JP2019139950A5 - - Google Patents

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Publication number
JP2019139950A5
JP2019139950A5 JP2018021919A JP2018021919A JP2019139950A5 JP 2019139950 A5 JP2019139950 A5 JP 2019139950A5 JP 2018021919 A JP2018021919 A JP 2018021919A JP 2018021919 A JP2018021919 A JP 2018021919A JP 2019139950 A5 JP2019139950 A5 JP 2019139950A5
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JP
Japan
Prior art keywords
plasma generation
generation container
shield member
electrodes
ion source
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JP2018021919A
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English (en)
Japanese (ja)
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JP2019139950A (ja
JP7029633B2 (ja
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Priority to JP2018021919A priority Critical patent/JP7029633B2/ja
Priority claimed from JP2018021919A external-priority patent/JP7029633B2/ja
Priority to CN201811472876.0A priority patent/CN110137063A/zh
Priority to KR1020180155814A priority patent/KR20190096791A/ko
Priority to US16/224,910 priority patent/US10573490B2/en
Publication of JP2019139950A publication Critical patent/JP2019139950A/ja
Publication of JP2019139950A5 publication Critical patent/JP2019139950A5/ja
Application granted granted Critical
Publication of JP7029633B2 publication Critical patent/JP7029633B2/ja
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JP2018021919A 2018-02-09 2018-02-09 イオン源、イオン注入装置 Active JP7029633B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018021919A JP7029633B2 (ja) 2018-02-09 2018-02-09 イオン源、イオン注入装置
CN201811472876.0A CN110137063A (zh) 2018-02-09 2018-12-04 离子源和离子注入装置
KR1020180155814A KR20190096791A (ko) 2018-02-09 2018-12-06 이온원, 이온 주입 장치
US16/224,910 US10573490B2 (en) 2018-02-09 2018-12-19 Ion source and ion implantation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018021919A JP7029633B2 (ja) 2018-02-09 2018-02-09 イオン源、イオン注入装置

Publications (3)

Publication Number Publication Date
JP2019139950A JP2019139950A (ja) 2019-08-22
JP2019139950A5 true JP2019139950A5 (enExample) 2021-02-25
JP7029633B2 JP7029633B2 (ja) 2022-03-04

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ID=67568374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018021919A Active JP7029633B2 (ja) 2018-02-09 2018-02-09 イオン源、イオン注入装置

Country Status (4)

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US (1) US10573490B2 (enExample)
JP (1) JP7029633B2 (enExample)
KR (1) KR20190096791A (enExample)
CN (1) CN110137063A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1671542S (enExample) 2019-12-06 2020-11-02

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7078714B2 (en) 2004-05-14 2006-07-18 Nissin Ion Equipment Co., Ltd. Ion implanting apparatus
JP4875400B2 (ja) 2005-05-06 2012-02-15 アドバンスト イオン ビーム テクノロジー インク リボンイオンビーム用高アスペクト比、高質量分解能アナライザマグネット及びシステム
US8003956B2 (en) * 2008-10-03 2011-08-23 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling beam current uniformity in an ion implanter
JP5041260B2 (ja) * 2010-06-04 2012-10-03 日新イオン機器株式会社 イオン注入装置
JP2013041703A (ja) * 2011-08-12 2013-02-28 Sumitomo Heavy Ind Ltd ラインプラズマ発生装置
EP3043370A1 (de) * 2015-01-09 2016-07-13 Meyer Burger (Germany) AG Vorrichtung zur Extraktion von elektrischen Ladungsträgern aus einem Ladungsträgererzeugungsraum sowie ein Verfahren zum Betreiben einer solchen Vorrichtung
US9734982B1 (en) 2016-05-24 2017-08-15 Nissin Ion Equipment Co., Ltd. Beam current density distribution adjustment device and ion implanter

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