JP2019511107A5 - - Google Patents

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JP2019511107A5
JP2019511107A5 JP2019502537A JP2019502537A JP2019511107A5 JP 2019511107 A5 JP2019511107 A5 JP 2019511107A5 JP 2019502537 A JP2019502537 A JP 2019502537A JP 2019502537 A JP2019502537 A JP 2019502537A JP 2019511107 A5 JP2019511107 A5 JP 2019511107A5
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electron
exposures
sample
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JP2019502537A
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Japanese (ja)
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JP7041666B2 (ja
JP2019511107A (ja
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Priority claimed from US15/387,388 external-priority patent/US10460903B2/en
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JP2019502537A 2016-04-04 2017-03-31 走査電子顕微鏡検査装置および方法 Active JP7041666B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662318078P 2016-04-04 2016-04-04
US62/318,078 2016-04-04
US15/387,388 2016-12-21
US15/387,388 US10460903B2 (en) 2016-04-04 2016-12-21 Method and system for charge control for imaging floating metal structures on non-conducting substrates
PCT/US2017/025595 WO2017176595A1 (en) 2016-04-04 2017-03-31 Method and system for charge control for imaging floating metal structures on non-conducting substrates

Publications (3)

Publication Number Publication Date
JP2019511107A JP2019511107A (ja) 2019-04-18
JP2019511107A5 true JP2019511107A5 (https=) 2020-05-14
JP7041666B2 JP7041666B2 (ja) 2022-03-24

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JP2019502537A Active JP7041666B2 (ja) 2016-04-04 2017-03-31 走査電子顕微鏡検査装置および方法

Country Status (9)

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US (1) US10460903B2 (https=)
EP (1) EP3443577A4 (https=)
JP (1) JP7041666B2 (https=)
KR (1) KR102215496B1 (https=)
CN (1) CN109075001B (https=)
IL (1) IL261616B (https=)
SG (1) SG11201807248UA (https=)
TW (1) TWI716575B (https=)
WO (1) WO2017176595A1 (https=)

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DE102019218315B3 (de) 2019-11-27 2020-10-01 Carl Zeiss Microscopy Gmbh Verfahren zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop, Korpuskularvielstrahlmikroskop für Spannungskontrastbildgebung und Halbleiterstrukturen zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
EP4060714A1 (en) * 2021-03-18 2022-09-21 ASML Netherlands B.V. Flood column and charged particleapparatus
WO2024184078A2 (en) * 2023-03-03 2024-09-12 Carl Zeiss Smt Gmbh Method and systems for balancing charges on a surface of an object comprising integrated circuit patterns in a scanning electron microscope
WO2025098639A1 (en) * 2023-11-07 2025-05-15 Carl Zeiss Multisem Gmbh Multi-beam charged particle microscope for inspection with reduced charging effects

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US6066849A (en) 1997-01-16 2000-05-23 Kla Tencor Scanning electron beam microscope
US5869833A (en) 1997-01-16 1999-02-09 Kla-Tencor Corporation Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
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US6232787B1 (en) * 1999-01-08 2001-05-15 Schlumberger Technologies, Inc. Microstructure defect detection
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US6445199B1 (en) * 1999-12-14 2002-09-03 Kla-Tencor Corporation Methods and apparatus for generating spatially resolved voltage contrast maps of semiconductor test structures
US6627884B2 (en) 2001-03-19 2003-09-30 Kla-Tencor Technologies Corporation Simultaneous flooding and inspection for charge control in an electron beam inspection machine
EP1302971B1 (en) * 2001-10-10 2009-12-23 Applied Materials Israel Ltd. Method and device for the automatic generation of images adapted to align a charged particle beam column
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