JP7199835B2 - 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法 - Google Patents

波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法 Download PDF

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JP7199835B2
JP7199835B2 JP2018101008A JP2018101008A JP7199835B2 JP 7199835 B2 JP7199835 B2 JP 7199835B2 JP 2018101008 A JP2018101008 A JP 2018101008A JP 2018101008 A JP2018101008 A JP 2018101008A JP 7199835 B2 JP7199835 B2 JP 7199835B2
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Prior art keywords
wavefront
light
flat glass
transmitting member
dividing
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JP2018101008A
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Japanese (ja)
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JP2019203863A (ja
JP2019203863A5 (enExample
Inventor
智洋 杉本
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018101008A priority Critical patent/JP7199835B2/ja
Priority to US16/416,894 priority patent/US11513344B2/en
Priority to EP19175679.0A priority patent/EP3575760A1/en
Publication of JP2019203863A publication Critical patent/JP2019203863A/ja
Publication of JP2019203863A5 publication Critical patent/JP2019203863A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0292—Testing optical properties of objectives by measuring the optical modulation transfer function
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/16—Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
    • G02B5/1885—Arranged as a periodic array
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J2009/002—Wavefront phase distribution

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Filters (AREA)
JP2018101008A 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法 Active JP7199835B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018101008A JP7199835B2 (ja) 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法
US16/416,894 US11513344B2 (en) 2018-05-25 2019-05-20 Sensor and measurement apparatus for wavefront of light from optical element, and method of manufacturing optical element and optical system
EP19175679.0A EP3575760A1 (en) 2018-05-25 2019-05-21 Wavefront sensor, wavefront measurement apparatus, method of manufacturing optical element, and method of manufacturing optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018101008A JP7199835B2 (ja) 2018-05-25 2018-05-25 波面センサ、波面計測装置、光学素子の製造方法、光学系の製造方法

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JP2019203863A JP2019203863A (ja) 2019-11-28
JP2019203863A5 JP2019203863A5 (enExample) 2021-07-26
JP7199835B2 true JP7199835B2 (ja) 2023-01-06

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US (1) US11513344B2 (enExample)
EP (1) EP3575760A1 (enExample)
JP (1) JP7199835B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023530429A (ja) * 2020-06-17 2023-07-18 コーニング インコーポレイテッド ガラス系基板の特徴を測定するための方法及び装置
CN111829671B (zh) * 2020-09-08 2023-01-03 中国工程物理研究院应用电子学研究所 一种高分辨波前检测装置及波前复原方法
WO2022158957A1 (en) 2021-01-21 2022-07-28 Latvijas Universitates Cietvielu Fizikas Instituts Coded diffraction pattern wavefront sensing device and method
CN115183886B (zh) * 2022-07-11 2024-10-18 中国科学院光电技术研究所 一种基于离焦光栅阵列的波前传感器
WO2025191923A1 (ja) * 2024-03-12 2025-09-18 パナソニックＩｐマネジメント株式会社 波面測定の補正方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002270491A (ja) 2001-03-12 2002-09-20 Nikon Corp 露光装置、露光装置の製造方法、波面収差計測装置及びマイクロデバイスの製造方法
JP2006030016A (ja) 2004-07-16 2006-02-02 Nikon Corp 波面収差測定装置の校正方法、波面収差測定方法、波面収差測定装置、投影光学系の製造方法、投影光学系、投影露光装置の製造方法、投影露光装置、マイクロデバイスの製造方法、及びマイクロデバイス
WO2010058193A2 (en) 2008-11-19 2010-05-27 Bae Systems Plc Mirror structure
JP2011117897A (ja) 2009-12-07 2011-06-16 Canon Inc 屈折率分布の計測方法および計測装置
JP2011196732A (ja) 2010-03-18 2011-10-06 Hitachi Ltd 波面収差測定方法及びその装置
JP2015055544A (ja) 2013-09-11 2015-03-23 キヤノン株式会社 波面計測装置、波面計測方法、光学素子の製造方法、および、光学システムの組み立て調整装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5936720A (en) * 1996-07-10 1999-08-10 Neal; Daniel R. Beam characterization by wavefront sensor
US7119905B2 (en) * 2003-08-26 2006-10-10 Ut-Battelle Llc Spatial-heterodyne interferometry for transmission (SHIFT) measurements
CA2767900C (en) 2009-07-20 2017-08-15 Thorlabs, Inc. Shack hartman sensor with removable lenslet array
JP2014191190A (ja) * 2013-03-27 2014-10-06 Fujifilm Corp 赤外線吸収性組成物、赤外線カットフィルタ、カメラモジュール及びカメラモジュールの製造方法
JP2015210241A (ja) * 2014-04-30 2015-11-24 キヤノン株式会社 波面計測方法、波面計測装置、及び光学素子の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002270491A (ja) 2001-03-12 2002-09-20 Nikon Corp 露光装置、露光装置の製造方法、波面収差計測装置及びマイクロデバイスの製造方法
JP2006030016A (ja) 2004-07-16 2006-02-02 Nikon Corp 波面収差測定装置の校正方法、波面収差測定方法、波面収差測定装置、投影光学系の製造方法、投影光学系、投影露光装置の製造方法、投影露光装置、マイクロデバイスの製造方法、及びマイクロデバイス
WO2010058193A2 (en) 2008-11-19 2010-05-27 Bae Systems Plc Mirror structure
JP2011117897A (ja) 2009-12-07 2011-06-16 Canon Inc 屈折率分布の計測方法および計測装置
JP2011196732A (ja) 2010-03-18 2011-10-06 Hitachi Ltd 波面収差測定方法及びその装置
JP2015055544A (ja) 2013-09-11 2015-03-23 キヤノン株式会社 波面計測装置、波面計測方法、光学素子の製造方法、および、光学システムの組み立て調整装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PFUND,J. et al.，Misalignment effects of the Shack-Hartmann sensor，APPLIED OPTICS，1998年01月01日，Vol. 37, No. 1，pp.22-27

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JP2019203863A (ja) 2019-11-28
US20190361226A1 (en) 2019-11-28
EP3575760A1 (en) 2019-12-04
US11513344B2 (en) 2022-11-29

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