JP2019125619A - 吐出装置およびインプリント装置 - Google Patents

吐出装置およびインプリント装置 Download PDF

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Publication number
JP2019125619A
JP2019125619A JP2018003497A JP2018003497A JP2019125619A JP 2019125619 A JP2019125619 A JP 2019125619A JP 2018003497 A JP2018003497 A JP 2018003497A JP 2018003497 A JP2018003497 A JP 2018003497A JP 2019125619 A JP2019125619 A JP 2019125619A
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JP
Japan
Prior art keywords
discharge
imprint material
opening
space
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018003497A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019125619A5 (enExample
Inventor
永 難波
Hisashi Nanba
永 難波
敬恭 長谷川
Takayasu Hasegawa
敬恭 長谷川
勝田　健
Ken Katsuta
健 勝田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018003497A priority Critical patent/JP2019125619A/ja
Priority to US16/234,952 priority patent/US11143956B2/en
Priority to KR1020190000987A priority patent/KR102443418B1/ko
Publication of JP2019125619A publication Critical patent/JP2019125619A/ja
Publication of JP2019125619A5 publication Critical patent/JP2019125619A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
JP2018003497A 2018-01-12 2018-01-12 吐出装置およびインプリント装置 Pending JP2019125619A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018003497A JP2019125619A (ja) 2018-01-12 2018-01-12 吐出装置およびインプリント装置
US16/234,952 US11143956B2 (en) 2018-01-12 2018-12-28 Ejection device and imprint apparatus
KR1020190000987A KR102443418B1 (ko) 2018-01-12 2019-01-04 토출 장치 및 임프린트 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018003497A JP2019125619A (ja) 2018-01-12 2018-01-12 吐出装置およびインプリント装置

Publications (2)

Publication Number Publication Date
JP2019125619A true JP2019125619A (ja) 2019-07-25
JP2019125619A5 JP2019125619A5 (enExample) 2021-02-25

Family

ID=67213871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018003497A Pending JP2019125619A (ja) 2018-01-12 2018-01-12 吐出装置およびインプリント装置

Country Status (3)

Country Link
US (1) US11143956B2 (enExample)
JP (1) JP2019125619A (enExample)
KR (1) KR102443418B1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021044406A (ja) * 2019-09-11 2021-03-18 キヤノン株式会社 吐出材吐出装置、インプリント装置、及び検出方法
JP2022096996A (ja) * 2020-12-18 2022-06-30 キヤノン株式会社 吐出装置、インプリント装置および物品の製造方法
CN115192981A (zh) * 2022-07-19 2022-10-18 四川大学华西医院 一种高度能够调节的康复座椅

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005059476A (ja) * 2003-08-18 2005-03-10 Dainippon Printing Co Ltd インク供給装置
JP2006008849A (ja) * 2004-06-25 2006-01-12 Fuji Photo Film Co Ltd 着色剤含有樹脂粒子の非水溶媒分散液の製造方法およびインクジェットプリンター用油性インク
JP2010131959A (ja) * 2008-10-28 2010-06-17 Ricoh Co Ltd 画像形成装置
JP2012006316A (ja) * 2010-06-25 2012-01-12 Konica Minolta Holdings Inc インクジェット記録装置
JP2012030516A (ja) * 2010-07-30 2012-02-16 Fujifilm Corp 液体供給装置及び液体吐出装置
JP2012071485A (ja) * 2010-09-28 2012-04-12 Seiko Epson Corp 液体噴射ヘッド及びこれを有する液体噴射装置
JP2013075371A (ja) * 2011-09-29 2013-04-25 Mimaki Engineering Co Ltd 液体供給装置およびインクジェット記録装置
JP2014034194A (ja) * 2012-08-10 2014-02-24 Miyakoshi Printing Machinery Co Ltd インクジェット記録装置
JP2016197710A (ja) * 2015-04-03 2016-11-24 キヤノン株式会社 インプリント材吐出装置
WO2017042936A1 (ja) * 2015-09-10 2017-03-16 富士通周辺機株式会社 インクジェットプリンタ
WO2017094515A1 (ja) * 2015-12-01 2017-06-08 コニカミノルタ株式会社 インクジェット記録装置
JP2018006470A (ja) * 2016-06-29 2018-01-11 キヤノン株式会社 インプリント材吐出装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5341162A (en) * 1992-08-24 1994-08-23 Xerox Corporation Liquid deagassing apparatus
JP4288500B2 (ja) 2004-09-29 2009-07-01 富士フイルム株式会社 液体吐出ヘッド
JP6362109B2 (ja) * 2013-10-04 2018-07-25 キヤノン株式会社 インプリント装置および部品の製造方法
US20160288378A1 (en) * 2015-04-03 2016-10-06 Canon Kabushiki Kaisha Imprint material discharging device

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005059476A (ja) * 2003-08-18 2005-03-10 Dainippon Printing Co Ltd インク供給装置
JP2006008849A (ja) * 2004-06-25 2006-01-12 Fuji Photo Film Co Ltd 着色剤含有樹脂粒子の非水溶媒分散液の製造方法およびインクジェットプリンター用油性インク
JP2010131959A (ja) * 2008-10-28 2010-06-17 Ricoh Co Ltd 画像形成装置
JP2012006316A (ja) * 2010-06-25 2012-01-12 Konica Minolta Holdings Inc インクジェット記録装置
JP2012030516A (ja) * 2010-07-30 2012-02-16 Fujifilm Corp 液体供給装置及び液体吐出装置
JP2012071485A (ja) * 2010-09-28 2012-04-12 Seiko Epson Corp 液体噴射ヘッド及びこれを有する液体噴射装置
JP2013075371A (ja) * 2011-09-29 2013-04-25 Mimaki Engineering Co Ltd 液体供給装置およびインクジェット記録装置
JP2014034194A (ja) * 2012-08-10 2014-02-24 Miyakoshi Printing Machinery Co Ltd インクジェット記録装置
JP2016197710A (ja) * 2015-04-03 2016-11-24 キヤノン株式会社 インプリント材吐出装置
WO2017042936A1 (ja) * 2015-09-10 2017-03-16 富士通周辺機株式会社 インクジェットプリンタ
WO2017094515A1 (ja) * 2015-12-01 2017-06-08 コニカミノルタ株式会社 インクジェット記録装置
JP2018006470A (ja) * 2016-06-29 2018-01-11 キヤノン株式会社 インプリント材吐出装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021044406A (ja) * 2019-09-11 2021-03-18 キヤノン株式会社 吐出材吐出装置、インプリント装置、及び検出方法
JP7374680B2 (ja) 2019-09-11 2023-11-07 キヤノン株式会社 吐出材吐出装置、インプリント装置、及び検出方法
JP2022096996A (ja) * 2020-12-18 2022-06-30 キヤノン株式会社 吐出装置、インプリント装置および物品の製造方法
JP7566614B2 (ja) 2020-12-18 2024-10-15 キヤノン株式会社 インプリント装置および物品の製造方法
CN115192981A (zh) * 2022-07-19 2022-10-18 四川大学华西医院 一种高度能够调节的康复座椅

Also Published As

Publication number Publication date
KR20190086373A (ko) 2019-07-22
US11143956B2 (en) 2021-10-12
US20190219918A1 (en) 2019-07-18
KR102443418B1 (ko) 2022-09-15

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