JP2019135733A - 熱処理方法 - Google Patents
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- JP2019135733A JP2019135733A JP2018017853A JP2018017853A JP2019135733A JP 2019135733 A JP2019135733 A JP 2019135733A JP 2018017853 A JP2018017853 A JP 2018017853A JP 2018017853 A JP2018017853 A JP 2018017853A JP 2019135733 A JP2019135733 A JP 2019135733A
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Abstract
Description
3 制御部
4 ハロゲン加熱部
5 フラッシュ加熱部
6 チャンバー
7 保持部
10 移載機構
65 熱処理空間
74 サセプタ
75 保持プレート
77 基板支持ピン
83 供給配管
90 ガス供給部
93 水素供給源
94 窒素供給源
101 自然酸化膜
102 薄膜
103 拡散層
FL フラッシュランプ
HL ハロゲンランプ
W 半導体ウェハー
Claims (7)
- 半導体基板にドーパントを導入する熱処理方法であって、
ドーパントを含む薄膜が成膜された半導体基板を水素を含む雰囲気中にて第1の温度に加熱する水素アニール工程と、
水素とは異なるガスの雰囲気中にて前記半導体基板を前記第1の温度よりも高温の第2の温度に1秒未満加熱するミリセカンドアニール工程と、
を備えることを特徴とする熱処理方法。 - 請求項1記載の熱処理方法において、
前記水素アニール工程と前記ミリセカンドアニール工程との間に、前記半導体基板を前記第1の温度よりも高く、かつ、前記第2の温度よりも低い温度に加熱する予備加熱工程をさらに備えることを特徴とする熱処理方法。 - 請求項1または請求項2記載の熱処理方法において、
前記第1の温度は300℃以上600℃以下であることを特徴とする熱処理方法。 - 請求項1から請求項3のいずれかに記載の熱処理方法において、
前記ミリセカンドアニール工程では窒素雰囲気中にて前記半導体基板を加熱することを特徴とする熱処理方法。 - 請求項1から請求項4のいずれかに記載の熱処理方法において、
前記ミリセカンドアニール工程では、前記半導体基板にフラッシュランプからフラッシュ光を照射して前記半導体基板を加熱することを特徴とする熱処理方法。 - 請求項1から請求項5のいずれかに記載の熱処理方法において、
前記半導体基板にはドーパントを含む二酸化ケイ素の膜が成膜されることを特徴とする熱処理方法。 - 請求項1から請求項6のいずれかに記載の熱処理方法において、
前記ドーパントを含む薄膜と前記半導体基板の表面との間には自然酸化膜が形成されていることを特徴とする熱処理方法。
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JP2018017853A JP7038558B2 (ja) | 2018-02-05 | 2018-02-05 | 熱処理方法 |
TW107142916A TWI741234B (zh) | 2018-02-05 | 2018-11-30 | 熱處理方法 |
KR1020180168428A KR102239422B1 (ko) | 2018-02-05 | 2018-12-24 | 열처리 방법 |
CN201811598895.8A CN110120336B (zh) | 2018-02-05 | 2018-12-26 | 热处理方法 |
US16/232,698 US10777415B2 (en) | 2018-02-05 | 2018-12-26 | Heat treatment method for dopant introduction |
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JP2018017853A JP7038558B2 (ja) | 2018-02-05 | 2018-02-05 | 熱処理方法 |
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JP7038558B2 JP7038558B2 (ja) | 2022-03-18 |
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US (1) | US10777415B2 (ja) |
JP (1) | JP7038558B2 (ja) |
KR (1) | KR102239422B1 (ja) |
CN (1) | CN110120336B (ja) |
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US10573532B2 (en) | 2018-06-15 | 2020-02-25 | Mattson Technology, Inc. | Method for processing a workpiece using a multi-cycle thermal treatment process |
CN116013844B (zh) * | 2023-03-27 | 2023-06-16 | 四川上特科技有限公司 | 一种晶圆覆硼夹具及覆硼装置 |
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KR100410574B1 (ko) * | 2002-05-18 | 2003-12-18 | 주식회사 하이닉스반도체 | 데카보렌 도핑에 의한 초박형 에피채널을 갖는반도체소자의 제조 방법 |
JP3699946B2 (ja) * | 2002-07-25 | 2005-09-28 | 株式会社東芝 | 半導体装置の製造方法 |
JP2007201337A (ja) | 2006-01-30 | 2007-08-09 | Sanyo Electric Co Ltd | 半導体装置及びその製造方法 |
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TWI539493B (zh) | 2010-03-08 | 2016-06-21 | 黛納羅伊有限責任公司 | 用於摻雜具有分子單層之矽基材之方法及組合物 |
JP6157809B2 (ja) * | 2012-07-19 | 2017-07-05 | 株式会社Screenホールディングス | 基板処理方法 |
JP6006040B2 (ja) * | 2012-08-27 | 2016-10-12 | 株式会社Screenホールディングス | 基板処理装置 |
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JPS50117374A (ja) * | 1974-02-28 | 1975-09-13 | ||
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JPH0368133A (ja) * | 1989-08-07 | 1991-03-25 | Toshiba Corp | 固相拡散方法 |
JP2014045065A (ja) * | 2012-08-27 | 2014-03-13 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
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JP7038558B2 (ja) | 2022-03-18 |
CN110120336B (zh) | 2023-11-17 |
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US10777415B2 (en) | 2020-09-15 |
KR102239422B1 (ko) | 2021-04-12 |
US20190244817A1 (en) | 2019-08-08 |
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TWI741234B (zh) | 2021-10-01 |
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