JP2018523133A5 - - Google Patents

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JP2018523133A5
JP2018523133A5 JP2018510315A JP2018510315A JP2018523133A5 JP 2018523133 A5 JP2018523133 A5 JP 2018523133A5 JP 2018510315 A JP2018510315 A JP 2018510315A JP 2018510315 A JP2018510315 A JP 2018510315A JP 2018523133 A5 JP2018523133 A5 JP 2018523133A5
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JP
Japan
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optical elements
offset beams
diffractive optical
optical element
acousto
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JP2018510315A
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Japanese (ja)
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JP6678233B2 (ja
JP2018523133A (ja
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Priority claimed from US14/982,747 external-priority patent/US9891175B2/en
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JP2018510315A 2015-05-08 2016-05-04 スポットの２ｄアレイによる斜め入射走査のシステムおよび方法 Active JP6678233B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562159173P 2015-05-08 2015-05-08
US62/159,173 2015-05-08
US14/982,747 US9891175B2 (en) 2015-05-08 2015-12-29 System and method for oblique incidence scanning with 2D array of spots
US14/982,747 2015-12-29
PCT/US2016/030838 WO2016182820A1 (en) 2015-05-08 2016-05-04 Systems and methods for oblique incidence scanning with 2d array of spots

Publications (3)

Publication Number Publication Date
JP2018523133A JP2018523133A (ja) 2018-08-16
JP2018523133A5 true JP2018523133A5 (https=) 2019-05-30
JP6678233B2 JP6678233B2 (ja) 2020-04-08

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JP2018510315A Active JP6678233B2 (ja) 2015-05-08 2016-05-04 スポットの２ｄアレイによる斜め入射走査のシステムおよび方法

Country Status (8)

Country Link
US (1) US9891175B2 (https=)
EP (1) EP3295477B1 (https=)
JP (1) JP6678233B2 (https=)
KR (1) KR102374253B1 (https=)
CN (1) CN107580677B (https=)
IL (1) IL255084B (https=)
TW (1) TWI683102B (https=)
WO (1) WO2016182820A1 (https=)

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US11118903B2 (en) * 2018-10-17 2021-09-14 Kla Corporation Efficient illumination shaping for scatterometry overlay
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CN111624757B (zh) * 2020-06-15 2025-09-05 苏州智立洁医疗器械有限公司 一种三镜头扫描显微装置
JP7554064B2 (ja) * 2020-06-30 2024-09-19 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
JP7608089B2 (ja) * 2020-08-11 2025-01-06 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
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US20250341479A1 (en) * 2022-07-25 2025-11-06 Asml Netherlands B.V. Metrology system using multiple radiation spots
WO2024048800A1 (ko) * 2022-08-29 2024-03-07 (주)구일엔지니어링 웨이퍼 검사 시스템
US20240310292A1 (en) * 2023-03-14 2024-09-19 Kla Corporation Oblique uniform illumination for imaging systems
DE102023204171B4 (de) * 2023-05-05 2026-02-19 Carl Zeiss Smt Gmbh Optisches System für ein Metrologiesystem sowie Metrologiesystem mit einem derartigen optischen System
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