JP2019518138A - 堆積源を搬送するための装置及び方法 - Google Patents
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Abstract
Description
図6の概略図では、第1の平面510が図表面に垂直であり、基板130が図表面に平行に配置されている。
Claims (16)
- 堆積源(120)を非接触方式で搬送するための装置(100)であって、
堆積源アセンブリ(110)を備え、前記堆積源アセンブリが、
前記堆積源、及び
第1のアクティブ磁気ユニット(150)を備え、
前記装置が、更に、
源搬送方向に延在するガイド構造体(170)であって、前記ガイド構造体に沿って前記堆積源アセンブリが移動可能である、ガイド構造体を備え、
前記第1のアクティブ磁気ユニットと前記ガイド構造体が、前記堆積源アセンブリを浮揚させるための第1の磁気浮揚力(F1)を提供するように構成されている、装置。 - 前記第1のアクティブ磁気ユニットを制御して、前記堆積源を垂直方向(Y)に位置合わせするように構成された、コントローラ(580)を更に備える、請求項1に記載の装置。
- 前記堆積源が、蒸発源又はスパッタ源である、請求項1又は2に記載の装置。
- 前記第1のアクティブ磁気ユニットが、電磁デバイス、ソレノイド、コイル、超電導磁石、及びそれらの任意の組み合せから成る群から選択された要素である、請求項1から3のいずれか一項に記載の装置。
- 前記ガイド構造体が、磁性材料、特に、強磁性材料から作られている、請求項1から4のいずれか一項に記載の装置。
- 前記ガイド構造体に沿って前記源搬送方向に前記堆積源アセンブリを非接触方式で搬送するように構成された磁気駆動システムを更に備える、請求項1から5のいずれか一項に記載の装置。
- 堆積源(120)を非接触方式で浮揚させるための装置であって、
堆積源アセンブリ(110)の第1の回転軸(520)を含む第1の平面(510)を有する前記堆積源アセンブリを備え、前記堆積源アセンブリが、
前記堆積源、
前記第1の平面の第1の側に配置された第1のアクティブ磁気ユニット(150)、及び
前記第1の平面の第2の側に配置された第2のアクティブ磁気ユニット(554)を備え、
前記第1のアクティブ磁気ユニットと前記第2のアクティブ磁気ユニットが、前記堆積源の位置合わせのために、前記堆積源アセンブリを磁気的に浮揚させるように、且つ、前記第1の回転軸の周りで前記堆積源を回転させるように構成されている、装置。 - 前記堆積源アセンブリが、前記堆積源アセンブリを磁気的に浮揚させるように構成された第3のアクティブ磁気ユニット(930)及び第4のアクティブ磁気ユニット(940)を更に備え、
前記第3のアクティブ磁気ユニットが、前記第1の平面の第1の側に配置され、
前記第4のアクティブ磁気ユニットが、前記第1の平面の第2の側に配置され、
前記第1のアクティブ磁気ユニット、前記第2のアクティブ磁気ユニット、前記第3のアクティブ磁気ユニット、及び前記第4のアクティブ磁気ユニットが、前記堆積源の位置合わせのために、前記堆積源アセンブリの前記第1の回転軸と第2の回転軸(912)の周りで前記堆積源アセンブリを回転させるように構成されている、請求項7に記載の装置。 - 前記第1の回転軸が、前記装置の基板受け入れエリア(210)に平行であり、前記第2の回転軸が、前記基板受け入れエリアに垂直である、請求項8に記載の装置。
- 前記装置が、更に、
第1の横断力(T1)を提供するように構成された第1のパッシブ磁気ユニット(760)、
第1の反横断力(O1)を提供するように構成された更なるアクティブ磁気ユニット(750)であって、前記第1の反横断力が前記第1の横断力に反作用する調整可能な力である、更なるアクティブ磁気ユニット、及び
前記更なるアクティブ磁気ユニットを制御して、前記堆積源の横断方向の位置合わせを提供するように構成された、コントローラ(580)を備える、請求項7から9のいずれか一項に記載の装置。 - 堆積源(120)を非接触方式で位置合わせするための方法であって、
調整可能な磁場を生成して、前記堆積源を浮揚させること、及び
前記調整可能な磁場を制御して、前記堆積源を位置合わせすることを含む、方法。 - 堆積源(120)を非接触方式で位置合わせするための方法であって、
第1の磁気浮揚力(F1)と第2の磁気浮揚力(F2)を提供して、前記堆積源を浮揚させることであって、前記第1の磁気浮揚力が前記第2の磁気浮揚力から離れている、前記堆積源を浮揚させること、及び
前記第1の磁気浮揚力と前記第2の磁気浮揚力のうちの少なくとも一方を制御して、前記堆積源を位置合わせすることを含む、方法。 - 第3の磁気浮揚力と第4の磁気浮揚力を提供して、前記堆積源を浮揚させることであって、前記第3の磁気浮揚力が前記第4の磁気浮揚力から離れており、前記第1の磁気浮揚力、前記第2の磁気浮揚力、前記第3の磁気浮揚力、及び前記第4の磁気浮揚力が、第1の回転軸(520)に関してと、第2の回転軸(912)に関して、前記堆積源を回転させるように構成されている、前記堆積源を浮揚させること、並びに
前記第1の磁気浮揚力、前記第2の磁気浮揚力、前記第3の磁気浮揚力、及び前記第4の磁気浮揚力のうちの少なくとも1つを制御して、前記堆積源を位置合わせすることを更に含む、請求項12に記載の方法。 - 前記堆積源に作用する第1の横断力(T1)であって、第1のパッシブ磁気ユニット(760)を使用して提供される、第1の横断力を提供すること、
前記堆積源に作用する第1の反横断力(O1)であって、前記第1の横断力に反作用する調整可能な磁力である、第1の反横断力を提供すること、及び
前記第1の反横断力を制御して、前記堆積源の横断方向の位置合わせを提供することを更に含む、請求項11から13のいずれか一項に記載の方法。 - 前記堆積源の前記位置合わせが、前記堆積源が第1の位置にあるときに実行され、前記方法が、更に、
前記第1の位置から第2の位置へ前記堆積源を搬送すること、及び
前記堆積源が前記第2の位置にあるときに、前記堆積源を非接触方式で位置合わせすることを含む、請求項11から14のいずれか一項に記載の方法。 - 前記堆積源の前記位置合わせが、前記堆積源が第1の基板を通り過ぎる間に第1の基板に対して実行され、特に、前記堆積源が第1の位置にある第1の基板を通り過ぎる間に第1の基板に対して実行され、前記堆積源が前記第1の位置とは異なる第2の位置にある第2の基板を通り過ぎる間に第2の基板に対して実行される、請求項11から15のいずれか一項に記載の方法。
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CN112899613B (zh) * | 2021-01-15 | 2022-07-29 | Tcl华星光电技术有限公司 | 金属掩膜板及其使用方法 |
CN114525474A (zh) * | 2022-03-10 | 2022-05-24 | 武汉华星光电半导体显示技术有限公司 | 蒸镀坩埚及蒸镀装置 |
DE102022110019A1 (de) | 2022-04-26 | 2023-10-26 | VON ARDENNE Asset GmbH & Co. KG | Verfahren und Beschichtungsanordnung |
EP4270444A1 (en) * | 2022-04-27 | 2023-11-01 | Bühler Alzenau GmbH | Magnetron sputtering system with tubular sputter cathode and method for controlling a layer thickness |
CN115233154A (zh) * | 2022-06-28 | 2022-10-25 | 合肥维信诺科技有限公司 | 一种掩膜板、掩膜板张网装置及张网方法 |
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JP4609759B2 (ja) * | 2005-03-24 | 2011-01-12 | 三井造船株式会社 | 成膜装置 |
TWI312012B (en) * | 2005-07-13 | 2009-07-11 | Applied Materials Inc | Improved magnetron sputtering system for large-area substrates having removable anodes |
JP2009167528A (ja) * | 2008-01-16 | 2009-07-30 | Applied Materials Inc | スパッタコーティング装置 |
EP2747122B1 (en) * | 2012-12-20 | 2019-07-03 | Applied Materials, Inc. | Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof |
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WO2022158351A1 (ja) * | 2021-01-25 | 2022-07-28 | 東京エレクトロン株式会社 | 基板の搬送を行う装置、基板を処理するシステム及び基板を処理する方法 |
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KR102152890B1 (ko) | 2020-10-26 |
US20190292653A1 (en) | 2019-09-26 |
TW201802278A (zh) | 2018-01-16 |
KR102017875B1 (ko) | 2019-09-03 |
KR20190103487A (ko) | 2019-09-04 |
TWI635195B (zh) | 2018-09-11 |
JP6605759B2 (ja) | 2019-11-13 |
TW201839157A (zh) | 2018-11-01 |
WO2017198297A1 (en) | 2017-11-23 |
KR20180128497A (ko) | 2018-12-03 |
CN110527972B (zh) | 2021-12-28 |
CN110527972A (zh) | 2019-12-03 |
CN109154066B (zh) | 2019-09-13 |
CN109154066A (zh) | 2019-01-04 |
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