JP2019511823A - チューナビリティ用非磁性金属部分が組み込まれた永久磁石粒子ビーム装置及び方法 - Google Patents
チューナビリティ用非磁性金属部分が組み込まれた永久磁石粒子ビーム装置及び方法 Download PDFInfo
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- JP2019511823A JP2019511823A JP2018553215A JP2018553215A JP2019511823A JP 2019511823 A JP2019511823 A JP 2019511823A JP 2018553215 A JP2018553215 A JP 2018553215A JP 2018553215 A JP2018553215 A JP 2018553215A JP 2019511823 A JP2019511823 A JP 2019511823A
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- 239000002245 particle Substances 0.000 title claims abstract description 105
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000002184 metal Substances 0.000 title claims description 37
- 229910052751 metal Inorganic materials 0.000 title claims description 37
- 238000009833 condensation Methods 0.000 claims abstract description 17
- 230000005494 condensation Effects 0.000 claims abstract description 17
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 239000004020 conductor Substances 0.000 claims description 5
- 230000002452 interceptive effect Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000005421 electrostatic potential Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/027—Construction of the gun or parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/64—Magnetic lenses
- H01J29/68—Magnetic lenses using permanent magnets only
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
- H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
- H01F1/0571—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
- H01F1/0575—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together
- H01F1/0577—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together sintered
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/36—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/143—Permanent magnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/70—Electron beam control outside the vessel
- H01J2229/703—Electron beam control outside the vessel by magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/029—Schematic arrangements for beam forming
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
- Electron Beam Exposure (AREA)
Abstract
Description
本願は2016年4月11日付米国仮特許出願第62/321077号の利益を主張する出願であるので、同米国仮特許出願の全容をこの参照を以て本願に繰り入れることにする。
Claims (18)
- 粒子ビームを放出する帯電粒子ビームエミッタと、
帯電粒子ビームの凝縮を制御するための磁界を形成する一組の永久磁石と、
上記磁界内で運動する帯電粒子ビームの運動エネルギを制御すべく上記一組の永久磁石と併置された非磁性導電体部材と、
を備える永久磁石粒子ビーム装置。 - 請求項1に記載の永久磁石粒子ビーム装置であって、上記帯電粒子ビームが電子ビームである永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材が上記一組の永久磁石に連結されている永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材が上記一組の永久磁石から分離されている永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材が、上記磁界が最強な個所に配置されている永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材が金属である永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材の第1開口、即ち上記帯電粒子ビームを上記エミッタから入力として受け取る開口が、その非磁性導電体部材の第2開口、即ちそれを介し上記帯電粒子ビームが出て行く開口より大きい永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材の形状が、上記帯電粒子ビームの運動エネルギが制御される度合に影響を及ぼす永久磁石粒子ビーム装置。
- 請求項1に記載の永久磁石粒子ビーム装置であって、上記非磁性導電体部材が、上記一組の永久磁石により形成された磁界と干渉することなく、その磁界内で運動する帯電粒子ビームの運動エネルギを制御する永久磁石粒子ビーム装置。
- 永久磁石粒子ビーム装置を通る粒子ビームを制御する方法であって、
粒子ビームエミッタにより帯電粒子ビームを放出するステップと、
一組の永久磁石により形成された磁界内に上記帯電粒子ビームを送ることでその帯電粒子ビームの凝縮を制御するステップと、
上記磁界内で運動する帯電粒子ビームの運動エネルギを、上記一組の永久磁石と併置された非磁性導電体部材を用い制御するステップと、
を有する方法。 - 請求項10に記載の方法であって、上記帯電粒子ビームが電子ビームである方法。
- 請求項10に記載の方法であって、上記非磁性導電体部材が上記一組の永久磁石に連結されている方法。
- 請求項10に記載の方法であって、上記非磁性導電体部材が上記一組の永久磁石から分離されている方法。
- 請求項10に記載の方法であって、上記非磁性導電体部材が、上記磁界が最強な個所に配置されている方法。
- 請求項10に記載の方法であって、上記非磁性導電体部材が、上記磁界が最強な個所の近くに配置されている方法。
- 請求項10に記載の方法であって、上記帯電粒子ビームを上記非磁性導電体部材の第1開口にて入力として受け取り、その非磁性導電体部材の第2開口を介し出力する方法であり、第1開口が第2開口より大きい方法。
- 請求項10に記載の方法であって、上記帯電粒子ビームの運動エネルギが制御される度合が上記非磁性導電体部材の形状に依拠して制御される方法。
- 請求項10に記載の方法であって、上記非磁性導電体部材が、上記一組の永久磁石により形成された磁界と干渉することなく、その磁界内で運動する帯電粒子ビームの運動エネルギを制御する方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662321077P | 2016-04-11 | 2016-04-11 | |
US62/321,077 | 2016-04-11 | ||
US15/429,071 US10211021B2 (en) | 2016-04-11 | 2017-02-09 | Permanent-magnet particle beam apparatus and method incorporating a non-magnetic metal portion for tunability |
US15/429,071 | 2017-02-09 | ||
PCT/US2017/026438 WO2017180441A1 (en) | 2016-04-11 | 2017-04-06 | Permanent-magnet particle beam apparatus and method incorporating a non-magnetic metal portion for tunability |
Publications (3)
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JP2019511823A true JP2019511823A (ja) | 2019-04-25 |
JP2019511823A5 JP2019511823A5 (ja) | 2020-05-14 |
JP6877462B2 JP6877462B2 (ja) | 2021-05-26 |
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JP2018553215A Active JP6877462B2 (ja) | 2016-04-11 | 2017-04-06 | チューナビリティ用非磁性金属部分が組み込まれた永久磁石粒子ビーム装置及び方法 |
Country Status (7)
Country | Link |
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US (1) | US10211021B2 (ja) |
EP (1) | EP3443822B1 (ja) |
JP (1) | JP6877462B2 (ja) |
KR (1) | KR102277428B1 (ja) |
CN (1) | CN109076689B (ja) |
TW (1) | TWI722167B (ja) |
WO (1) | WO2017180441A1 (ja) |
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KR102581477B1 (ko) | 2021-07-30 | 2023-09-21 | 주식회사 비비도 | 집중 광조사 장치 및 이를 포함하는 미용장치 세트 |
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2017
- 2017-02-09 US US15/429,071 patent/US10211021B2/en active Active
- 2017-04-06 JP JP2018553215A patent/JP6877462B2/ja active Active
- 2017-04-06 WO PCT/US2017/026438 patent/WO2017180441A1/en active Application Filing
- 2017-04-06 KR KR1020187032653A patent/KR102277428B1/ko active IP Right Grant
- 2017-04-06 EP EP17782880.3A patent/EP3443822B1/en active Active
- 2017-04-06 CN CN201780022252.6A patent/CN109076689B/zh active Active
- 2017-04-11 TW TW106111968A patent/TWI722167B/zh active
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CN109076689A (zh) | 2018-12-21 |
KR102277428B1 (ko) | 2021-07-13 |
US20170294286A1 (en) | 2017-10-12 |
TW201811125A (zh) | 2018-03-16 |
KR20180125608A (ko) | 2018-11-23 |
WO2017180441A1 (en) | 2017-10-19 |
CN109076689B (zh) | 2020-01-07 |
TWI722167B (zh) | 2021-03-21 |
EP3443822A1 (en) | 2019-02-20 |
EP3443822A4 (en) | 2019-10-23 |
US10211021B2 (en) | 2019-02-19 |
JP6877462B2 (ja) | 2021-05-26 |
EP3443822B1 (en) | 2024-06-05 |
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