JP2019183229A5 - - Google Patents

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Publication number
JP2019183229A5
JP2019183229A5 JP2018076196A JP2018076196A JP2019183229A5 JP 2019183229 A5 JP2019183229 A5 JP 2019183229A5 JP 2018076196 A JP2018076196 A JP 2018076196A JP 2018076196 A JP2018076196 A JP 2018076196A JP 2019183229 A5 JP2019183229 A5 JP 2019183229A5
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JP
Japan
Prior art keywords
control
type
generation
types
gas flow
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JP2018076196A
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English (en)
Japanese (ja)
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JP2019183229A (ja
JP7093667B2 (ja
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Priority to JP2018076196A priority Critical patent/JP7093667B2/ja
Priority claimed from JP2018076196A external-priority patent/JP7093667B2/ja
Priority to KR1020190040786A priority patent/KR102364144B1/ko
Priority to US16/378,799 priority patent/US11035041B2/en
Publication of JP2019183229A publication Critical patent/JP2019183229A/ja
Publication of JP2019183229A5 publication Critical patent/JP2019183229A5/ja
Application granted granted Critical
Publication of JP7093667B2 publication Critical patent/JP7093667B2/ja
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JP2018076196A 2018-04-11 2018-04-11 成膜装置及び成膜方法 Active JP7093667B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018076196A JP7093667B2 (ja) 2018-04-11 2018-04-11 成膜装置及び成膜方法
KR1020190040786A KR102364144B1 (ko) 2018-04-11 2019-04-08 성막 장치 및 성막 방법
US16/378,799 US11035041B2 (en) 2018-04-11 2019-04-09 Film-forming apparatus and film-forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018076196A JP7093667B2 (ja) 2018-04-11 2018-04-11 成膜装置及び成膜方法

Publications (3)

Publication Number Publication Date
JP2019183229A JP2019183229A (ja) 2019-10-24
JP2019183229A5 true JP2019183229A5 (enExample) 2020-12-03
JP7093667B2 JP7093667B2 (ja) 2022-06-30

Family

ID=68161306

Family Applications (1)

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JP2018076196A Active JP7093667B2 (ja) 2018-04-11 2018-04-11 成膜装置及び成膜方法

Country Status (3)

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US (1) US11035041B2 (enExample)
JP (1) JP7093667B2 (enExample)
KR (1) KR102364144B1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11060190B2 (en) * 2018-03-29 2021-07-13 Kokusai Electric Corporation Substrate processing apparatus and control system
US20220293416A1 (en) * 2021-03-12 2022-09-15 Applied Materials, Inc. Systems and methods for improved carbon adhesion

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09251997A (ja) * 1996-03-18 1997-09-22 Toshiba Corp シリコン酸化膜の形成方法
JP3855415B2 (ja) * 1997-12-11 2006-12-13 セイコーエプソン株式会社 被膜形成方法
US7192645B2 (en) * 2001-02-26 2007-03-20 Dielectric Systems, Inc. Porous low E (<2.0) thin films by transport co-polymerization
DE10392894T5 (de) * 2002-07-05 2005-06-30 Tokyo Electron Ltd. Verfahren zur Reinigung eines Substratverarbeitungsapparats und ein Substratverarbeitungsapparat
US8252113B2 (en) * 2005-03-24 2012-08-28 Ulvac, Inc. Method for producing component for vacuum apparatus, resin coating forming apparatus and vacuum film forming system
JP5045000B2 (ja) * 2006-06-20 2012-10-10 東京エレクトロン株式会社 成膜装置、ガス供給装置、成膜方法及び記憶媒体
JP5198106B2 (ja) 2008-03-25 2013-05-15 東京エレクトロン株式会社 成膜装置、及び成膜方法
DE102009003781A1 (de) 2008-06-03 2009-12-10 Aixtron Ag Verfahren zum Abscheiden eines dünnschichtigen Polymers in einer Niederdruckgasphase
JP5966618B2 (ja) 2012-05-28 2016-08-10 東京エレクトロン株式会社 成膜方法
US20140349469A1 (en) 2013-05-22 2014-11-27 Qualcomm Mems Technologies, Inc. Processing for electromechanical systems and equipment for same
JP6018606B2 (ja) 2014-06-27 2016-11-02 東京エレクトロン株式会社 温度制御可能なステージを含むシステム、半導体製造装置及びステージの温度制御方法
US10343186B2 (en) * 2015-10-09 2019-07-09 Asm Ip Holding B.V. Vapor phase deposition of organic films

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