JP2019502959A5 - - Google Patents
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- JP2019502959A5 JP2019502959A5 JP2018536101A JP2018536101A JP2019502959A5 JP 2019502959 A5 JP2019502959 A5 JP 2019502959A5 JP 2018536101 A JP2018536101 A JP 2018536101A JP 2018536101 A JP2018536101 A JP 2018536101A JP 2019502959 A5 JP2019502959 A5 JP 2019502959A5
- Authority
- JP
- Japan
- Prior art keywords
- along
- sub
- overlay target
- elements
- metric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 19
- 230000000737 periodic effect Effects 0.000 claims 12
- 230000011218 segmentation Effects 0.000 claims 9
- 238000004590 computer program Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 238000005303 weighing Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022122800A JP7477564B2 (ja) | 2016-01-11 | 2022-08-01 | ホットスポット及びプロセスウィンドウ監視装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662277274P | 2016-01-11 | 2016-01-11 | |
| US62/277,274 | 2016-01-11 | ||
| PCT/US2017/012490 WO2017123464A1 (en) | 2016-01-11 | 2017-01-06 | Hot spot and process window monitoring |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022122800A Division JP7477564B2 (ja) | 2016-01-11 | 2022-08-01 | ホットスポット及びプロセスウィンドウ監視装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502959A JP2019502959A (ja) | 2019-01-31 |
| JP2019502959A5 true JP2019502959A5 (https=) | 2020-02-06 |
| JP7117242B2 JP7117242B2 (ja) | 2022-08-12 |
Family
ID=59312167
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018536101A Active JP7117242B2 (ja) | 2016-01-11 | 2017-01-06 | ホットスポット及び処理窓監視 |
| JP2022122800A Active JP7477564B2 (ja) | 2016-01-11 | 2022-08-01 | ホットスポット及びプロセスウィンドウ監視装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022122800A Active JP7477564B2 (ja) | 2016-01-11 | 2022-08-01 | ホットスポット及びプロセスウィンドウ監視装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US10354035B2 (https=) |
| EP (1) | EP3403142B1 (https=) |
| JP (2) | JP7117242B2 (https=) |
| KR (1) | KR102424805B1 (https=) |
| CN (2) | CN112925177B (https=) |
| IL (2) | IL259823B (https=) |
| TW (1) | TWI730031B (https=) |
| WO (1) | WO2017123464A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10628544B2 (en) | 2017-09-25 | 2020-04-21 | International Business Machines Corporation | Optimizing integrated circuit designs based on interactions between multiple integration design rules |
| CN109581817B (zh) * | 2017-09-29 | 2021-07-06 | 联华电子股份有限公司 | 半导体装置的形成方法 |
| US10795268B2 (en) * | 2017-09-29 | 2020-10-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for measuring overlay errors using overlay measurement patterns |
| KR102154959B1 (ko) | 2020-04-29 | 2020-09-10 | 동아에스티 주식회사 | 지속형 glp-1 및 글루카곤 수용체 이중작용제 |
| US11862524B2 (en) | 2021-06-28 | 2024-01-02 | Kla Corporation | Overlay mark design for electron beam overlay |
| US11703767B2 (en) * | 2021-06-28 | 2023-07-18 | Kla Corporation | Overlay mark design for electron beam overlay |
| KR102871169B1 (ko) * | 2021-12-17 | 2025-10-14 | 케이엘에이 코포레이션 | 개선된 타겟 배치 정확성을 위한 오버레이 타겟 설계 |
| WO2023113850A1 (en) | 2021-12-17 | 2023-06-22 | Kla Corporation | Overlay target design for improved target placement accuracy |
| US20240053673A1 (en) * | 2022-08-11 | 2024-02-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method of signal enhancement for alignment patterns |
| CN116341139B (zh) * | 2023-03-23 | 2025-10-17 | 浙江大学 | 一种提高非对称柱塞泵极限转速的过渡区偏置设计方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6128089A (en) * | 1998-07-28 | 2000-10-03 | International Business Machines Corporation | Combined segmented and nonsegmented bar-in-bar targets |
| US7068833B1 (en) * | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| JP5180419B2 (ja) * | 2000-08-30 | 2013-04-10 | ケーエルエー−テンカー・コーポレーション | 重ね合わせマーク、重ね合わせマークの設計方法および重ね合わせ測定の方法 |
| US20030002043A1 (en) | 2001-04-10 | 2003-01-02 | Kla-Tencor Corporation | Periodic patterns and technique to control misalignment |
| US6884552B2 (en) * | 2001-11-09 | 2005-04-26 | Kla-Tencor Technologies Corporation | Focus masking structures, focus patterns and measurements thereof |
| US6772084B2 (en) * | 2002-01-31 | 2004-08-03 | Timbre Technologies, Inc. | Overlay measurements using periodic gratings |
| US7804994B2 (en) * | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
| WO2004090979A2 (en) * | 2003-04-08 | 2004-10-21 | Aoti Operating Company, Inc | Overlay metrology mark |
| US7112890B2 (en) * | 2003-10-30 | 2006-09-26 | Asml Holding N.V. | Tunable alignment geometry |
| JP2006039148A (ja) * | 2004-07-26 | 2006-02-09 | Toshiba Corp | ホトマスク、それを用いたフォーカス測定方法および半導体装置の製造方法 |
| US7655388B2 (en) * | 2005-01-03 | 2010-02-02 | Chartered Semiconductor Manufacturing, Ltd. | Mask and method to pattern chromeless phase lithography contact hole |
| US7557921B1 (en) * | 2005-01-14 | 2009-07-07 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools |
| DE102005046973B4 (de) * | 2005-09-30 | 2014-01-30 | Globalfoundries Inc. | Struktur und Verfahren zum gleichzeitigen Bestimmen einer Überlagerungsgenauigkeit und eines Musteranordnungsfehlers |
| US20070111109A1 (en) * | 2005-11-14 | 2007-05-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photolithography scattering bar structure and method |
| NL1036856A1 (nl) | 2008-04-24 | 2009-10-27 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| EP2392970A3 (en) * | 2010-02-19 | 2017-08-23 | ASML Netherlands BV | Method and apparatus for controlling a lithographic apparatus |
| JP5821100B2 (ja) * | 2010-12-17 | 2015-11-24 | カール ツァイス エスエムエス ゲーエムベーハー | フォトリソグラフィマスクによって処理されるウェーハ上の誤差を補正する方法及び装置 |
| KR101983615B1 (ko) * | 2012-06-22 | 2019-05-29 | 에이에스엠엘 네델란즈 비.브이. | 포커스를 결정하는 방법, 검사 장치, 패터닝 장치, 기판, 및 디바이스 제조 방법 |
| JP6478974B2 (ja) * | 2013-04-10 | 2019-03-06 | ケーエルエー−テンカー コーポレイション | 標的設計及び製造における誘導自己組織化 |
| US20150043391A1 (en) | 2013-08-08 | 2015-02-12 | Sharp Laboratories Of America, Inc. | Systems and methods for reconfiguration signaling |
| CN108931891B (zh) | 2013-12-17 | 2020-11-03 | Asml荷兰有限公司 | 检查方法、光刻设备、掩模以及衬底 |
| WO2015196168A1 (en) * | 2014-06-21 | 2015-12-23 | Kla-Tencor Corporation | Compound imaging metrology targets |
| JP6723269B2 (ja) * | 2015-05-15 | 2020-07-15 | ケーエルエー コーポレイション | 焦点感応オーバーレイターゲットを使用する焦点決定のためのシステムおよび方法 |
-
2017
- 2017-01-06 WO PCT/US2017/012490 patent/WO2017123464A1/en not_active Ceased
- 2017-01-06 CN CN202110404661.0A patent/CN112925177B/zh active Active
- 2017-01-06 JP JP2018536101A patent/JP7117242B2/ja active Active
- 2017-01-06 KR KR1020187023048A patent/KR102424805B1/ko active Active
- 2017-01-06 US US15/509,728 patent/US10354035B2/en active Active
- 2017-01-06 CN CN201780005930.8A patent/CN108475026B/zh active Active
- 2017-01-06 EP EP17738757.8A patent/EP3403142B1/en active Active
- 2017-01-11 TW TW106100886A patent/TWI730031B/zh active
-
2018
- 2018-06-05 IL IL259823A patent/IL259823B/en unknown
-
2019
- 2019-06-04 US US16/431,330 patent/US10755016B2/en active Active
-
2021
- 2021-08-11 IL IL285530A patent/IL285530B/en unknown
-
2022
- 2022-08-01 JP JP2022122800A patent/JP7477564B2/ja active Active
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