KR102443418B1 - 토출 장치 및 임프린트 장치 - Google Patents
토출 장치 및 임프린트 장치 Download PDFInfo
- Publication number
- KR102443418B1 KR102443418B1 KR1020190000987A KR20190000987A KR102443418B1 KR 102443418 B1 KR102443418 B1 KR 102443418B1 KR 1020190000987 A KR1020190000987 A KR 1020190000987A KR 20190000987 A KR20190000987 A KR 20190000987A KR 102443418 B1 KR102443418 B1 KR 102443418B1
- Authority
- KR
- South Korea
- Prior art keywords
- unit
- imprint material
- space
- opening
- discharging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007872 degassing Methods 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims description 106
- 238000007599 discharging Methods 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 9
- 230000008878 coupling Effects 0.000 claims description 8
- 238000010168 coupling process Methods 0.000 claims description 8
- 238000005859 coupling reaction Methods 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 3
- 230000004308 accommodation Effects 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 230000007246 mechanism Effects 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 description 24
- 239000000758 substrate Substances 0.000 description 24
- 239000012528 membrane Substances 0.000 description 13
- 238000000926 separation method Methods 0.000 description 9
- 230000005499 meniscus Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/002—Component parts, details or accessories; Auxiliary operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018003497A JP2019125619A (ja) | 2018-01-12 | 2018-01-12 | 吐出装置およびインプリント装置 |
| JPJP-P-2018-003497 | 2018-01-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190086373A KR20190086373A (ko) | 2019-07-22 |
| KR102443418B1 true KR102443418B1 (ko) | 2022-09-15 |
Family
ID=67213871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020190000987A Active KR102443418B1 (ko) | 2018-01-12 | 2019-01-04 | 토출 장치 및 임프린트 장치 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US11143956B2 (enExample) |
| JP (1) | JP2019125619A (enExample) |
| KR (1) | KR102443418B1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7374680B2 (ja) * | 2019-09-11 | 2023-11-07 | キヤノン株式会社 | 吐出材吐出装置、インプリント装置、及び検出方法 |
| JP7566614B2 (ja) * | 2020-12-18 | 2024-10-15 | キヤノン株式会社 | インプリント装置および物品の製造方法 |
| CN115192981B (zh) * | 2022-07-19 | 2023-07-28 | 四川大学华西医院 | 一种高度能够调节的康复座椅 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006095878A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 液体吐出ヘッド及び脱気処理方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5341162A (en) * | 1992-08-24 | 1994-08-23 | Xerox Corporation | Liquid deagassing apparatus |
| JP2005059476A (ja) * | 2003-08-18 | 2005-03-10 | Dainippon Printing Co Ltd | インク供給装置 |
| JP2006008849A (ja) * | 2004-06-25 | 2006-01-12 | Fuji Photo Film Co Ltd | 着色剤含有樹脂粒子の非水溶媒分散液の製造方法およびインクジェットプリンター用油性インク |
| JP5402033B2 (ja) * | 2008-10-28 | 2014-01-29 | 株式会社リコー | 画像形成装置 |
| JP5418423B2 (ja) * | 2010-06-25 | 2014-02-19 | コニカミノルタ株式会社 | インクジェット記録装置 |
| JP5498307B2 (ja) * | 2010-07-30 | 2014-05-21 | 富士フイルム株式会社 | 液体供給装置及び液体吐出装置 |
| JP5590321B2 (ja) * | 2010-09-28 | 2014-09-17 | セイコーエプソン株式会社 | 液体噴射ヘッド及びこれを有する液体噴射装置 |
| JP5838506B2 (ja) * | 2011-09-29 | 2016-01-06 | 株式会社ミマキエンジニアリング | 液体供給装置およびインクジェット記録装置 |
| JP5777581B2 (ja) * | 2012-08-10 | 2015-09-09 | 株式会社ミヤコシ | インクジェット記録装置 |
| JP6362109B2 (ja) * | 2013-10-04 | 2018-07-25 | キヤノン株式会社 | インプリント装置および部品の製造方法 |
| JP6700794B2 (ja) * | 2015-04-03 | 2020-05-27 | キヤノン株式会社 | インプリント材吐出装置 |
| US20160288378A1 (en) * | 2015-04-03 | 2016-10-06 | Canon Kabushiki Kaisha | Imprint material discharging device |
| WO2017042936A1 (ja) * | 2015-09-10 | 2017-03-16 | 富士通周辺機株式会社 | インクジェットプリンタ |
| JPWO2017094515A1 (ja) * | 2015-12-01 | 2018-09-20 | コニカミノルタ株式会社 | インクジェット記録装置 |
| JP2018006470A (ja) * | 2016-06-29 | 2018-01-11 | キヤノン株式会社 | インプリント材吐出装置 |
-
2018
- 2018-01-12 JP JP2018003497A patent/JP2019125619A/ja active Pending
- 2018-12-28 US US16/234,952 patent/US11143956B2/en active Active
-
2019
- 2019-01-04 KR KR1020190000987A patent/KR102443418B1/ko active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006095878A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 液体吐出ヘッド及び脱気処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20190086373A (ko) | 2019-07-22 |
| JP2019125619A (ja) | 2019-07-25 |
| US11143956B2 (en) | 2021-10-12 |
| US20190219918A1 (en) | 2019-07-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6882574B2 (ja) | インプリント材吐出装置 | |
| KR102443418B1 (ko) | 토출 장치 및 임프린트 장치 | |
| KR101986877B1 (ko) | 임프린트재 토출 장치 | |
| JP7309433B2 (ja) | 保管装置 | |
| CN111559173B (zh) | 液体喷射装置 | |
| KR20120018726A (ko) | 잉크젯 인쇄 장치에 잉크를 퍼징 및 공급하는 방법 및 장치 | |
| JP6997546B2 (ja) | 液体吐出装置、インプリント装置、プリンタ、および物品製造方法 | |
| TWI613095B (zh) | 排液設備,壓印設備及製造構件的方法 | |
| CN110356111B (zh) | 喷射材料注入方法、喷射材料喷射装置和压印装置 | |
| US11520227B2 (en) | Ejection material filling device, pressure regulation device, and ejection material filling method | |
| JP7277127B2 (ja) | 吐出材充填方法、吐出材吐出装置、およびインプリント装置 | |
| JP2019055530A (ja) | 脱気装置およびインクジェット記録装置 | |
| JP2023088699A (ja) | 液体吐出装置、洗浄装置、インプリント装置及び洗浄方法 | |
| JP2023123123A (ja) | 液体吐出装置及びインプリント装置 | |
| KR102351890B1 (ko) | 액체 토출 장치, 임프린트 장치, 및 방법 | |
| JP5359208B2 (ja) | 液体噴射装置及び液体収容装置 | |
| JP2023074896A (ja) | 液体吐出装置及びインプリント装置 | |
| TW201607784A (zh) | 調節器組件 | |
| JP2018006470A (ja) | インプリント材吐出装置 | |
| JP2007112151A (ja) | インクジェット記録装置用インクカートリッジ | |
| JP2018006469A (ja) | インプリント材吐出装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20190104 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20200701 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20190104 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20220121 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20220623 |
|
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20220908 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20220913 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration |