JP2018533770A5 - - Google Patents
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- Publication number
- JP2018533770A5 JP2018533770A5 JP2018522015A JP2018522015A JP2018533770A5 JP 2018533770 A5 JP2018533770 A5 JP 2018533770A5 JP 2018522015 A JP2018522015 A JP 2018522015A JP 2018522015 A JP2018522015 A JP 2018522015A JP 2018533770 A5 JP2018533770 A5 JP 2018533770A5
- Authority
- JP
- Japan
- Prior art keywords
- optical assembly
- optical
- thin film
- oxide
- assembly according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 42
- 239000010409 thin film Substances 0.000 claims 13
- 239000000356 contaminant Substances 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 3
- 230000001681 protective effect Effects 0.000 claims 3
- 238000010926 purge Methods 0.000 claims 3
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims 1
- 229910021538 borax Inorganic materials 0.000 claims 1
- 229910000420 cerium oxide Inorganic materials 0.000 claims 1
- 229910000423 chromium oxide Inorganic materials 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 229910000428 cobalt oxide Inorganic materials 0.000 claims 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims 1
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims 1
- 229910000484 niobium oxide Inorganic materials 0.000 claims 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000004328 sodium tetraborate Substances 0.000 claims 1
- 235000010339 sodium tetraborate Nutrition 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229910001930 tungsten oxide Inorganic materials 0.000 claims 1
- 229910001935 vanadium oxide Inorganic materials 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015221209.2 | 2015-10-29 | ||
| DE102015221209.2A DE102015221209A1 (de) | 2015-10-29 | 2015-10-29 | Optische Baugruppe mit einem Schutzelement und optische Anordnung damit |
| PCT/EP2016/075845 WO2017072195A1 (en) | 2015-10-29 | 2016-10-26 | Optical assembly with a protective element and optical arrangement therewith |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018533770A JP2018533770A (ja) | 2018-11-15 |
| JP2018533770A5 true JP2018533770A5 (https=) | 2019-12-05 |
| JP6805248B2 JP6805248B2 (ja) | 2020-12-23 |
Family
ID=57209463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018522015A Active JP6805248B2 (ja) | 2015-10-29 | 2016-10-26 | 保護素子を有する光学アセンブリおよびそのような光学アセンブリを有する光学装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11022893B2 (https=) |
| EP (1) | EP3368948B1 (https=) |
| JP (1) | JP6805248B2 (https=) |
| DE (1) | DE102015221209A1 (https=) |
| TW (1) | TWI745312B (https=) |
| WO (1) | WO2017072195A1 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11272606B2 (en) | 2017-06-27 | 2022-03-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV light source and apparatus for lithography |
| DE102017211443A1 (de) * | 2017-07-05 | 2019-01-10 | Carl Zeiss Smt Gmbh | Metrologiesystem mit einer EUV-Optik |
| DE102018110251B4 (de) * | 2018-04-27 | 2021-03-25 | Friedrich-Schiller-Universität Jena | Kontaminationsabweisender Spiegel und Verfahren zu dessen Herstellung |
| DE102019117964A1 (de) | 2019-07-03 | 2020-07-23 | Asml Netherlands B.V. | Lithographieanlage mit einer Überwachungseinrichtung für ein Pellikel |
| CA3299707A1 (en) * | 2019-07-26 | 2026-03-02 | Deka Products Limited Partnership | System and method for free space estimation |
| DE102019213349A1 (de) * | 2019-09-03 | 2021-03-04 | Carl Zeiss Smt Gmbh | Spiegelanordnung mit Wasserstoff-Barriere und optische Anordnung |
| DE102019214269A1 (de) * | 2019-09-19 | 2021-03-25 | Carl Zeiss Smt Gmbh | Facettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage |
| DE102022121000B4 (de) | 2021-08-23 | 2024-03-07 | Carl Zeiss Smt Gmbh | Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage mit einer Schutzvorrichtung zum Schutz der optischen Wirkfläche und EUV-Projektionsbelichtungsanlage |
| DE102021211619A1 (de) | 2021-10-14 | 2023-04-20 | Carl Zeiss Smt Gmbh | EUV- Mehrfachspiegelanordnung |
| DE102022209427A1 (de) * | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen |
| DE102024206218A1 (de) * | 2024-07-02 | 2026-01-08 | Carl Zeiss Smt Gmbh | Element zur Verwendung in einem mikro-elektro-mechanischen System und mikro-elektro-mechanisches System |
| DE102024127052A1 (de) | 2024-09-19 | 2026-03-19 | Carl Zeiss Smt Gmbh | Optisches System mit Mehrfachspiegelanordnung und Betriebssteuerungsverfahren |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6445844B1 (en) * | 1999-09-15 | 2002-09-03 | Xros, Inc. | Flexible, modular, compact fiber optic switch |
| US6701512B2 (en) * | 2001-01-24 | 2004-03-02 | Kabushiki Kaisha Toshiba | Focus monitoring method, exposure apparatus, and exposure mask |
| US6594073B2 (en) * | 2001-05-30 | 2003-07-15 | Micro Lithography, Inc. | Antistatic optical pellicle |
| DE602004003015T2 (de) * | 2003-10-06 | 2007-02-08 | Asml Netherlands B.V. | Verfahren und Gerät zur Herstellung einer Schutzschicht auf einem Spiegel |
| US7633073B2 (en) | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2008153396A (ja) * | 2006-12-15 | 2008-07-03 | Nikon Corp | 照度均一化装置、露光装置、露光方法および半導体デバイスの製造方法 |
| US20080259298A1 (en) | 2007-04-19 | 2008-10-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7829248B2 (en) | 2007-07-24 | 2010-11-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle stress relief |
| DE102008041436A1 (de) | 2007-10-02 | 2009-04-09 | Carl Zeiss Smt Ag | Optisches Membranelement |
| DE102008028868A1 (de) * | 2008-06-19 | 2009-12-24 | Carl Zeiss Smt Ag | Optische Baugruppe |
| NL2005724A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| JP2012216743A (ja) * | 2010-06-16 | 2012-11-08 | Gigaphoton Inc | スペクトル純度フィルタ及びそれを備える極端紫外光生成装置 |
| KR101846336B1 (ko) * | 2010-06-25 | 2018-04-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 방법 |
| DE102012202057B4 (de) | 2012-02-10 | 2021-07-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement |
| DE102012204295A1 (de) * | 2012-03-19 | 2013-03-28 | Carl Zeiss Smt Gmbh | Filterelement |
| JP6253641B2 (ja) * | 2012-05-21 | 2017-12-27 | エーエスエムエル ネザーランズ ビー．ブイ． | リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置 |
| JP5711703B2 (ja) | 2012-09-03 | 2015-05-07 | 信越化学工業株式会社 | Ｅｕｖ用ペリクル |
| US20150234281A1 (en) * | 2012-10-05 | 2015-08-20 | Rudolph Technologies, Inc. | Blade for Substrate Edge Protection During Photolithography |
| JP6382298B2 (ja) * | 2013-03-27 | 2018-08-29 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置 |
-
2015
- 2015-10-29 DE DE102015221209.2A patent/DE102015221209A1/de not_active Ceased
-
2016
- 2016-10-26 WO PCT/EP2016/075845 patent/WO2017072195A1/en not_active Ceased
- 2016-10-26 EP EP16788086.3A patent/EP3368948B1/en active Active
- 2016-10-26 JP JP2018522015A patent/JP6805248B2/ja active Active
- 2016-10-27 TW TW105134737A patent/TWI745312B/zh active
-
2018
- 2018-04-28 US US15/965,913 patent/US11022893B2/en active Active
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