JP2019203863A5 - - Google Patents

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Publication number
JP2019203863A5
JP2019203863A5 JP2018101008A JP2018101008A JP2019203863A5 JP 2019203863 A5 JP2019203863 A5 JP 2019203863A5 JP 2018101008 A JP2018101008 A JP 2018101008A JP 2018101008 A JP2018101008 A JP 2018101008A JP 2019203863 A5 JP2019203863 A5 JP 2019203863A5
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Japan
Prior art keywords
wavefront
light
sensor according
wavefront sensor
optical
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JP2018101008A
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Japanese (ja)
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JP7199835B2 (ja
JP2019203863A (ja
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Priority to JP2018101008A priority Critical patent/JP7199835B2/ja
Priority claimed from JP2018101008A external-priority patent/JP7199835B2/ja
Priority to US16/416,894 priority patent/US11513344B2/en
Priority to EP19175679.0A priority patent/EP3575760A1/en
Publication of JP2019203863A publication Critical patent/JP2019203863A/ja
Publication of JP2019203863A5 publication Critical patent/JP2019203863A5/ja
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JP2018101008A 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法 Active JP7199835B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018101008A JP7199835B2 (ja) 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法
US16/416,894 US11513344B2 (en) 2018-05-25 2019-05-20 Sensor and measurement apparatus for wavefront of light from optical element, and method of manufacturing optical element and optical system
EP19175679.0A EP3575760A1 (en) 2018-05-25 2019-05-21 Wavefront sensor, wavefront measurement apparatus, method of manufacturing optical element, and method of manufacturing optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018101008A JP7199835B2 (ja) 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法

Publications (3)

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JP2019203863A JP2019203863A (ja) 2019-11-28
JP2019203863A5 true JP2019203863A5 (enExample) 2021-07-26
JP7199835B2 JP7199835B2 (ja) 2023-01-06

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JP2018101008A Active JP7199835B2 (ja) 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法

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US (1) US11513344B2 (enExample)
EP (1) EP3575760A1 (enExample)
JP (1) JP7199835B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115917304A (zh) * 2020-06-17 2023-04-04 康宁公司 用于测量玻璃基基板的特征的方法和装置
CN111829671B (zh) * 2020-09-08 2023-01-03 中国工程物理研究院应用电子学研究所 一种高分辨波前检测装置及波前复原方法
WO2022158957A1 (en) 2021-01-21 2022-07-28 Latvijas Universitates Cietvielu Fizikas Instituts Coded diffraction pattern wavefront sensing device and method
CN115183886B (zh) * 2022-07-11 2024-10-18 中国科学院光电技术研究所 一种基于离焦光栅阵列的波前传感器
WO2025191923A1 (ja) * 2024-03-12 2025-09-18 パナソニックＩｐマネジメント株式会社 波面測定の補正方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5936720A (en) * 1996-07-10 1999-08-10 Neal; Daniel R. Beam characterization by wavefront sensor
JP2002270491A (ja) * 2001-03-12 2002-09-20 Nikon Corp 露光装置、露光装置の製造方法、波面収差計測装置及びマイクロデバイスの製造方法
US7119905B2 (en) * 2003-08-26 2006-10-10 Ut-Battelle Llc Spatial-heterodyne interferometry for transmission (SHIFT) measurements
JP2006030016A (ja) * 2004-07-16 2006-02-02 Nikon Corp 波面収差測定装置の校正方法、波面収差測定方法、波面収差測定装置、投影光学系の製造方法、投影光学系、投影露光装置の製造方法、投影露光装置、マイクロデバイスの製造方法、及びマイクロデバイス
EP2359108B1 (en) * 2008-11-19 2017-08-30 BAE Systems PLC Mirror structure
CA2767900C (en) 2009-07-20 2017-08-15 Thorlabs, Inc. Shack hartman sensor with removable lenslet array
JP4968966B2 (ja) * 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP2011196732A (ja) * 2010-03-18 2011-10-06 Hitachi Ltd 波面収差測定方法及びその装置
JP2014191190A (ja) * 2013-03-27 2014-10-06 Fujifilm Corp 赤外線吸収性組成物、赤外線カットフィルタ、カメラモジュール及びカメラモジュールの製造方法
JP2015055544A (ja) * 2013-09-11 2015-03-23 キヤノン株式会社 波面計測装置、波面計測方法、光学素子の製造方法、および、光学システムの組み立て調整装置
JP2015210241A (ja) * 2014-04-30 2015-11-24 キヤノン株式会社 波面計測方法、波面計測装置、及び光学素子の製造方法

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