JP2018535390A - ハイドロゲルを含む軟性放射線遮蔽材及びその製造方法 - Google Patents
ハイドロゲルを含む軟性放射線遮蔽材及びその製造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L5/00—Compositions of polysaccharides or of their derivatives not provided for in groups C08L1/00 or C08L3/00
- C08L5/08—Chitin; Chondroitin sulfate; Hyaluronic acid; Derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
- C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L23/04—Homopolymers or copolymers of ethene
- C08L23/06—Polyethene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
- C08L29/02—Homopolymers or copolymers of unsaturated alcohols
- C08L29/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
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- G21F1/00—Shielding characterised by the composition of the materials
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- G21F1/08—Metals; Alloys; Cermets, i.e. sintered mixtures of ceramics and metals
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- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F1/00—Shielding characterised by the composition of the materials
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- G21F1/10—Organic substances; Dispersions in organic carriers
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- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
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Abstract
Description
アルギン酸(alginate)パウダーとアクリルアミド(acrylamide)パウダーを脱イオン水に溶かしてマトリックス製造用前駆体溶液を製造した。
30mlの脱イオン水にアクリルアミド(acrylamide)パウダーとアルギン酸(alginate)パウダーを8:1の重量比で溶かしてマトリックス製造用前駆体溶液を製造した。
前記の製造例2と同一にしてマトリックス製造用溶液を製造するが、Fe2O3の代わりにWO3とPbO2をそれぞれ適用して直径7cm*厚さ5mmのハイドロゲルマトリックスを製造し、この時の金属酸化物含量は0.1モルだった。また、ハイドロゲルマトリックスの厚さに変化を与えて、10mm、15mm、20mm、25mm、30mm、及び35mmのものをそれぞれ製造し(図5の写真を参照)、下記の評価に使用した。
1.放射線遮蔽性能評価方法
ガンマ線が遮蔽物質を透過する正確な値を求めるために、図6のような形態の実験装置を配置して実験を行った。検出器に入る散乱線をできるだけ防ぐために、線源支持台を鉛で製作し、内径5mm、縦40mm、横25mmとした。遮蔽物質は検出器と線源支持台との間に置いて測定した。使用した線源はCs−137(0.662MeV)であって、2011年11月に製作され、線源強度は5μCiである線源を使用した。
前記製造例1で製造した金属含有粒子を含有していないハイドロゲルマトリックスサンプルの遮蔽体(pureで表示)と前記製造例2で製造した酸化金属粒子を含有したハイドロゲルマトリックス遮蔽体(Fe2O3、WO3、PbO2を適用したハイドロゲルマトリックスをそれぞれ、Fe2O3、WO3、PbO2と表示する。)の厚さ別ガンマ線透過量を測定して下記の表1に示す。
1.機械的性質評価方法
マトリックス形態の軟性遮蔽体の機械的性質を測定するために引張器(Instron3343 50−N load cell)を用いて常温で引張実験を行った。
図10〜図12はそれぞれ、Fe2O3粒子、WO3粒子、及びPbO2粒子含有量に従うハイドロゲルマトリックス遮蔽体の破裂引張力評価結果を示すグラフである。
軟性遮蔽材料の酸化物量に対する応力変化を測定し、その結果を図13〜図15に示した。
Claims (11)
- イオン性架橋結合及び共有結合性架橋結合を含む相互侵透性重合体構造の水分含有高分子であるハイドロゲルマトリックスを含む、軟性放射線遮蔽材。
- 前記イオン性架橋結合は、架橋イオンと前記架橋イオンに接する第1高分子の高分子チェーンに存在する反応基によって形成される架橋結合を含み、前記共有結合性架橋結合は、i)架橋剤によって第2高分子の互いに隣り合う高分子チェーンに形成される第1共有結合性架橋結合、及びii)前記第1高分子の高分子チェーンと前記第2高分子の高分子チェーンとの間に存在し、架橋剤によって形成される第2共有結合性架橋結合、を含む、請求項1に記載の軟性放射線遮蔽材。
- 前記第1高分子は、アルギン酸(alginate)、キトサン(chitosan)、ヒアルロン酸(hyaluronicacid)及びそれらの組み合わせからなる群から選ばれるいずれか一つである、請求項2に記載の軟性放射線遮蔽材。
- 前記第2高分子は、ポリアクリルアミド(Polyacrylamide)、ポリビニルアルコール(Polyvinylalcohol)、ポリエチレン(Polyethylene)、ポリアクリル酸(Polyacrylicacid)及びそれらの組み合わせからなる群から選ばれるいずれか一つである、請求項2に記載の軟性放射線遮蔽材。
- 前記ハイドロゲルマトリックスは、その内部に分散される金属粒子、金属合金粒子、金属酸化物粒子及びそれらの組み合わせからなる群から選ばれるいずれか一つの金属含有粒子、又は放射線遮蔽粒子をさらに含む、請求項1に記載の軟性放射線遮蔽材。
- 前記金属含有粒子は、ボロン、リチウム、ガドリニウム、サマリウム、ユウロピウム、カドミウム、ジスプロシウム、鉛、鉄、タングステン、及びそれらの組み合わせからなる群から選ばれるいずれか一つ又はこれを含む化合物を含む、請求項5に記載の軟性放射線遮蔽材。
- イオン性架橋結合を形成する高分子の前駆体成分と共有結合性架橋結合を形成する高分子の前駆体成分を溶媒に混合してマトリックス製造用前駆体溶液を準備する前駆体準備段階と、
前記マトリックス製造用前駆体溶液に架橋結合開始剤、架橋剤、架橋促進剤、イオン性架橋剤及びそれらの組み合わせからなる群から選ばれるいずれか一つを含む添加剤を入れてマトリックス製造用溶液を製造する溶液製造段階と、
前記マトリックス製造用溶液を成形用モールドに入れて硬化して、イオン性架橋結合及び共有結合性架橋結合を含む相互侵透性重合体構造の水分含有高分子であるハイドロゲルマトリックスを製造するマトリックス製造段階と、
を有し、前記ハイドロゲルマトリックスを含む軟性放射線遮蔽材を製造する、軟性放射線遮蔽材の製造方法。 - 前記マトリックス製造用前駆体溶液は、前記イオン性架橋結合を形成する高分子の前駆体成分と前記共有結合性架橋結合を形成する高分子の前駆体成分を1:3〜19の重量比で含有する、請求項7に記載の軟性放射線遮蔽材の製造方法。
- 前記マトリックス製造用溶液に含まれるイオン性架橋剤は、前記イオン性架橋結合を形成する高分子の前駆体成分と前記イオン性架橋剤に含まれるイオンの比が1:0.1〜0.2のモル比率となるように含有する、請求項7に記載の軟性放射線遮蔽材の製造方法。
- 前記前駆体準備段階のマトリックス製造用前駆体溶液又は前記溶液製造段階のマトリックス製造用溶液は、金属粒子、金属合金粒子、金属酸化物粒子及びそれらの組み合わせからなる群から選ばれるいずれか一つの金属含有粒子又は放射線遮蔽粒子をさらに含み、前記マトリックス製造段階のハイドロゲルマトリックスは、その内部に分散して存在する前記金属含有粒子又は放射線遮蔽粒子をさらに含む、請求項7に記載の軟性放射線遮蔽材の製造方法。
- 請求項1に記載の軟性放射線遮蔽材を含む放射性物質遮蔽体を適用して、放射性物質又は放射線物質で汚染された廃棄物が収容された第1空間と、前記第1空間以外の空間である第2空間とを分離する、放射性物質の収容方法。
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