JP2019195037A - 積層型キャパシタ - Google Patents
積層型キャパシタ Download PDFInfo
- Publication number
- JP2019195037A JP2019195037A JP2018194016A JP2018194016A JP2019195037A JP 2019195037 A JP2019195037 A JP 2019195037A JP 2018194016 A JP2018194016 A JP 2018194016A JP 2018194016 A JP2018194016 A JP 2018194016A JP 2019195037 A JP2019195037 A JP 2019195037A
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- JP
- Japan
- Prior art keywords
- electrode
- oxide
- layer
- layers
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000003990 capacitor Substances 0.000 title claims abstract description 27
- 239000011521 glass Substances 0.000 claims abstract description 32
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 25
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- 239000000919 ceramic Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000003985 ceramic capacitor Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/012—Form of non-self-supporting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
- H01G4/2325—Terminals electrically connecting two or more layers of a stacked or rolled capacitor characterised by the material of the terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
Abstract
Description
図1は本発明の一実施形態によるキャパシタの斜視図を概略的に示したものである。図2は図1のI−I'線に沿った断面図を概略的に示したものである。図3は本発明の一実施形態によるキャパシタの本体を製作するための内部電極が印刷されたセラミックグリーンシートを示したものである。
サンプルチップを製作するために、セラミック本体にNi及びガラスを含むペーストを塗布して第1電極層を形成した後、第1電極層の表面を酸化させて第1電極層の表面にNi酸化物を形成した。次に、Ni酸化物上にCu及びガラスを含むペーストを塗布した後、焼成して第2電極層及び酸化物層を形成した。
110 本体
111 誘電体層
112、113 カバー層
121、122 内部電極
131、132 外部電極
131a、132a 第1電極層
131b、132b 酸化物層
131c、132c 第2電極層
Claims (8)
- 誘電体層と交互に配置される内部電極を含む本体と、前記本体に配置される外部電極と、を含み、
前記外部電極は、
前記内部電極と接触する第1電極層と、
前記第1電極層上に配置され、金属酸化物及びガラスを含む酸化物層と、
前記酸化物層上に配置される第2電極層と、を含む、積層型キャパシタ。 - 前記酸化物層の厚さは0.2〜8μmである、請求項1に記載の積層型キャパシタ。
- 前記酸化物層に含まれている金属含量は20〜80重量%である、請求項1または2に記載の積層型キャパシタ。
- 前記第1電極層はNiを含む、請求項1から3のいずれか一項に記載の積層型キャパシタ。
- 前記第2電極層は、導電性金属及びガラスを含む焼成電極である、請求項1から4のいずれか一項に記載の積層型キャパシタ。
- 前記導電性金属はCuである、請求項5に記載の積層型キャパシタ。
- 前記金属酸化物はNi酸化物である、請求項1から6のいずれか一項に記載の積層型キャパシタ。
- 前記第1電極層はNiを含み、
前記金属酸化物はNi酸化物であり、
前記第2電極層はCu及びガラスを含む焼成電極である、請求項1に記載の積層型キャパシタ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2018-0050731 | 2018-05-02 | ||
KR1020180050731A KR102076153B1 (ko) | 2018-05-02 | 2018-05-02 | 적층형 커패시터 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019195037A true JP2019195037A (ja) | 2019-11-07 |
JP7111286B2 JP7111286B2 (ja) | 2022-08-02 |
Family
ID=68385157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018194016A Active JP7111286B2 (ja) | 2018-05-02 | 2018-10-15 | 積層型キャパシタ |
Country Status (4)
Country | Link |
---|---|
US (1) | US10861651B2 (ja) |
JP (1) | JP7111286B2 (ja) |
KR (1) | KR102076153B1 (ja) |
CN (1) | CN110444394B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022057916A (ja) * | 2020-09-30 | 2022-04-11 | 株式会社村田製作所 | 積層セラミックコンデンサ |
JP2022057846A (ja) * | 2020-09-30 | 2022-04-11 | 株式会社村田製作所 | 積層セラミックコンデンサ |
DE102022134924A1 (de) | 2022-01-12 | 2023-07-13 | Taiyo Yuden Co., Ltd. | Elektronische mehrschicht-keramikvorrichtung und verfahren zu deren herstellung |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190116165A (ko) * | 2019-09-02 | 2019-10-14 | 삼성전기주식회사 | 적층 세라믹 전자부품 |
KR20220074263A (ko) | 2020-11-27 | 2022-06-03 | 삼성전기주식회사 | 적층형 커패시터 |
KR20230114067A (ko) * | 2022-01-24 | 2023-08-01 | 삼성전기주식회사 | 적층형 전자 부품 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10135073A (ja) * | 1996-10-30 | 1998-05-22 | Matsushita Electric Ind Co Ltd | 複合セラミック電子部品およびその製造方法 |
JP2001223132A (ja) * | 1999-11-29 | 2001-08-17 | Tdk Corp | 電子部品およびその製造方法 |
JP2008130770A (ja) * | 2006-11-20 | 2008-06-05 | Tdk Corp | 電子部品及びその製造方法 |
JP2014027248A (ja) * | 2012-07-26 | 2014-02-06 | Samsung Electro-Mechanics Co Ltd | 積層セラミック電子部品及びその製造方法 |
Family Cites Families (13)
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US5339068A (en) | 1992-12-18 | 1994-08-16 | Mitsubishi Materials Corp. | Conductive chip-type ceramic element and method of manufacture thereof |
JPH06295803A (ja) | 1993-04-07 | 1994-10-21 | Mitsubishi Materials Corp | チップ型サーミスタ及びその製造方法 |
JP3039403B2 (ja) * | 1996-12-06 | 2000-05-08 | 株式会社村田製作所 | 積層セラミックコンデンサ |
JP3831497B2 (ja) | 1997-10-06 | 2006-10-11 | Tdk株式会社 | Cr複合電子部品とその製造方法 |
JP2000034136A (ja) * | 1998-07-17 | 2000-02-02 | Matsushita Electric Ind Co Ltd | ガラスセラミック焼結体とその製造方法、およびこの焼結体を用いたガラスセラミック配線基板とその製造方法 |
KR101099213B1 (ko) | 2006-09-22 | 2011-12-27 | 가부시키가이샤 무라타 세이사쿠쇼 | 적층 세라믹 콘덴서 |
JP4952723B2 (ja) * | 2007-02-14 | 2012-06-13 | 株式会社村田製作所 | 積層セラミックコンデンサおよびその製造方法 |
KR101525643B1 (ko) * | 2011-05-20 | 2015-06-03 | 삼성전기주식회사 | 적층형 세라믹 전자부품 |
KR101655348B1 (ko) * | 2012-02-29 | 2016-09-07 | 가부시키가이샤 무라타 세이사쿠쇼 | 도전성 페이스트, 및 전자부품, 그리고 전자부품의 제조방법 |
KR101462754B1 (ko) * | 2013-01-24 | 2014-11-17 | 삼성전기주식회사 | 적층 세라믹 커패시터 및 그 제조방법. |
KR102004789B1 (ko) * | 2014-05-07 | 2019-07-29 | 삼성전기주식회사 | 적층 세라믹 전자부품 및 그 실장 기판 |
US10840008B2 (en) * | 2015-01-15 | 2020-11-17 | Murata Manufacturing Co., Ltd. | Electronic component and electronic component-mounted structure |
US10446320B2 (en) * | 2016-04-15 | 2019-10-15 | Samsung Electro-Mechanics Co., Ltd. | Multilayer capacitor having external electrode including conductive resin layer |
-
2018
- 2018-05-02 KR KR1020180050731A patent/KR102076153B1/ko active IP Right Grant
- 2018-10-09 US US16/155,570 patent/US10861651B2/en active Active
- 2018-10-15 JP JP2018194016A patent/JP7111286B2/ja active Active
- 2018-12-12 CN CN201811515494.1A patent/CN110444394B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10135073A (ja) * | 1996-10-30 | 1998-05-22 | Matsushita Electric Ind Co Ltd | 複合セラミック電子部品およびその製造方法 |
JP2001223132A (ja) * | 1999-11-29 | 2001-08-17 | Tdk Corp | 電子部品およびその製造方法 |
JP2008130770A (ja) * | 2006-11-20 | 2008-06-05 | Tdk Corp | 電子部品及びその製造方法 |
JP2014027248A (ja) * | 2012-07-26 | 2014-02-06 | Samsung Electro-Mechanics Co Ltd | 積層セラミック電子部品及びその製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022057916A (ja) * | 2020-09-30 | 2022-04-11 | 株式会社村田製作所 | 積層セラミックコンデンサ |
JP2022057846A (ja) * | 2020-09-30 | 2022-04-11 | 株式会社村田製作所 | 積層セラミックコンデンサ |
JP7276296B2 (ja) | 2020-09-30 | 2023-05-18 | 株式会社村田製作所 | 積層セラミックコンデンサ |
DE102022134924A1 (de) | 2022-01-12 | 2023-07-13 | Taiyo Yuden Co., Ltd. | Elektronische mehrschicht-keramikvorrichtung und verfahren zu deren herstellung |
KR20230109095A (ko) | 2022-01-12 | 2023-07-19 | 다이요 유덴 가부시키가이샤 | 적층 세라믹 전자 부품 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR102076153B1 (ko) | 2020-02-11 |
US10861651B2 (en) | 2020-12-08 |
CN110444394B (zh) | 2022-07-22 |
KR20190126610A (ko) | 2019-11-12 |
CN110444394A (zh) | 2019-11-12 |
US20190341190A1 (en) | 2019-11-07 |
JP7111286B2 (ja) | 2022-08-02 |
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