JP2019518197A - マイクロエレクトロニクス用または光学用の基板をレーザドップラ効果によって検査するための方法およびシステム - Google Patents

マイクロエレクトロニクス用または光学用の基板をレーザドップラ効果によって検査するための方法およびシステム Download PDF

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Publication number
JP2019518197A
JP2019518197A JP2018551873A JP2018551873A JP2019518197A JP 2019518197 A JP2019518197 A JP 2019518197A JP 2018551873 A JP2018551873 A JP 2018551873A JP 2018551873 A JP2018551873 A JP 2018551873A JP 2019518197 A JP2019518197 A JP 2019518197A
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Japan
Prior art keywords
wafer
light
measurement volume
light source
measurement
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JP2018551873A
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JP2019518197A5 (enExample
Inventor
ガスタルド，フィリップ
ドゥ ジュヴィニー，マイユール デュラン
ドゥ ジュヴィニー，マイユール デュラン
コンビエ，トリスタン
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Unity Semiconductor SAS
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Unity Semiconductor SAS
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Publication of JP2019518197A5 publication Critical patent/JP2019518197A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2018551873A 2016-03-31 2017-03-14 マイクロエレクトロニクス用または光学用の基板をレーザドップラ効果によって検査するための方法およびシステム Pending JP2019518197A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1652835A FR3049710B1 (fr) 2016-03-31 2016-03-31 Procede et systeme d'inspection par effet doppler laser de plaquettes pour la microelectronique ou l'optique
FR1652835 2016-03-31
PCT/EP2017/055967 WO2017167573A1 (fr) 2016-03-31 2017-03-14 Procede et systeme d'inspection par effet doppler laser de plaquettes pour la microelectronique ou l'optique

Publications (2)

Publication Number Publication Date
JP2019518197A true JP2019518197A (ja) 2019-06-27
JP2019518197A5 JP2019518197A5 (enExample) 2020-04-23

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ID=55863116

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JP2018551873A Pending JP2019518197A (ja) 2016-03-31 2017-03-14 マイクロエレクトロニクス用または光学用の基板をレーザドップラ効果によって検査するための方法およびシステム

Country Status (9)

Country Link
US (1) US11092644B2 (enExample)
EP (1) EP3436807B1 (enExample)
JP (1) JP2019518197A (enExample)
KR (1) KR20180123699A (enExample)
CN (1) CN109073566B (enExample)
FR (1) FR3049710B1 (enExample)
SG (1) SG11201808303YA (enExample)
TW (1) TW201802461A (enExample)
WO (1) WO2017167573A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022548307A (ja) * 2019-09-20 2022-11-17 エヌディーシー テクノロジーズ インコーポレイテッド レーザー干渉法システムおよび方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI718627B (zh) * 2019-08-19 2021-02-11 崑山科技大學 以表面波頻率偵測材料表面瑕疵之方法
CN113503822B (zh) * 2021-06-01 2023-08-18 南京中安半导体设备有限责任公司 晶圆厚度的测量方法及其测量装置
EP4202423B1 (en) 2021-12-23 2025-09-24 Unity Semiconductor A method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate
EP4647746A1 (en) 2024-05-07 2025-11-12 Unity Semiconductor Support for a dark field optical inspection system
CN120395592B (zh) * 2025-07-03 2025-09-12 成都承奥科技有限公司 一种石墨环加工用高精度打磨检测设备及其使用方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253166A (ja) * 1989-03-27 1990-10-11 Yuji Ikeda 光ファイバレーザドップラ流速計の光学装置
JPH0310144A (ja) * 1989-06-08 1991-01-17 Mitsubishi Electric Corp 徴細粒子測定装置
JP2004513364A (ja) * 2000-11-13 2004-04-30 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 表面欠陥の測定
CN1740782A (zh) * 2005-09-15 2006-03-01 中国科学院上海光学精密机械研究所 倾斜入射光散射式硅片表面缺陷检测仪
JP2007526444A (ja) * 2003-06-06 2007-09-13 ケーエルエー−テンカー テクノロジィース コーポレイション パターン化ウェハまたは非パターン化ウェハおよびその他の検体の検査システム
US20090195786A1 (en) * 2008-02-05 2009-08-06 Philippe Gastaldo Device for inspecting semi-conductor wafers

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US5343290A (en) * 1992-06-11 1994-08-30 International Business Machines Corporation Surface particle detection using heterodyne interferometer
FR2699269B1 (fr) * 1992-12-10 1995-01-13 Merlin Gerin Dispositif de mesure interferrométrique.
US5883714A (en) * 1996-10-07 1999-03-16 Phase Metrics Method and apparatus for detecting defects on a disk using interferometric analysis on reflected light
JP3375876B2 (ja) * 1998-02-06 2003-02-10 株式会社日立製作所 結晶欠陥計測方法及び結晶欠陥計測装置
US9909986B2 (en) * 2003-10-15 2018-03-06 Applied Research And Photonics, Inc. Thickness determination and layer characterization using terahertz scanning reflectometry
US7420669B2 (en) * 2004-07-01 2008-09-02 Midwest Research Institute Optic probe for semiconductor characterization
JP5520736B2 (ja) * 2010-07-30 2014-06-11 株式会社日立ハイテクノロジーズ 欠陥検査方法及び欠陥検査装置
CN102937411B (zh) * 2012-11-09 2015-01-21 清华大学 一种双频光栅干涉仪位移测量系统
CN103322927B (zh) * 2013-06-19 2016-04-20 清华大学 一种三自由度外差光栅干涉仪位移测量系统
KR102609862B1 (ko) * 2014-04-17 2023-12-04 펨토매트릭스, 인코포레이티드. 웨이퍼 계측 기술들
FR3026485B1 (fr) * 2014-09-29 2016-09-23 Altatech Semiconductor Procede et systeme d'inspection de plaquettes pour l'electronique, l'optique ou l'optoelectronique
FR3026484B1 (fr) 2014-09-29 2018-06-15 Altatech Semiconductor Procede et systeme d'inspection de plaquettes transparentes pour l'electronique, l'optique ou l'optoelectronique

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253166A (ja) * 1989-03-27 1990-10-11 Yuji Ikeda 光ファイバレーザドップラ流速計の光学装置
JPH0310144A (ja) * 1989-06-08 1991-01-17 Mitsubishi Electric Corp 徴細粒子測定装置
JP2004513364A (ja) * 2000-11-13 2004-04-30 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 表面欠陥の測定
JP2007526444A (ja) * 2003-06-06 2007-09-13 ケーエルエー−テンカー テクノロジィース コーポレイション パターン化ウェハまたは非パターン化ウェハおよびその他の検体の検査システム
CN1740782A (zh) * 2005-09-15 2006-03-01 中国科学院上海光学精密机械研究所 倾斜入射光散射式硅片表面缺陷检测仪
US20090195786A1 (en) * 2008-02-05 2009-08-06 Philippe Gastaldo Device for inspecting semi-conductor wafers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022548307A (ja) * 2019-09-20 2022-11-17 エヌディーシー テクノロジーズ インコーポレイテッド レーザー干渉法システムおよび方法
JP7636401B2 (ja) 2019-09-20 2025-02-26 ノードソン コーポレーション レーザー干渉法システムおよび方法

Also Published As

Publication number Publication date
TW201802461A (zh) 2018-01-16
CN109073566B (zh) 2022-07-19
US11092644B2 (en) 2021-08-17
US20200271718A1 (en) 2020-08-27
WO2017167573A1 (fr) 2017-10-05
CN109073566A (zh) 2018-12-21
KR20180123699A (ko) 2018-11-19
FR3049710A1 (fr) 2017-10-06
EP3436807B1 (fr) 2020-12-02
FR3049710B1 (fr) 2020-06-19
EP3436807A1 (fr) 2019-02-06
SG11201808303YA (en) 2018-10-30

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