JP2018537144A - 電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦 - Google Patents

電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦 Download PDF

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JP2018537144A
JP2018537144A JP2018516181A JP2018516181A JP2018537144A JP 2018537144 A JP2018537144 A JP 2018537144A JP 2018516181 A JP2018516181 A JP 2018516181A JP 2018516181 A JP2018516181 A JP 2018516181A JP 2018537144 A JP2018537144 A JP 2018537144A
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diffraction grating
ridge
layer
ray
grating structure
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Japanese (ja)
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JP2018537144A5 (enExample
Inventor
ゲルハルト メルテンス
ゲルハルト メルテンス
ステーベンダール ウド バン
ステーベンダール ウド バン
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Koninklijke Philips NV
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Koninklijke Philips NV
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Publication of JP2018537144A publication Critical patent/JP2018537144A/ja
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/206—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using only longitudinal or thickness displacement, e.g. d33 or d31 type devices
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
JP2018516181A 2015-09-30 2016-09-23 電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦 Pending JP2018537144A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15187536 2015-09-30
EP15187536.6 2015-09-30
PCT/EP2016/072651 WO2017055181A1 (en) 2015-09-30 2016-09-23 Focussing of gratings for differential phase contrast imaging by means of electro-mechanic transducer foils

Publications (2)

Publication Number Publication Date
JP2018537144A true JP2018537144A (ja) 2018-12-20
JP2018537144A5 JP2018537144A5 (enExample) 2019-10-31

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JP2018516181A Pending JP2018537144A (ja) 2015-09-30 2016-09-23 電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦

Country Status (5)

Country Link
US (1) US20180294065A1 (enExample)
EP (1) EP3192080B1 (enExample)
JP (1) JP2018537144A (enExample)
CN (1) CN108140439B (enExample)
WO (1) WO2017055181A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6613988B2 (ja) * 2016-03-30 2019-12-04 コニカミノルタ株式会社 放射線撮影システム
EP3403581A1 (en) * 2017-05-15 2018-11-21 Koninklijke Philips N.V. Grid-mounting device for slit-scan differential phase contrast imaging
JP6743983B2 (ja) * 2017-10-31 2020-08-19 株式会社島津製作所 Ｘ線位相差撮像システム
US11116463B2 (en) * 2019-01-11 2021-09-14 The Board Of Trustees Of The Leland Stanford Junior University Apparatus with flexible x-ray gratings
EP3826032A1 (en) * 2019-11-22 2021-05-26 Koninklijke Philips N.V. Modular fabrication technique for gratings for interferometric x-ray imaging
CN115373010A (zh) * 2022-08-31 2022-11-22 山东航天电子技术研究所 一种基于磁致变形材料的智能x射线光学系统

Citations (3)

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JP2007206075A (ja) * 2006-02-01 2007-08-16 Siemens Ag Ｘ線装置の焦点−検出器装置
JP2008048910A (ja) * 2006-08-24 2008-03-06 Shimadzu Corp Ｘ線グリッド
JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法

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US3493287A (en) * 1966-04-26 1970-02-03 Ibm Optical detour phase system
JPS60256643A (ja) * 1984-05-31 1985-12-18 Moritomo Ando 減速装置
US5794023A (en) * 1996-05-31 1998-08-11 International Business Machines Corporation Apparatus utilizing a variably diffractive radiation element
US6985294B1 (en) * 2003-03-27 2006-01-10 Eric Rosenthal Full spectrum color projector
US6930817B2 (en) * 2003-04-25 2005-08-16 Palo Alto Research Center Incorporated Configurable grating based on surface relief pattern for use as a variable optical attenuator
WO2008038752A1 (en) * 2006-09-29 2008-04-03 Nikon Corporation Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method
WO2010109368A1 (en) * 2009-03-27 2010-09-30 Koninklijke Philips Electronics N.V. Differential phase-contrast imaging with circular gratings
CN102395877B (zh) * 2009-04-17 2014-04-09 西门子公司 用于进行相衬测量的检测装置和x射线断层摄影仪以及进行相衬测量的方法
EP2443491B1 (en) * 2009-06-16 2020-03-04 Koninklijke Philips N.V. Tilted gratings and method for production of tilted gratings
CN101813796B (zh) * 2010-02-26 2012-07-18 深圳大学 一种硅基x射线相位光栅制作方法及其制作装置
JP2012090945A (ja) * 2010-03-30 2012-05-17 Fujifilm Corp 放射線検出装置、放射線撮影装置、放射線撮影システム
JP5634318B2 (ja) * 2011-04-19 2014-12-03 三菱電機株式会社 半導体装置
JP5930866B2 (ja) * 2012-06-22 2016-06-08 キヤノン株式会社 液体吐出ヘッド
US10008659B2 (en) * 2014-12-09 2018-06-26 Lg Innotek Co., Ltd. Fingerprint sensor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007206075A (ja) * 2006-02-01 2007-08-16 Siemens Ag Ｘ線装置の焦点−検出器装置
JP2008048910A (ja) * 2006-08-24 2008-03-06 Shimadzu Corp Ｘ線グリッド
JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法

Also Published As

Publication number Publication date
CN108140439B (zh) 2022-06-07
US20180294065A1 (en) 2018-10-11
WO2017055181A1 (en) 2017-04-06
EP3192080A1 (en) 2017-07-19
CN108140439A (zh) 2018-06-08
EP3192080B1 (en) 2018-04-18

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