JP2019014707A5 - - Google Patents
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- Publication number
- JP2019014707A5 JP2019014707A5 JP2018117942A JP2018117942A JP2019014707A5 JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5 JP 2018117942 A JP2018117942 A JP 2018117942A JP 2018117942 A JP2018117942 A JP 2018117942A JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- ethylene compound
- hydrogen atom
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000005977 Ethylene Substances 0.000 claims 5
- -1 ethylene compound Chemical class 0.000 claims 5
- 239000011342 resin composition Substances 0.000 claims 5
- 125000002252 acyl group Chemical group 0.000 claims 4
- 125000003368 amide group Chemical group 0.000 claims 4
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 4
- 150000001733 carboxylic acid esters Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000000862 absorption spectrum Methods 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000004434 sulfur atoms Chemical group 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017132977 | 2017-07-06 | ||
| JP2017132977 | 2017-07-06 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020087131A Division JP7027483B2 (ja) | 2017-07-06 | 2020-05-19 | エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019014707A JP2019014707A (ja) | 2019-01-31 |
| JP2019014707A5 true JP2019014707A5 (ru) | 2020-04-09 |
| JP6833763B2 JP6833763B2 (ja) | 2021-02-24 |
Family
ID=64949980
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018117942A Active JP6833763B2 (ja) | 2017-07-06 | 2018-06-21 | エチレン化合物、紫外線吸収剤および樹脂組成物 |
| JP2020087131A Active JP7027483B2 (ja) | 2017-07-06 | 2020-05-19 | エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020087131A Active JP7027483B2 (ja) | 2017-07-06 | 2020-05-19 | エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP6833763B2 (ru) |
| KR (1) | KR102253364B1 (ru) |
| CN (1) | CN110809573B (ru) |
| TW (1) | TWI731248B (ru) |
| WO (1) | WO2019009093A1 (ru) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7128633B2 (ja) * | 2018-03-01 | 2022-08-31 | 株式会社日本触媒 | 樹脂組成物および光学フィルター |
| JP7231430B2 (ja) * | 2019-02-14 | 2023-03-01 | 株式会社日本触媒 | 樹脂組成物、インクおよび光学フィルター |
| JPWO2022168832A1 (ru) * | 2021-02-03 | 2022-08-11 | ||
| KR20240008309A (ko) * | 2021-05-14 | 2024-01-18 | 니혼 이타가라스 가부시키가이샤 | 광흡수성 조성물, 광흡수막, 광흡수막의 제조 방법, 및 광학 필터 |
| WO2023218937A1 (ja) * | 2022-05-13 | 2023-11-16 | Ａｇｃ株式会社 | 光学フィルタ及びｕｖ色素 |
| WO2024024442A1 (ja) * | 2022-07-25 | 2024-02-01 | 株式会社日本触媒 | 樹脂組成物 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1348142A (en) * | 1970-05-14 | 1974-03-13 | Sandoz Ltd | Derivatives of alpha-cyanacrylic acid their production and use as stabilizers for organic materials |
| US3850960A (en) * | 1971-05-04 | 1974-11-26 | Sandoz Ltd | Derivatives of alpha-cyanacrylic acid |
| US4591545A (en) * | 1983-05-10 | 1986-05-27 | Dainippon Ink And Chemicals, Inc. | Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender |
| JPH07100792B2 (ja) * | 1986-05-13 | 1995-11-01 | 三菱化学株式会社 | 液晶組成物 |
| US4749774A (en) * | 1986-12-29 | 1988-06-07 | Eastman Kodak Company | Condensation polymer containing the residue of a poly-methine compound and shaped articles produced therefrom |
| US4994512A (en) * | 1989-05-01 | 1991-02-19 | Eastman Kodak Company | Poly-methine compounds, condensation polymer having a poly-methine compound admixed therein and shaped articles produced therefrom |
| US5057594A (en) * | 1989-08-17 | 1991-10-15 | Eastman Kodak Company | Ultraviolet light-absorbing compounds and sunscreen formulations and polymeric materials containing such compounds or residues thereof |
| US6576797B1 (en) | 1994-03-31 | 2003-06-10 | Ciba Specialty Chemicals Corporation | Thioether substituted hydroxybenzophenones and stabilized compositions |
| JP2000136176A (ja) * | 1998-10-28 | 2000-05-16 | Chemiprokasei Kaisha Ltd | ポリメチン化合物、その製造方法および用途 |
| JP4612219B2 (ja) * | 2000-04-20 | 2011-01-12 | 三井化学株式会社 | 置換芳香族化合物の製造方法 |
| JP2003026942A (ja) | 2001-05-11 | 2003-01-29 | Kanegafuchi Chem Ind Co Ltd | 樹脂組成物 |
| JP2003043259A (ja) | 2001-08-01 | 2003-02-13 | Konica Corp | 光学フィルム、偏光板及び表示装置 |
| KR100479405B1 (ko) * | 2002-05-24 | 2005-03-30 | 주식회사 싸이제닉 | 신남산 이합체, 그 제조방법 및 퇴행성 뇌질환 치료를위한 그의 용도 |
| EP2265244A2 (en) * | 2008-03-13 | 2010-12-29 | Basf Se | Dimeric benzylidene malonates |
| JP2010059235A (ja) * | 2008-09-01 | 2010-03-18 | Fujifilm Corp | 紫外線吸収剤組成物 |
| JP2010100787A (ja) | 2008-10-27 | 2010-05-06 | Fujifilm Corp | 紫外線吸収剤およびこれを含む高分子材料 |
| WO2013047411A1 (ja) | 2011-09-29 | 2013-04-04 | 富士フイルム株式会社 | 新規なトリアジン誘導体、紫外線吸収剤 |
-
2018
- 2018-06-21 WO PCT/JP2018/023663 patent/WO2019009093A1/ja active Application Filing
- 2018-06-21 KR KR1020197033137A patent/KR102253364B1/ko active IP Right Grant
- 2018-06-21 CN CN201880044437.1A patent/CN110809573B/zh active Active
- 2018-06-21 JP JP2018117942A patent/JP6833763B2/ja active Active
- 2018-06-28 TW TW107122248A patent/TWI731248B/zh active
-
2020
- 2020-05-19 JP JP2020087131A patent/JP7027483B2/ja active Active
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