JP2019161130A5 - - Google Patents

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Publication number
JP2019161130A5
JP2019161130A5 JP2018048682A JP2018048682A JP2019161130A5 JP 2019161130 A5 JP2019161130 A5 JP 2019161130A5 JP 2018048682 A JP2018048682 A JP 2018048682A JP 2018048682 A JP2018048682 A JP 2018048682A JP 2019161130 A5 JP2019161130 A5 JP 2019161130A5
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JP
Japan
Prior art keywords
pipe
film forming
opening area
deposition apparatus
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2018048682A
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English (en)
Japanese (ja)
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JP2019161130A (ja
JP6826064B2 (ja
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Publication date
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Priority to JP2018048682A priority Critical patent/JP6826064B2/ja
Priority claimed from JP2018048682A external-priority patent/JP6826064B2/ja
Priority to US16/054,249 priority patent/US10844482B2/en
Publication of JP2019161130A publication Critical patent/JP2019161130A/ja
Publication of JP2019161130A5 publication Critical patent/JP2019161130A5/ja
Application granted granted Critical
Publication of JP6826064B2 publication Critical patent/JP6826064B2/ja
Active legal-status Critical Current
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JP2018048682A 2018-03-16 2018-03-16 成膜装置 Active JP6826064B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018048682A JP6826064B2 (ja) 2018-03-16 2018-03-16 成膜装置
US16/054,249 US10844482B2 (en) 2018-03-16 2018-08-03 Film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018048682A JP6826064B2 (ja) 2018-03-16 2018-03-16 成膜装置

Publications (3)

Publication Number Publication Date
JP2019161130A JP2019161130A (ja) 2019-09-19
JP2019161130A5 true JP2019161130A5 (enExample) 2020-03-05
JP6826064B2 JP6826064B2 (ja) 2021-02-03

Family

ID=67904503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018048682A Active JP6826064B2 (ja) 2018-03-16 2018-03-16 成膜装置

Country Status (2)

Country Link
US (1) US10844482B2 (enExample)
JP (1) JP6826064B2 (enExample)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2668023B2 (ja) * 1990-02-05 1997-10-27 東京エレクトロン株式会社 熱処理装置
JP2845422B2 (ja) * 1994-06-03 1999-01-13 住友金属鉱山株式会社 プラズマｃｖｄ装置
JP3246708B2 (ja) * 1995-05-02 2002-01-15 東京エレクトロン株式会社 トラップ装置及びこれを用いた未反応処理ガス排気機構
JPH1116842A (ja) * 1997-06-25 1999-01-22 Hitachi Ltd 半導体製造装置における排気配管のドレン抜き装置
JP4092821B2 (ja) * 1999-07-27 2008-05-28 東京エレクトロン株式会社 処理装置の排気システム
JP4759916B2 (ja) 2002-12-13 2011-08-31 東京エレクトロン株式会社 処理装置
JP4914085B2 (ja) 2006-03-14 2012-04-11 株式会社日立国際電気 基板処理装置、排気トラップ装置及び半導体装置の製造方法
WO2008016143A1 (fr) 2006-08-04 2008-02-07 Hitachi Kokusai Electric Inc. Appareil de traitement de substrat et procédé de fabrication d'un dispositif semi-conducteur
JP6371738B2 (ja) * 2015-05-28 2018-08-08 株式会社東芝 成膜装置

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