JP2019049044A5 - - Google Patents
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- JP2019049044A5 JP2019049044A5 JP2018072336A JP2018072336A JP2019049044A5 JP 2019049044 A5 JP2019049044 A5 JP 2019049044A5 JP 2018072336 A JP2018072336 A JP 2018072336A JP 2018072336 A JP2018072336 A JP 2018072336A JP 2019049044 A5 JP2019049044 A5 JP 2019049044A5
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- JP
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- Prior art keywords
- metal plate
- steepness
- width direction
- length
- mask
- Prior art date
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- 239000002184 metal Substances 0.000 claims 48
- 229910052751 metal Inorganic materials 0.000 claims 48
- 238000004519 manufacturing process Methods 0.000 claims 11
- 239000000463 material Substances 0.000 claims 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 8
- 238000007740 vapor deposition Methods 0.000 claims 7
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims 4
- 238000005530 etching Methods 0.000 claims 4
- 229910052759 nickel Inorganic materials 0.000 claims 4
- 238000000427 thin-film deposition Methods 0.000 claims 4
- 239000010953 base metal Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 238000005096 rolling process Methods 0.000 claims 1
Claims (6)
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板の厚みは、10μm以上50μm以下であり、
前記金属板の幅方向での各位置における前記金属板の長手方向に沿った形状は、相互に異なっており、各形状は、前記金属板の長手方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記金属板の前記幅方向の各位置において、前記長手方向に含まれる全ての波での単位急峻度の平均値が急峻度であり、
前記金属板の前記幅方向において、中央部が2つの端部に挟まれ、
前記中央部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの40%であり、
各端部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの30%であり、
一方の前記端部での急峻度の最大値、および、他方の前記端部での急峻度の最大値は、前記中央部での急峻度の最大値よりも小さく、
各端部での急峻度の最大値、および、前記中央部での急峻度の最大値は、0.2%以下である
蒸着マスク用基材。 A base material for a thin-film deposition mask, which is a strip-shaped metal plate used for manufacturing a thin-film deposition mask in which a plurality of holes are formed by etching.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the longitudinal direction of the metal plate at each position in the width direction of the metal plate are different from each other, and each shape has a wave repeating in the longitudinal direction of the metal plate.
The length of the straight line connecting one valley to the other in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
At each position in the width direction of the metal plate, the average value of the unit steepness in all waves included in said longitudinal direction is steepness,
In the width direction of the metal plate, the central portion is sandwiched between the two ends.
The length of the central portion in the width direction is 40% of the length of the metal plate in the width direction.
The length of each end in the width direction is 30% of the length of the metal plate in the width direction.
The maximum value of steepness at one end and the maximum value of steepness at the other end are smaller than the maximum value of steepness at the center.
The maximum value of the steepness at each end and the maximum value of the steepness at the center are 0.2% or less, which is a base material for a vapor deposition mask.
母材を圧延して前記金属板を得ることを含み、
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板の厚みは、10μm以上50μm以下であり、
前記金属板の幅方向での各位置における前記金属板の長手方向に沿った形状は、相互に異なっており、各形状は、前記金属板の長手方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記金属板の前記幅方向の各位置において、前記長手方向に含まれる全ての波での単位急峻度の平均値が急峻度であり、
前記金属板の前記幅方向において、中央部が2つの端部に挟まれ、
前記中央部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの40%であり、
各端部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの30%であり、
前記金属板を得ることでは、
一方の前記端部での急峻度の最大値、および、他方の前記端部での急峻度の最大値は、前記中央部での急峻度の最大値よりも小さく、
各端部での急峻度の最大値、および、前記中央部での急峻度の最大値は、0.2%以下であるように、前記母材を圧延する、
蒸着マスク用基材の製造方法。 A method for manufacturing a base material for a vapor deposition mask, which is a metal plate having a strip shape, in which a plurality of holes are formed by etching and used for manufacturing a vapor deposition mask.
Including rolling the base metal to obtain the metal plate
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the longitudinal direction of the metal plate at each position in the width direction of the metal plate are different from each other, and each shape has a wave repeating in the longitudinal direction of the metal plate.
The length of the straight line connecting one valley to the other in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
At each position in the width direction of the metal plate, the average value of the unit steepness in all waves included in said longitudinal direction is steepness,
In the width direction of the metal plate, the central portion is sandwiched between the two ends.
The length of the central portion in the width direction is 40% of the length of the metal plate in the width direction.
The length of each end in the width direction is 30% of the length of the metal plate in the width direction.
In obtaining the metal plate,
The maximum value of steepness at one end and the maximum value of steepness at the other end are smaller than the maximum value of steepness at the center.
The base metal is rolled so that the maximum value of steepness at each end and the maximum value of steepness at the center are 0.2% or less .
A method for manufacturing a base material for a vapor deposition mask.
前記レジスト層をマスクとしたエッチングによって前記金属板に複数の孔を形成してマスク部を形成することと、を含む蒸着マスクの製造方法であって、
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、
前記金属板の厚みは、10μm以上50μm以下であり、
前記金属板の幅方向での各位置における前記金属板の長手方向に沿った形状は、相互に異なっており、各形状は、前記金属板の長手方向に繰り返す波を有し、
前記波における一方の谷から他方の谷までを結ぶ直線の長さが波の長さであり、
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、
前記金属板の前記幅方向の各位置において、前記長手方向に含まれる全ての波での単位急峻度の平均値が急峻度であり、
前記金属板の前記幅方向において、中央部が2つの端部に挟まれ、
前記中央部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの40%であり、
各端部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの30%であり、
一方の前記端部での急峻度の最大値、および、他方の前記端部での急峻度の最大値は、前記中央部での急峻度の最大値よりも小さく、
各端部での急峻度の最大値、および、前記中央部での急峻度の最大値は、0.2%以下である
蒸着マスクの製造方法。 Forming a resist layer on a strip-shaped metal plate and
A method for manufacturing a vapor-deposited mask, which comprises forming a mask portion by forming a plurality of holes in the metal plate by etching using the resist layer as a mask.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the longitudinal direction of the metal plate at each position in the width direction of the metal plate are different from each other, and each shape has a wave repeating in the longitudinal direction of the metal plate.
The length of the straight line connecting one valley to the other in the wave is the length of the wave.
The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
At each position in the width direction of the metal plate, the average value of the unit steepness in all waves included in said longitudinal direction is steepness,
In the width direction of the metal plate, the central portion is sandwiched between the two ends.
The length of the central portion in the width direction is 40% of the length of the metal plate in the width direction.
The length of each end in the width direction is 30% of the length of the metal plate in the width direction.
The maximum value of steepness at one end and the maximum value of steepness at the other end are smaller than the maximum value of steepness at the center.
A method for manufacturing a thin-film mask in which the maximum value of steepness at each end and the maximum value of steepness at the center are 0.2% or less .
前記各マスク部が、前記複数の孔を有した1つの側面を別々に備え、
前記各マスク部の側面と、1体のフレーム部とを、前記複数の孔を前記マスク部ごとに前記1体のフレーム部が囲うように、相互に接合することをさらに含む
請求項3に記載の蒸着マスクの製造方法。 Forming the mask portion means forming a plurality of the mask portions on the single metal plate.
Each of the mask portions separately includes one side surface having the plurality of holes.
The third aspect of claim 3 , further comprising joining the side surfaces of the respective mask portions and one frame portion to each other so that the plurality of holes are surrounded by the one frame portion for each mask portion. Manufacturing method of vapor deposition mask.
前記レジスト層をマスクとしたエッチングによって前記金属板に複数の孔を形成してマスク部を形成することと、を含む蒸着マスクの製造方法であって、 A method for manufacturing a vapor-deposited mask, which comprises forming a mask portion by forming a plurality of holes in the metal plate by etching using the resist layer as a mask.
前記金属板を構成する材料は、ニッケルまたは鉄ニッケル合金であり、 The material constituting the metal plate is nickel or an iron-nickel alloy.
前記金属板の厚みは、10μm以上50μm以下であり、 The thickness of the metal plate is 10 μm or more and 50 μm or less.
前記金属板の幅方向での各位置における前記金属板の長手方向に沿った形状は、相互に異なっており、各形状は、前記金属板の長手方向に繰り返す波を有し、 The shapes along the longitudinal direction of the metal plate at each position in the width direction of the metal plate are different from each other, and each shape has a wave repeating in the longitudinal direction of the metal plate.
前記波における一方の谷から他方の谷までを結ぶ直線の長さが波の長さであり、 The length of the straight line connecting one valley to the other in the wave is the length of the wave.
前記波の長さに対する前記波の高さの百分率が単位急峻度であり、 The percentage of the height of the wave with respect to the length of the wave is the unit steepness.
前記金属板の幅方向の各位置において、前記長手方向に含まれる全ての波での単位急峻度の平均値が急峻度であり、 At each position in the width direction of the metal plate, the average value of the unit steepness of all the waves included in the longitudinal direction is the steepness.
前記金属板の前記幅方向において、中央部が2つの端部に挟まれ、 In the width direction of the metal plate, the central portion is sandwiched between the two ends.
前記中央部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの40%であり、 The length of the central portion in the width direction is 40% of the length of the metal plate in the width direction.
各端部が有する前記幅方向での長さは、前記金属板が有する前記幅方向での長さの30%であり、 The length of each end in the width direction is 30% of the length of the metal plate in the width direction.
前記中央部における急峻度の最大値が、0.3%以下であり、 The maximum value of steepness in the central portion is 0.3% or less.
各端部における急峻度の最大値が、0.6%以下であり、 The maximum value of steepness at each end is 0.6% or less,
前記金属板の前記幅方向での両端部のなかの少なくとも一方での急峻度の最大値は、前記金属板の前記幅方向の中央部における急峻度の最大値よりも小さく、 The maximum value of the steepness of at least one of the both ends of the metal plate in the width direction is smaller than the maximum value of the steepness of the metal plate in the central portion in the width direction.
前記マスク部を形成することは、単一の前記金属板に複数の前記マスク部を形成することであり、 Forming the mask portion means forming a plurality of the mask portions on the single metal plate.
前記各マスク部が、前記複数の孔を有した1つの側面を別々に備え、 Each of the mask portions separately includes one side surface having the plurality of holes.
前記各マスク部の側面と、1体のフレーム部とを、前記複数の孔を前記マスク部ごとに前記1体のフレーム部が囲うように、相互に接合することをさらに含む Further, the side surface of each mask portion and one frame portion are further joined to each other so that the plurality of holes are surrounded by the one frame portion for each mask portion.
蒸着マスクの製造方法。 Manufacturing method of thin-film mask.
前記蒸着マスクを用いた蒸着によってパターンを形成することとを含む
表示装置の製造方法。 Preparing a thin-film deposition mask according to the method for producing a thin-film deposition mask according to any one of claims 3 to 5 .
A method for manufacturing a display device, which comprises forming a pattern by vapor deposition using the vapor deposition mask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018072336A JP6984529B2 (en) | 2017-09-08 | 2018-04-04 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017173153A JP6319505B1 (en) | 2017-09-08 | 2017-09-08 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
JP2018072336A JP6984529B2 (en) | 2017-09-08 | 2018-04-04 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017173153A Division JP6319505B1 (en) | 2017-09-08 | 2017-09-08 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
Publications (3)
Publication Number | Publication Date |
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JP2019049044A JP2019049044A (en) | 2019-03-28 |
JP2019049044A5 true JP2019049044A5 (en) | 2020-10-22 |
JP6984529B2 JP6984529B2 (en) | 2021-12-22 |
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JP2018072336A Active JP6984529B2 (en) | 2017-09-08 | 2018-04-04 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Country Status (1)
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JP (1) | JP6984529B2 (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5455099B1 (en) * | 2013-09-13 | 2014-03-26 | 大日本印刷株式会社 | Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate |
JP6598007B2 (en) * | 2015-09-30 | 2019-10-30 | 日立金属株式会社 | Method for producing Fe-Ni alloy thin sheet |
WO2017154981A1 (en) * | 2016-03-09 | 2017-09-14 | 日立金属株式会社 | Martensitic stainless steel foil and method for manufacturing same |
TWI713899B (en) * | 2016-04-14 | 2020-12-21 | 日商凸版印刷股份有限公司 | Base material for vapor deposition mask, method of manufacturing base material for vapor deposition mask, and method of manufacturing vapor deposition mask |
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