JP2019192726A5 - - Google Patents
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- Publication number
- JP2019192726A5 JP2019192726A5 JP2018082128A JP2018082128A JP2019192726A5 JP 2019192726 A5 JP2019192726 A5 JP 2019192726A5 JP 2018082128 A JP2018082128 A JP 2018082128A JP 2018082128 A JP2018082128 A JP 2018082128A JP 2019192726 A5 JP2019192726 A5 JP 2019192726A5
- Authority
- JP
- Japan
- Prior art keywords
- focus ring
- organic film
- forming
- plasma processing
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 8
- 150000002894 organic compounds Chemical class 0.000 claims 8
- 238000009832 plasma treatment Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 6
- 238000003672 processing method Methods 0.000 claims 5
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000006116 polymerization reaction Methods 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018082128A JP6920244B2 (ja) | 2018-04-23 | 2018-04-23 | プラズマ処理方法 |
| TW108113148A TWI829684B (zh) | 2018-04-23 | 2019-04-16 | 電漿處理方法 |
| KR1020190045992A KR102775986B1 (ko) | 2018-04-23 | 2019-04-19 | 플라즈마 처리 방법 |
| US16/391,518 US10923332B2 (en) | 2018-04-23 | 2019-04-23 | Plasma processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018082128A JP6920244B2 (ja) | 2018-04-23 | 2018-04-23 | プラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019192726A JP2019192726A (ja) | 2019-10-31 |
| JP2019192726A5 true JP2019192726A5 (enExample) | 2021-04-22 |
| JP6920244B2 JP6920244B2 (ja) | 2021-08-18 |
Family
ID=68238111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018082128A Active JP6920244B2 (ja) | 2018-04-23 | 2018-04-23 | プラズマ処理方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10923332B2 (enExample) |
| JP (1) | JP6920244B2 (enExample) |
| KR (1) | KR102775986B1 (enExample) |
| TW (1) | TWI829684B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11127572B2 (en) * | 2018-08-07 | 2021-09-21 | Silfex, Inc. | L-shaped plasma confinement ring for plasma chambers |
| CN111243934B (zh) * | 2020-03-03 | 2023-02-03 | 宁波江丰电子材料股份有限公司 | 一种环件连接部的翻新方法 |
| CN111863695A (zh) * | 2020-07-31 | 2020-10-30 | 上海华力微电子有限公司 | 静电卡盘装置及干法刻蚀机台 |
| JP7492928B2 (ja) * | 2021-02-10 | 2024-05-30 | 東京エレクトロン株式会社 | 基板支持器、プラズマ処理システム及びプラズマエッチング方法 |
| JP7752492B2 (ja) * | 2021-08-10 | 2025-10-10 | 東京エレクトロン株式会社 | 成膜装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020033183A1 (en) * | 1999-05-29 | 2002-03-21 | Sheng Sun | Method and apparatus for enhanced chamber cleaning |
| JP4286025B2 (ja) * | 2003-03-03 | 2009-06-24 | 川崎マイクロエレクトロニクス株式会社 | 石英治具の再生方法、再生使用方法および半導体装置の製造方法 |
| JP2006173223A (ja) * | 2004-12-14 | 2006-06-29 | Toshiba Corp | プラズマエッチング装置およびそれを用いたプラズマエッチング方法 |
| US7674393B2 (en) | 2005-03-25 | 2010-03-09 | Tokyo Electron Limited | Etching method and apparatus |
| JP4701776B2 (ja) | 2005-03-25 | 2011-06-15 | 東京エレクトロン株式会社 | エッチング方法及びエッチング装置 |
| US7578258B2 (en) * | 2006-03-03 | 2009-08-25 | Lam Research Corporation | Methods and apparatus for selective pre-coating of a plasma processing chamber |
| JP5097632B2 (ja) * | 2008-07-11 | 2012-12-12 | 株式会社日立ハイテクノロジーズ | プラズマエッチング処理装置 |
| JP2011151263A (ja) * | 2010-01-22 | 2011-08-04 | Tokyo Electron Ltd | エッチング方法、エッチング装置及びリング部材 |
| KR101671671B1 (ko) * | 2016-05-25 | 2016-11-01 | 주식회사 티씨케이 | 반도체 제조용 부품의 재생방법과 그 재생장치 및 재생부품 |
| JP2018054500A (ja) * | 2016-09-29 | 2018-04-05 | 東京エレクトロン株式会社 | 位置検出システム及び処理装置 |
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2018
- 2018-04-23 JP JP2018082128A patent/JP6920244B2/ja active Active
-
2019
- 2019-04-16 TW TW108113148A patent/TWI829684B/zh active
- 2019-04-19 KR KR1020190045992A patent/KR102775986B1/ko active Active
- 2019-04-23 US US16/391,518 patent/US10923332B2/en active Active