JP2019057640A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019057640A5 JP2019057640A5 JP2017181527A JP2017181527A JP2019057640A5 JP 2019057640 A5 JP2019057640 A5 JP 2019057640A5 JP 2017181527 A JP2017181527 A JP 2017181527A JP 2017181527 A JP2017181527 A JP 2017181527A JP 2019057640 A5 JP2019057640 A5 JP 2019057640A5
- Authority
- JP
- Japan
- Prior art keywords
- unit
- substrate
- processing chamber
- air supply
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 31
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000013459 approach Methods 0.000 claims description 2
- 238000003672 processing method Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 12
- 239000011261 inert gas Substances 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- 238000007599 discharging Methods 0.000 claims 4
- 239000007788 liquid Substances 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 1
- 238000009434 installation Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
Images
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017181527A JP6924661B2 (ja) | 2017-09-21 | 2017-09-21 | 露光装置、基板処理装置、露光方法および基板処理方法 |
| TW107128728A TWI712865B (zh) | 2017-09-21 | 2018-08-17 | 曝光裝置、基板處理裝置、曝光方法及基板處理方法 |
| US16/124,331 US10955745B2 (en) | 2017-09-21 | 2018-09-07 | Exposure device, substrate processing apparatus, exposure method and substrate processing method |
| KR1020180109652A KR102153174B1 (ko) | 2017-09-21 | 2018-09-13 | 노광 장치, 기판 처리 장치, 노광 방법 및 기판 처리 방법 |
| CN201811072678.5A CN109541890B (zh) | 2017-09-21 | 2018-09-14 | 曝光装置、基板处理装置、曝光方法以及基板处理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017181527A JP6924661B2 (ja) | 2017-09-21 | 2017-09-21 | 露光装置、基板処理装置、露光方法および基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019057640A JP2019057640A (ja) | 2019-04-11 |
| JP2019057640A5 true JP2019057640A5 (enrdf_load_html_response) | 2021-02-25 |
| JP6924661B2 JP6924661B2 (ja) | 2021-08-25 |
Family
ID=66107737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017181527A Active JP6924661B2 (ja) | 2017-09-21 | 2017-09-21 | 露光装置、基板処理装置、露光方法および基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6924661B2 (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI747490B (zh) * | 2019-09-19 | 2021-11-21 | 日商斯庫林集團股份有限公司 | 曝光裝置 |
| JP7335763B2 (ja) * | 2019-09-19 | 2023-08-30 | 株式会社Screenホールディングス | 露光装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3315843B2 (ja) * | 1995-09-01 | 2002-08-19 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JPH10270333A (ja) * | 1997-03-27 | 1998-10-09 | Nikon Corp | 露光装置 |
| US6524389B1 (en) * | 1999-05-24 | 2003-02-25 | Tokyo Electron Limited | Substrate processing apparatus |
| JP3585215B2 (ja) * | 1999-05-24 | 2004-11-04 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP6543064B2 (ja) * | 2015-03-25 | 2019-07-10 | 株式会社Screenホールディングス | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
-
2017
- 2017-09-21 JP JP2017181527A patent/JP6924661B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10656526B2 (en) | Substrate treatment method and thermal treatment apparatus | |
| JP5934665B2 (ja) | 成膜方法、プログラム、コンピュータ記憶媒体及び成膜システム | |
| US10955745B2 (en) | Exposure device, substrate processing apparatus, exposure method and substrate processing method | |
| JP6391362B2 (ja) | 減圧乾燥装置、基板処理装置および減圧乾燥方法 | |
| JP2019057640A5 (enrdf_load_html_response) | ||
| TWI659275B (zh) | 曝光裝置、基板處理裝置、曝光方法、及基板處理方法 | |
| TW201511118A (zh) | 基板處理裝置及基板處理方法 | |
| TWI706226B (zh) | 曝光裝置、基板處理裝置、基板之曝光方法及基板處理方法 | |
| TWI778845B (zh) | 基板處理裝置、基板處理方法及記錄媒體 | |
| TWI682433B (zh) | 曝光裝置、基板處理裝置、基板曝光方法以及基板處理方法 | |
| JP6924661B2 (ja) | 露光装置、基板処理装置、露光方法および基板処理方法 | |
| US20210232050A1 (en) | Substrate processing apparatus and substrate processing method | |
| JP2018146617A5 (enrdf_load_html_response) | ||
| JP6811638B2 (ja) | 基板処理方法及びその装置 | |
| JP6768561B2 (ja) | 露光装置、基板処理装置、基板の露光方法および基板処理方法 | |
| JP6894281B2 (ja) | 露光装置、基板処理装置、基板の露光方法および基板処理方法 | |
| KR100779236B1 (ko) | 베이크 장치 | |
| JP7002262B2 (ja) | 露光装置、基板処理装置、露光方法および基板処理方法 | |
| JP6211886B2 (ja) | 加熱処理方法及び加熱処理装置 | |
| JP2021086993A (ja) | 基板処理方法および基板処理装置 | |
| TW202217929A (zh) | 基板處理方法、基板處理裝置及記錄媒體 | |
| JP3878470B2 (ja) | 処理装置 | |
| JP2632796B2 (ja) | レジスト処理方法 | |
| JP3027686B2 (ja) | 紫外線照射装置 | |
| JP2005051024A (ja) | 基板処理方法および基板処理装置 |