JP2019073792A5 - - Google Patents
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- JP2019073792A5 JP2019073792A5 JP2018032500A JP2018032500A JP2019073792A5 JP 2019073792 A5 JP2019073792 A5 JP 2019073792A5 JP 2018032500 A JP2018032500 A JP 2018032500A JP 2018032500 A JP2018032500 A JP 2018032500A JP 2019073792 A5 JP2019073792 A5 JP 2019073792A5
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- Prior art keywords
- metal plate
- length
- wave
- steepness
- unit
- Prior art date
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- 239000002184 metal Substances 0.000 claims 33
- 229910052751 metal Inorganic materials 0.000 claims 33
- 239000000463 material Substances 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 9
- 238000007740 vapor deposition Methods 0.000 claims 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 6
- 238000000427 thin-film deposition Methods 0.000 claims 4
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 229910052759 nickel Inorganic materials 0.000 claims 3
- 239000010953 base metal Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 238000005096 rolling process Methods 0.000 claims 1
Claims (8)
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ幅方向の直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記長さ方向における単位長さが、５００ｍｍであり、
前記単位長さの金属板における単位急峻度の最大値が、第１急峻度であり、
前記第１急峻度が、０．５％以下である
蒸着マスク用基材。 A base material for a thin-film deposition mask, which is a strip-shaped metal plate used for manufacturing a thin-film deposition mask in which a plurality of holes are formed by etching.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape has a wave repeating in the width direction of the metal plate.
The length of the straight line in the width direction connecting one valley to the other valley in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The maximum value of the unit steepness in the metal plate having the unit length is the first steepness.
A base material for a vapor deposition mask having a first steepness of 0.5% or less.
前記単位長さの金属板における前記第２急峻度の平均値が、０．２５％以下である
請求項１に記載の蒸着マスク用基材。 At each position in the length direction of the metal plate, the maximum value of the unit steepness in the width direction of the metal plate is the second steepness.
The base material for a vapor deposition mask according to claim 1, wherein the average value of the second steepness of the metal plate having the unit length is 0.25% or less.
前記単位長さの金属板における前記波数の最大値が４個以下である
請求項１または２に記載の蒸着マスク用基材。 At each position in the length direction of the metal plate, the number of waves included in the width direction of the metal plate is the wave number.
The base material for a vapor deposition mask according to claim 1 or 2, wherein the maximum value of the wave number in the metal plate having the unit length is 4 or less.
前記単位長さの金属板における前記波数の平均値が２個以下である
請求項１から３のいずれか一項に記載の蒸着マスク用基材。 At each position in the length direction of the metal plate, the number of waves included in the width direction of the metal plate is the wave number.
The base material for a vapor deposition mask according to any one of claims 1 to 3, wherein the average value of the wave numbers in the metal plate having a unit length is 2 or less.
た金属板である蒸着マスク用基材の製造方法であって、
母材を圧延して前記金属板を得ることを含み、
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ幅方向の直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記長さ方向における単位長さが、５００ｍｍであり、
前記単位長さの金属板における単位急峻度の最大値が第１急峻度であり、
前記第１急峻度が、０．５％以下であるように、前記母材を圧延する
蒸着マスク用基材の製造方法。 A method for manufacturing a base material for a vapor deposition mask, which is a metal plate having a strip shape, in which a plurality of holes are formed by etching and used for manufacturing a vapor deposition mask.
Including rolling the base metal to obtain the metal plate
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape has a wave repeating in the width direction of the metal plate.
The length of the straight line in the width direction connecting one valley to the other valley in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The maximum value of the unit steepness in the metal plate having the unit length is the first steepness.
A method for producing a base material for a thin-film deposition mask, in which the base metal is rolled so that the first steepness is 0.5% or less.
前記レジスト層をマスクとしたエッチングによって前記金属板に複数の孔を形成してマスク部を形成することと、を含む蒸着マスクの製造方法であって、
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ幅方向の直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記長さ方向における単位長さが、５００ｍｍであり、
前記単位長さの金属板における単位急峻度の最大値が、第１急峻度であり、
前記第１急峻度が、０．５％以下である
蒸着マスクの製造方法。 Forming a resist layer on a strip-shaped metal plate and
A method for manufacturing a vapor-deposited mask, which comprises forming a mask portion by forming a plurality of holes in the metal plate by etching using the resist layer as a mask.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape has a wave repeating in the width direction of the metal plate.
The length of the straight line in the width direction connecting one valley to the other valley in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The maximum value of the unit steepness in the metal plate having the unit length is the first steepness.
A method for manufacturing a thin-film deposition mask in which the first steepness is 0.5% or less.
前記各マスク部が、前記複数の孔を有した１つの側面を別々に備え、
前記各マスク部の側面と、１体のフレーム部とを、前記複数の孔を前記マスク部ごとに前記１体のフレーム部が囲うように、相互に接合することをさらに含む
請求項６に記載の蒸着マスクの製造方法。 Forming the mask portion means forming a plurality of the mask portions on the single metal plate.
Each of the mask portions separately includes one side surface having the plurality of holes.
The sixth aspect of claim 6 further includes joining the side surfaces of the respective mask portions and one frame portion to each other so that the plurality of holes are surrounded by the one frame portion for each mask portion. Manufacturing method of vapor deposition mask.
前記蒸着マスクを用いた蒸着によってパターンを形成することとを含む
表示装置の製造方法。 To prepare a thin-film mask according to the method for producing a thin-film mask according to claim 6 or 7.
A method for manufacturing a display device, which comprises forming a pattern by vapor deposition using the vapor deposition mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018032500A JP6988565B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017199921A JP6299922B1 (en) | 2017-10-13 | 2017-10-13 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
| JP2018032500A JP6988565B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017199921A Division JP6299922B1 (en) | 2017-10-13 | 2017-10-13 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019073792A JP2019073792A (en) | 2019-05-16 |
| JP2019073792A5 true JP2019073792A5 (en) | 2020-11-19 |
| JP6988565B2 JP6988565B2 (en) | 2022-01-05 |
Family
ID=79239701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018032500A Active JP6988565B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6988565B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6299921B1 (en) | 2017-10-13 | 2018-03-28 | 凸版印刷株式会社 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
| CN111778476B (en) * | 2020-07-14 | 2023-01-10 | 京东方科技集团股份有限公司 | Mask plate for support, preparation method and mask plate assembly |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5382259B1 (en) * | 2013-01-10 | 2014-01-08 | 大日本印刷株式会社 | Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate |
| JP5455099B1 (en) * | 2013-09-13 | 2014-03-26 | 大日本印刷株式会社 | Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate |
| TWI665319B (en) * | 2015-07-17 | 2019-07-11 | 日商凸版印刷股份有限公司 | Metal mask substrate for vapor deposition, metal mask for vapor deposition, method of producing metal mask substrate for vapor deposition, and method of producing metal mask for vapor deposition |
| CN107849682B (en) * | 2016-04-14 | 2019-04-19 | 凸版印刷株式会社 | The manufacturing method of deposition mask substrate, the manufacturing method of deposition mask substrate and deposition mask |
-
2018
- 2018-02-26 JP JP2018032500A patent/JP6988565B2/en active Active
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