JP2019023276A - 窯業系無機基材の目止め方法および窯業系無機基材化粧板の製造方法 - Google Patents
窯業系無機基材の目止め方法および窯業系無機基材化粧板の製造方法 Download PDFInfo
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- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- LSVMKPJLAANVBH-UHFFFAOYSA-N 2-(chloromethyl)oxirane hexane-1,6-diol Chemical compound C1C(O1)CCl.C(CCCO)CCO LSVMKPJLAANVBH-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- MUBQKSBEWRYKES-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO MUBQKSBEWRYKES-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
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- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
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- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
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- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
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- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
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- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
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- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
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- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
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Landscapes
- Finishing Walls (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Abstract
Description
(A)としてAgysin1010(商品名:DSM-AGI社製、ビスフェノールA型エポキシジアクリレート)を、(B1)としてAPG-200(商品名:新中村化学社製、トリプロピレングリコールジアクリレート)を、(B2)としてTMP-A(商品名:共栄社製、トリメチロールプロパントリアクリレート)を、(C)としてIrgacure184(商品名:BASFジャパン社製)を、(D)として重質炭酸カルシウム(丸尾カルシウム社製、平均粒径3μm)およびホワイトンSB(商品名:白石カルシウム社製、平均粒径1.8μm)およびナノックス23(商品名:丸尾カルシウム社製、平均粒径0.9〜1.5μm)およびタルクRS515(商品名:富士タルク工業社製、平均粒径15μm:メディアン径D50)を、ポリオールとしてHSポリオール2000(商品名:豊国製油社製、ポリエステルポリオール)用い、表1および表2記載の配合にて遮光ビンに入れ均一になるまで撹拌脱泡し、実施例1〜13および比較例1〜2の目止め用樹脂組成物を調整した。
ヒシタイカ(商品名:アイカテック建材社製、厚さ6mm珪酸カルシウム板)上にシーラーとしてウレタン樹脂を45g/m2塗布し24時間室温放置後、バーコーターを用い第1の目止め樹脂組成物を70〜80g/m2塗布し、アイグラフィック社製の露光装置アイミニグランテージECS−151Uを用い、高圧水銀灯光源で出力110mW/cm2、積算光量60mJ/cm2で紫外線照射して硬化させ、その上から第2の目止め樹脂組成物を70〜80g/m2塗布し、同じく高圧水銀灯光源により出力380mW/cm2、積算光量440mJ/cm2で紫外線照射して硬化させた。
ヒシタイカ(商品名:アイカテック建材社製、厚さ6mm珪酸カルシウム板)上にシーラーを上記と同条件で塗布し24時間室温放置後、ナチュラルリバースロールコーターを用い第1の目止め樹脂組成物を70〜80g/m2塗布し、高圧水銀灯光源を用い出力110mW/cm2、積算光量60mJ/cm2で紫外線照射して硬化させ、その上からナチュラルリバースロールコーターを用い第2の目止め樹脂組成物を70〜80g/m2塗布し、同じく高圧水銀灯光源により出力380mW/cm2、積算光量440mJ/cm2で紫外線照射して硬化し24時間室温放置した。その後#220と♯280のベルトサンダーを用いサンディング処理行い、その上からトップコートとしてアクリル樹脂を塗装した。
表3 第1の目止め樹脂組成物
Claims (6)
- エポキシアクリレート(A)と、多官能(メタ)アクリレートモノマー(B)と、光重合開始剤(C)と、充填剤(D)とを含有する組成物で、粘度が35〜180Pa・sの第1の目止め用樹脂組成物を塗布した上に、粘度が5〜30Pa・sの第2の目止め用樹脂組成物を塗布し、当該第2の目止め用樹脂組成物の(C)の配合量がラジカル重合成分100重量部に対し1.5−7重量部である、窯業系無機基材の目止め方法。
- 前記多官能(メタ)アクリレートモノマー(B)が、2官能(メタ)アクリレートモノマー(B1)と3官能以上の(メタ)アクリレートモノマー(B2)を含む、請求項1記載の窯業系無機基材の目止め方法。
- 前記第2の目止め用樹脂組成物のTI値が、3.0以下であることを特徴とする、請求項1または2いずれか記載の窯業系無機基材の目止め方法。
- 前記窯業系無機基材が珪酸カルシウム板である、請求項1〜3いずれか記載の窯業系無機基材の目止め方法。
- 窯業系無機基材上にシーラーを塗布後、その上に請求項1または2いずれか記載の第1の目止め剤組成物を塗布して硬化後、更にその上に請求項1〜3いずれか記載の第2の目止め剤組成物を塗布して硬化させ、その後に表面切削を行い、その上から上塗り塗装剤を塗布して紫外線硬化することを特徴とする、窯業系無機基材化粧板の製造方法。
- 前記窯業系無機基材が珪酸カルシウム板である、請求項5記載の窯業系無機基材化粧板の製造方法。
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JP2017091617 | 2017-05-02 | ||
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JP2017147435 | 2017-07-31 | ||
JP2017147435 | 2017-07-31 |
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