence measurement of a sample |
| DE102013227108A1 (de) * | 2013-09-03 | 2015-03-05 | Leica Microsystems Cms Gmbh | Vorrichtung und Verfahren zum Untersuchen einer Probe |
| US9306369B2 (en) * | 2013-11-22 | 2016-04-05 | Trumpf Laser Gmbh | Wavelength selective external resonator and beam combining system for dense wavelength beam combining laser |
| US9546962B2 (en) * | 2014-02-12 | 2017-01-17 | Kla-Tencor Corporation | Multi-spot scanning collection optics |
| JP6728070B2 (ja) * | 2014-06-05 | 2020-07-22 | ウニベルジテート ハイデルベルク | マルチスペクトルイメージングのための方法及び手段 |
| JP6836848B2 (ja) * | 2016-06-22 | 2021-03-03 | 株式会社ミツトヨ | レーザ光調整方法、及びレーザ光源装置 |
-
2016
- 2016-12-21 US US15/387,180 patent/US10371626B2/en active Active
-
2017
- 2017-08-09 KR KR1020197007076A patent/KR102265871B1/ko active Active
- 2017-08-09 SG SG11201900804WA patent/SG11201900804WA/en unknown
- 2017-08-09 WO PCT/US2017/046084 patent/WO2018034908A1/en not_active Ceased
- 2017-08-09 CN CN201780050429.3A patent/CN109564157B/zh active Active
- 2017-08-09 JP JP2019508928A patent/JP6782834B2/ja active Active
- 2017-08-17 TW TW106127873A patent/TWI728171B/zh active
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