JP2019073791A5 - - Google Patents
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- JP2019073791A5 JP2019073791A5 JP2018032499A JP2018032499A JP2019073791A5 JP 2019073791 A5 JP2019073791 A5 JP 2019073791A5 JP 2018032499 A JP2018032499 A JP 2018032499A JP 2018032499 A JP2018032499 A JP 2018032499A JP 2019073791 A5 JP2019073791 A5 JP 2019073791A5
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- JP
- Japan
- Prior art keywords
- metal plate
- width direction
- surface distance
- mask
- length
- Prior art date
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- 239000002184 metal Substances 0.000 claims 29
- 229910052751 metal Inorganic materials 0.000 claims 29
- 238000004519 manufacturing process Methods 0.000 claims 9
- 239000000463 material Substances 0.000 claims 7
- 238000000427 thin-film deposition Methods 0.000 claims 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 6
- 238000007740 vapor deposition Methods 0.000 claims 6
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 229910052759 nickel Inorganic materials 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 239000010953 base metal Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 238000005096 rolling process Methods 0.000 claims 1
Claims (8)
前記金属板を構成する材料は、ニッケル、もしくは、鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す凹凸を有した波形状であり、
前記金属板の表面での幅方向の長さが表面距離であり、
前記金属板の長さ方向の各位置での表面距離のなかの最小値が最小表面距離であり、
前記最小表面距離に対する、前記金属板の長さ方向の各位置での表面距離と前記最小表面距離との差分の比率が幅方向での伸び差率であり、
前記幅方向での伸び差率の最大値が２×１０−５以下である
蒸着マスク用基材。 A base material for a thin-film deposition mask, which is a strip-shaped metal plate used for manufacturing a thin-film deposition mask in which a plurality of holes are formed by etching.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape is a wave shape having irregularities repeating in the width direction of the metal plate. ,
The length in the width direction on the surface of the metal plate is the surface distance.
The minimum value among the surface distances at each position in the length direction of the metal plate is the minimum surface distance.
The ratio of the difference between the surface distance at each position in the length direction of the metal plate and the minimum surface distance with respect to the minimum surface distance is the elongation difference ratio in the width direction.
A base material for a thin-film deposition mask in which the maximum value of the elongation difference ratio in the width direction is 2 × 10 -5 or less.
前記幅方向での伸び差率の単位長さでの平均値が０．５×１０−５以下である
請求項１に記載の蒸着マスク用基材。 The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The substrate for a thin-film deposition mask according to claim 1, wherein the average value of the elongation difference ratio in the width direction in a unit length is 0.5 × 10 -5 or less.
０．５×１０−５以上の前記伸び差率を有したピークの個数が単位長さあたりに３個以下である
請求項１または２に記載の蒸着マスク用基材。 The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The substrate for a vapor deposition mask according to claim 1 or 2, wherein the number of peaks having the elongation difference ratio of 0.5 × 10 -5 or more is 3 or less per unit length.
０．５×１０−５以上の前記伸び差率を有したピークの間隔が単位長さあたりにおいて１００ｍｍ以上である
請求項１から３のいずれか一項に記載の蒸着マスク用基材。 The unit length in the length direction is 500 mm, and the unit length is 500 mm.
The substrate for a thin-film deposition mask according to any one of claims 1 to 3, wherein the peak interval having the elongation difference ratio of 0.5 × 10-5 or more is 100 mm or more per unit length.
母材を圧延して前記金属板を得ることを含み、
前記金属板を構成する材料は、ニッケル、もしくは、鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す凹凸を有した波形状であり、
前記金属板の長さ方向の各位置での表面距離のなかの最小値が最小表面距離であり、
前記最小表面距離に対する、前記金属板の長さ方向の各位置での表面距離と前記最小表面距離との差分の比率が幅方向での伸び差率であり、
前記幅方向での伸び差率の最大値が２×１０−５以下であるように、前記母材を圧延する
蒸着マスク用基材の製造方法。 A method for manufacturing a base material for a vapor deposition mask, which is a metal plate having a strip shape, in which a plurality of holes are formed by etching and used for manufacturing a vapor deposition mask.
Including rolling the base metal to obtain the metal plate
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape is a wave shape having irregularities repeating in the width direction of the metal plate. ,
The minimum value among the surface distances at each position in the length direction of the metal plate is the minimum surface distance.
The ratio of the difference between the surface distance at each position in the length direction of the metal plate and the minimum surface distance with respect to the minimum surface distance is the elongation difference ratio in the width direction.
A method for producing a base material for a thin-film deposition mask, in which the base metal is rolled so that the maximum value of the elongation difference ratio in the width direction is 2 × 10 −5 or less.
前記レジスト層をマスクとしたエッチングによって前記金属板に複数の孔を形成してマスク部を形成することと、を含む蒸着マスクの製造方法であって、
前記金属板を構成する材料は、ニッケル、もしくは、鉄ニッケル合金であり、
前記金属板が有する厚みは、１０μｍ以上５０μｍ以下であり、
前記金属板の長さ方向での各位置における前記金属板の幅方向に沿った形状は、相互に異なっており、各形状は、前記金属板の幅方向に繰り返す凹凸を有した波形状であり、
前記金属板の表面での幅方向の長さが表面距離であり、
前記金属板の長さ方向の各位置での表面距離のなかの最小値が最小表面距離であり、
前記最小表面距離に対する、前記金属板の長さ方向の各位置での表面距離と前記最小表面距離との差分の比率が幅方向での伸び差率であり、
前記幅方向での伸び差率の最大値が２×１０−５以下である
蒸着マスクの製造方法。 Forming a resist layer on a strip-shaped metal plate and
A method for manufacturing a vapor-deposited mask, which comprises forming a mask portion by forming a plurality of holes in the metal plate by etching using the resist layer as a mask.
The material constituting the metal plate is nickel or an iron-nickel alloy.
The thickness of the metal plate is 10 μm or more and 50 μm or less.
The shapes along the width direction of the metal plate at each position in the length direction of the metal plate are different from each other, and each shape is a wave shape having irregularities repeating in the width direction of the metal plate. ,
The length in the width direction on the surface of the metal plate is the surface distance.
The minimum value among the surface distances at each position in the length direction of the metal plate is the minimum surface distance.
The ratio of the difference between the surface distance at each position in the length direction of the metal plate and the minimum surface distance with respect to the minimum surface distance is the elongation difference ratio in the width direction.
A method for manufacturing a thin-film deposition mask in which the maximum value of the elongation difference ratio in the width direction is 2 × 10 −5 or less.
前記各マスク部が、前記複数の孔を有した１つの側面を別々に備え、
前記各マスク部の側面と、１体のフレーム部とを、前記複数の孔を前記マスク部ごとに前記１体のフレーム部が囲うように、相互に接合することをさらに含む
請求項６に記載の蒸着マスクの製造方法。 Forming the mask portion means forming a plurality of the mask portions on the single metal plate.
Each of the mask portions separately includes one side surface having the plurality of holes.
The sixth aspect of claim 6 further includes joining the side surfaces of the respective mask portions and one frame portion to each other so that the plurality of holes are surrounded by the one frame portion for each mask portion. Manufacturing method of vapor deposition mask.
前記蒸着マスクを用いた蒸着によってパターンを形成することとを含む
表示装置の製造方法。 To prepare a thin-film mask according to the method for producing a thin-film mask according to claim 6 or 7.
A method for manufacturing a display device, which comprises forming a pattern by vapor deposition using the vapor deposition mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018032499A JP6981302B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017199920A JP6299921B1 (en) | 2017-10-13 | 2017-10-13 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
| JP2018032499A JP6981302B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017199920A Division JP6299921B1 (en) | 2017-10-13 | 2017-10-13 | Vapor deposition mask substrate, vapor deposition mask substrate production method, vapor deposition mask production method, and display device production method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019073791A JP2019073791A (en) | 2019-05-16 |
| JP2019073791A5 true JP2019073791A5 (en) | 2020-11-19 |
| JP6981302B2 JP6981302B2 (en) | 2021-12-15 |
Family
ID=79190958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018032499A Active JP6981302B2 (en) | 2017-10-13 | 2018-02-26 | A base material for a vapor deposition mask, a method for manufacturing a base material for a vapor deposition mask, a method for manufacturing a vapor deposition mask, and a method for manufacturing a display device. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6981302B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102637521B1 (en) * | 2021-06-25 | 2024-02-19 | 주식회사 오럼머티리얼 | Producing method of mask |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5382259B1 (en) * | 2013-01-10 | 2014-01-08 | 大日本印刷株式会社 | Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate |
| JP5455099B1 (en) * | 2013-09-13 | 2014-03-26 | 大日本印刷株式会社 | Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate |
| CN205974646U (en) * | 2015-07-17 | 2017-02-22 | 凸版印刷株式会社 | Metal mask for coating by vaporization |
| TWI713899B (en) * | 2016-04-14 | 2020-12-21 | 日商凸版印刷股份有限公司 | Base material for vapor deposition mask, method of manufacturing base material for vapor deposition mask, and method of manufacturing vapor deposition mask |
-
2018
- 2018-02-26 JP JP2018032499A patent/JP6981302B2/en active Active
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