JP2018533184A - イオン注入システム用の低導電性自己遮蔽絶縁体 - Google Patents

イオン注入システム用の低導電性自己遮蔽絶縁体 Download PDF

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Publication number
JP2018533184A
JP2018533184A JP2018521416A JP2018521416A JP2018533184A JP 2018533184 A JP2018533184 A JP 2018533184A JP 2018521416 A JP2018521416 A JP 2018521416A JP 2018521416 A JP2018521416 A JP 2018521416A JP 2018533184 A JP2018533184 A JP 2018533184A
Authority
JP
Japan
Prior art keywords
insulator
features
elongated body
ion
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018521416A
Other languages
English (en)
Japanese (ja)
Inventor
エフ． バジェット，ジョン
エフ． バジェット，ジョン
ケイ． コルヴィン，ニール
ケイ． コルヴィン，ニール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Axcelis Technologies Inc
Original Assignee
Axcelis Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Technologies Inc filed Critical Axcelis Technologies Inc
Publication of JP2018533184A publication Critical patent/JP2018533184A/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2018521416A 2015-11-10 2016-11-10 イオン注入システム用の低導電性自己遮蔽絶縁体 Pending JP2018533184A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562253399P 2015-11-10 2015-11-10
US62/253,399 2015-11-10
PCT/US2016/061331 WO2017083516A1 (en) 2015-11-10 2016-11-10 Low conductance self-shielding insulator for ion implantation systems

Publications (1)

Publication Number Publication Date
JP2018533184A true JP2018533184A (ja) 2018-11-08

Family

ID=57396837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018521416A Pending JP2018533184A (ja) 2015-11-10 2016-11-10 イオン注入システム用の低導電性自己遮蔽絶縁体

Country Status (5)

Country Link
JP (1) JP2018533184A (ko)
KR (1) KR20180081483A (ko)
CN (1) CN108352229A (ko)
TW (1) TWI745319B (ko)
WO (1) WO2017083516A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11791126B2 (en) 2019-08-27 2023-10-17 Applied Materials, Inc. Apparatus for directional processing

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB191516550A (en) * 1915-11-23 1916-09-14 John Brightwen Alexander Improved Telegraph or Telephone Line Insulator.
JPS5435614A (en) 1977-08-24 1979-03-15 Nec Corp Transfer speed selecting system in facsimile
JPS6260873A (ja) * 1985-09-10 1987-03-17 Toshiba Corp 成膜用電気絶縁部材およびそれを用いた成膜方法
US5443798A (en) 1993-10-27 1995-08-22 The Charles Stark Draper Laboratories Separator plate for a chemical oxygen generator candle and assembly and generator made therefrom
KR100796795B1 (ko) 2001-10-22 2008-01-22 삼성전자주식회사 반도체 소자의 접촉부 및 그 제조 방법과 이를 포함하는표시 장치용 박막 트랜지스터 어레이 기판 및 그 제조 방법
DE102005059754B4 (de) * 2005-12-09 2010-05-27 Siemens Ag Spritzgussgeformte Außenkonusdurchführung
US7804076B2 (en) * 2006-05-10 2010-09-28 Taiwan Semiconductor Manufacturing Co., Ltd Insulator for high current ion implanters
KR101810065B1 (ko) 2010-05-21 2017-12-18 어플라이드 머티어리얼스, 인코포레이티드 대면적 전극 상에 억지 끼워맞춤된 세라믹 절연체
WO2012168142A1 (en) * 2011-06-09 2012-12-13 Abb Technology Ag Strengthening element for a mounting flange of a hollow cylindrical insulator housing
JP5965345B2 (ja) * 2013-03-29 2016-08-03 住友重機械イオンテクノロジー株式会社 イオン注入装置のための高電圧電極の絶縁構造および高電圧絶縁方法

Also Published As

Publication number Publication date
TWI745319B (zh) 2021-11-11
KR20180081483A (ko) 2018-07-16
TW201824323A (zh) 2018-07-01
WO2017083516A1 (en) 2017-05-18
CN108352229A (zh) 2018-07-31

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