JP2019096878A - エッジ終端構造を有するシリコンカーバイド半導体部品 - Google Patents
エッジ終端構造を有するシリコンカーバイド半導体部品 Download PDFInfo
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- JP2019096878A JP2019096878A JP2018216989A JP2018216989A JP2019096878A JP 2019096878 A JP2019096878 A JP 2019096878A JP 2018216989 A JP2018216989 A JP 2018216989A JP 2018216989 A JP2018216989 A JP 2018216989A JP 2019096878 A JP2019096878 A JP 2019096878A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 189
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title abstract description 84
- 229910010271 silicon carbide Inorganic materials 0.000 title abstract description 83
- 239000002019 doping agent Substances 0.000 claims description 147
- 210000000746 body region Anatomy 0.000 claims description 43
- 230000007423 decrease Effects 0.000 claims description 10
- 230000002829 reductive effect Effects 0.000 claims description 6
- 230000002441 reversible effect Effects 0.000 description 30
- 238000002513 implantation Methods 0.000 description 28
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000005380 borophosphosilicate glass Substances 0.000 description 2
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- 229910052710 silicon Inorganic materials 0.000 description 2
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- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- 230000000284 resting effect Effects 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
101 第1の表面
102 第2の表面
103 側面
104 垂線
110 ソース領域
120 ボディ領域
121 メイン領域
125 アノード領域
130 ドリフト構造
131 ドリフトゾーン
136 チャネル部分
137 電流拡散ゾーン
139 接点区画
149 接点領域
150 プレーナゲート構造
151 ゲート誘電体
155 導電性ゲート電極
160 シールド領域
180 メサ部分
181 第1のメサ側面
182 第2のメサ側面
190 エッジ終端構造
191 第1のドープ領域
192 第2のドープ領域
193 第3のドープ領域
195 サブ構造
210 層間誘電体
310 第1の負荷電極
316 トレンチ接点
320 第2の負荷電極
400 ポリイミド構造
401 線
402 線
450 イオンビーム変調装置
451 第1の部分
452 第2の部分
480 第1のインプランテーションマスク
481 第1のドーパント
485 開口
490 第2のインプランテーションマスク
491 第2のドーパント
495 開口
500 半導体部品
601 要素構造
610 中央アクティブ領域
690 エッジ終端領域
701 第1のメイン表面
725 部分層
730 初期層
761 バックグラウンドドーピング
762 ドーパント濃度
763 正味ドーパント濃度
791 逆ドープゾーン
902 SiC半導体基板の初期層に逆にドープされたゾーンを形成するステップ
904 第2の導電型の第2のドープ領域を形成するステップ
Claims (20)
- 半導体部品であって、
アクティブ領域(610)と前記アクティブ領域(610)を少なくとも部分的に取り囲むエッジ終端構造(190)とを有するSiC半導体ボディ(100)を含み、前記SiC半導体ボディ(100)内に第1の導電型のドリフトゾーン(131)が形成され、前記エッジ終端構造(190)は、
前記SiC半導体ボディ(100)の第1の表面(101)と前記ドリフトゾーン(131)との間にある第2の導電型の第1のドープ領域(191)であって、前記アクティブ領域(610)を少なくとも部分的に取り囲み、前記第1の表面(101)から間隔を空けて配置されている第1のドープ領域(191)と、
前記第1の表面(101)と前記第1のドープ領域(191)との間にある前記第2の導電型の複数の第2のドープ領域(192)と、
前記第2のドープ領域(192)同士の間にある前記第1の導電型の第3のドープ領域(193)と、
を含む、
半導体部品。 - 前記第3のドープ領域(193)のそれぞれは、前記第1のドープ領域(191)及び前記第2のドープ領域(192)によって完全に取り囲まれている、
請求項1に記載の半導体部品。 - 前記エッジ終端構造(190)の縦方向の広がり(v1)が、前記アクティブ領域(610)内の前記第2の導電型の最も深いドープ領域の下端との間の距離の少なくとも80%であり、多くとも100%である、
請求項1又は2に記載の半導体部品。 - 前記第2のドープ領域(192)のドーパント量が前記第1のドープ領域(191)のドーパント量より多い、
請求項1から3のいずれか一項に記載の半導体部品。 - 前記アクティブ領域(610)は前記第2の導電型の更なるドープ領域(120、160)を更に含み、前記エッジ終端構造(190)の縦方向の広がり(v1)は、前記アクティブ領域(610)の前記更なるドープ領域(120、160)の最も深い下端と前記表面(101)との間の距離の少なくとも80%である、
請求項1から4のいずれか一項に記載の半導体部品。 - 前記アクティブ領域(610)は、前記第2の導電型のボディ領域(120)を含むトランジスタセル(TC)を含み、
前記エッジ終端構造(190)の前記縦方向の広がり(v1)は、前記第1の表面(101)と前記ボディ領域(120)の下端との間の距離(v3)の少なくとも80%である、
請求項5に記載の半導体部品。 - 前記アクティブ領域(610)は、前記第2の導電型のボディ領域(120)を含むトランジスタセル(TC)を含み、
前記トランジスタセル(TC)は前記第2の導電型のシールド領域(160)を含み、前記シールド領域(160)の下端と前記第1の表面(101)との間の距離(v4)がゲート構造(150)の縦方向の広がり(v2)より大きい、
請求項1から6のいずれか一項に記載の半導体部品。 - 前記エッジ終端構造(190)の前記縦方向の広がり(v1)は、前記第1の表面(101)と前記シールド領域(160)の下端との間の距離(v4)の少なくとも80%である、
請求項7に記載の半導体部品。 - 前記アクティブ領域(610)は、アノード領域(125)と、前記アノード領域(125)同士の間にあるドリフト構造(130)のチャネル部分(136)とを多数含み、
前記チャネル部分(136)は、前記第1の表面(101)に隣接して、第1の負荷電極(310)に対するショットキー接点(SC)を形成する、
請求項1から8のいずれか一項に記載の半導体部品。 - 前記第3のドープ領域(193)のドーパント濃度が前記ドリフトゾーン(131)のドーパント濃度に等しい、
請求項1から9のいずれか一項に記載の半導体部品。 - 前記第3のドープ領域(193)は前記第2の導電型のドーパントを含み、前記第2の導電型のドーパント濃度が前記第1のドープ領域(191)のドーパント濃度に等しい、
請求項1から10のいずれか一項に記載の半導体部品。 - 前記第1のドープ領域(191)のドーパント量が2×1012cm−2から2×1013cm−2の範囲であり、且つ/又は、前記第2のドープ領域(192)のドーパント濃度が少なくとも1×1017cm−3である、
請求項1から11のいずれか一項に記載の半導体部品。 - 前記第2のドープ領域(192)内ではドーパント濃度が横方向に一定である、
請求項1から12のいずれか一項に記載の半導体部品。 - 前記更なるドープ領域(120、160)又は前記アノード領域(170)は高ドープサブ領域(149)を含み、前記高ドープサブ領域(149)のドーパント濃度は前記第2のドープ領域(192)のドーパント濃度に等しい、
請求項1から13のいずれか一項に記載の半導体部品。 - 前記第2のドープ領域(192)の横幅(w2)が、前記アクティブ領域(610)からの距離が増加するにつれて減少する、
請求項1から14のいずれか一項に記載の半導体部品。 - 半導体部品であって、
複数のサブ構造を含み、前記サブ構造のそれぞれは、第2のドープ領域(192)及び第3の領域(193)から形成され、前記第3の領域(193)は、前記アクティブ領域(610)と離れて向き合う側で前記第2のドープ領域(192)に隣接し、
前記サブ構造の幅(ws)が一定である、
請求項1から15のいずれか一項に記載の半導体部品。 - アクティブ領域(610)と、前記アクティブ領域(610)を少なくとも部分的に取り囲むエッジ終端構造(190)とを有するSiC半導体ボディ(100)を含み、前記SiC半導体ボディ(100)内で第1の導電型のドリフトゾーン(131)が形成され、前記エッジ終端構造(190)は、
前記SiC半導体ボディ(100)の第1の表面(101)と前記ドリフトゾーン(131)との間にある第2の導電型の第1のドープ領域(191)であって、前記アクティブ領域(610)を少なくとも部分的に取り囲み、前記第1の表面(101)から間隔を空けて配置されている第1のドープ領域(191)と、
前記第1の表面(101)と前記第1のドープ領域(191)との間にある前記第2の導電型の複数の第2のドープ領域(192)と、
前記第2のドープ領域(192)同士の間にある第3のドープ領域(193)と、
を含む、
半導体部品。 - 前記第2のドープ領域の横方向の正味ドーパント濃度が、少なくとも200nmの横方向距離以内に、最大正味ドーパント濃度Nmaxから濃度Nmax/eまで連続的に減少し、eはオイラー数である、
請求項17に記載の半導体部品。 - 前記第3のドープ領域(193)は前記第2の導電型であり、前記第3のドープ領域(193)のドーパント濃度が、前記第2のドープ領域(192)のドーパント濃度の多くとも50%である、
請求項17又は18に記載の半導体部品。 - 前記第3のドープ領域(193)は前記第2の導電型であり、前記第3のドープ領域(193)のドーパント濃度が、前記第1のドープ領域(191)のドーパント濃度に等しい、
請求項17又は18に記載の半導体部品。
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