JP2018512738A5 - - Google Patents
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- JP2018512738A5 JP2018512738A5 JP2017552449A JP2017552449A JP2018512738A5 JP 2018512738 A5 JP2018512738 A5 JP 2018512738A5 JP 2017552449 A JP2017552449 A JP 2017552449A JP 2017552449 A JP2017552449 A JP 2017552449A JP 2018512738 A5 JP2018512738 A5 JP 2018512738A5
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- information
- incorporated
- wafer shape
- controller
- overlay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004886 process control Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Description
別の実施形態では、チャックされた状態の基板の面内歪みを取得すると、コントローラ112(または別のコントローラ)は、この情報を用いて、下流の計測ツール115に情報をフィードフォワードしてもよい。例えば、面内歪み情報を(その他のウェハ形状情報とともに)、オーバーレイ高度プロセス制御(APC)ループでのフィードフォワード制御スキームに用いてもよい。オーバーレイの誤差を予測するためのウェハ形状解析の使用については、2014年9月18日に出願された、Vukkadala他による米国特許出願公開第2015/0120216号に記載されており、同出願は全体の参照により本明細書に組み込まれる。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562143708P | 2015-04-06 | 2015-04-06 | |
US62/143,708 | 2015-04-06 | ||
US15/091,021 | 2016-04-05 | ||
US15/091,021 US10024654B2 (en) | 2015-04-06 | 2016-04-05 | Method and system for determining in-plane distortions in a substrate |
PCT/US2016/026148 WO2016164415A1 (en) | 2015-04-06 | 2016-04-06 | Method and system for determining in-plane distortions in a substrate |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018512738A JP2018512738A (ja) | 2018-05-17 |
JP2018512738A5 true JP2018512738A5 (ja) | 2019-05-16 |
JP6762317B2 JP6762317B2 (ja) | 2020-09-30 |
Family
ID=57017441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017552449A Active JP6762317B2 (ja) | 2015-04-06 | 2016-04-06 | 基板の面内歪みを検査する方法およびシステム |
Country Status (7)
Country | Link |
---|---|
US (1) | US10024654B2 (ja) |
JP (1) | JP6762317B2 (ja) |
KR (1) | KR102353250B1 (ja) |
CN (1) | CN107431030B (ja) |
SG (1) | SG11201708137VA (ja) |
TW (1) | TWI661175B (ja) |
WO (1) | WO2016164415A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10236222B2 (en) * | 2017-02-08 | 2019-03-19 | Kla-Tencor Corporation | System and method for measuring substrate and film thickness distribution |
EP3364247A1 (en) * | 2017-02-17 | 2018-08-22 | ASML Netherlands B.V. | Methods & apparatus for monitoring a lithographic manufacturing process |
EP3457213A1 (en) * | 2017-09-18 | 2019-03-20 | ASML Netherlands B.V. | Methods and apparatus for use in a device manufacturing method |
US11300889B2 (en) | 2018-08-22 | 2022-04-12 | Asml Netherlands B.V. | Metrology apparatus |
KR20200090488A (ko) | 2019-01-21 | 2020-07-29 | 삼성전자주식회사 | 반도체 소자 제조 방법 |
TWI731760B (zh) * | 2020-07-28 | 2021-06-21 | 亞亞科技股份有限公司 | 電路板翹曲檢測裝置 |
CN113203357B (zh) * | 2021-04-09 | 2022-08-09 | 中国科学院上海光学精密机械研究所 | 一种双侧斐索干涉仪检测装置 |
US11940266B2 (en) * | 2021-09-21 | 2024-03-26 | The Aerospace Corporation | Process for rapidly measuring coefficient of moisture expansion (CME) values for materials |
WO2023219982A1 (en) * | 2022-05-13 | 2023-11-16 | Applied Materials, Inc. | Dose mapping using substrate curvature to compensate for out-of-plane distortion |
CN117238812B (zh) * | 2023-11-10 | 2024-04-05 | 四川省农业机械科学研究院 | 基板翘曲测量装置及测量方法 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5444538A (en) * | 1994-03-10 | 1995-08-22 | New Vision Systems, Inc. | System and method for optimizing the grid and intrafield registration of wafer patterns |
JPH09129635A (ja) * | 1995-10-30 | 1997-05-16 | Mitsubishi Electric Corp | 半導体形状予測シミュレーション方法及びそのシステム |
EP1390691A2 (en) * | 2001-05-25 | 2004-02-25 | California Institute Of Technology | Determining large deformations and stresses of layered and graded structures to include effects of body forces |
JP3892750B2 (ja) * | 2002-04-12 | 2007-03-14 | 独立行政法人科学技術振興機構 | 三次元特徴領域抽出装置 |
JP4464033B2 (ja) | 2002-06-13 | 2010-05-19 | 信越半導体株式会社 | 半導体ウエーハの形状評価方法及び形状評価装置 |
US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
MY164487A (en) * | 2002-07-11 | 2017-12-29 | Molecular Imprints Inc | Step and repeat imprint lithography processes |
WO2004054784A1 (en) | 2002-12-13 | 2004-07-01 | Molecular Imprints, Inc. | Magnification corrections employing out-of-plane distortions on a substrate |
US6847458B2 (en) * | 2003-03-20 | 2005-01-25 | Phase Shift Technology, Inc. | Method and apparatus for measuring the shape and thickness variation of polished opaque plates |
JP2006004259A (ja) * | 2004-06-18 | 2006-01-05 | Nec Corp | 電子機器の設計支援システム及び多層プリント回路基板の設計支援システム |
US7418353B2 (en) | 2004-10-12 | 2008-08-26 | Wisconsin Alumni Research Foundation | Determining film stress from substrate shape using finite element procedures |
USD541979S1 (en) * | 2005-12-30 | 2007-05-01 | Crown Packaging Technology, Inc. | Spatula surface cosmetic applicator |
US7712068B2 (en) | 2006-02-17 | 2010-05-04 | Zhuoxiang Ren | Computation of electrical properties of an IC layout |
US8175831B2 (en) * | 2007-04-23 | 2012-05-08 | Kla-Tencor Corp. | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers |
WO2008151083A1 (en) | 2007-05-30 | 2008-12-11 | Kla-Tencor Corporation | Feedforward/feedback litho process control of stress and overlay |
JP2009003529A (ja) * | 2007-06-19 | 2009-01-08 | Sharp Corp | モデル生成装置、モデル生成方法およびモデル生成プログラム |
US7873585B2 (en) | 2007-08-31 | 2011-01-18 | Kla-Tencor Technologies Corporation | Apparatus and methods for predicting a semiconductor parameter across an area of a wafer |
US8065109B2 (en) | 2008-08-28 | 2011-11-22 | Kla-Tencor Corporation | Localized substrate geometry characterization |
US8068234B2 (en) * | 2009-02-18 | 2011-11-29 | Kla-Tencor Corporation | Method and apparatus for measuring shape or thickness information of a substrate |
CN101629859B (zh) * | 2009-05-04 | 2011-04-20 | 付康 | 基于变形测量与数值反求确定薄膜应力的系统与方法 |
US8768665B2 (en) | 2010-01-08 | 2014-07-01 | Kla-Tencor Technologies Corporation | Site based quantification of substrate topography and its relation to lithography defocus and overlay |
NL2005989A (en) | 2010-02-19 | 2011-08-23 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
US8625083B2 (en) * | 2011-03-12 | 2014-01-07 | Ken Roberts | Thin film stress measurement 3D anisotropic volume |
US9354526B2 (en) * | 2011-10-11 | 2016-05-31 | Kla-Tencor Corporation | Overlay and semiconductor process control using a wafer geometry metric |
CN103245437B (zh) * | 2012-02-13 | 2017-02-08 | 付康 | 一种确定非线性薄膜应力的系统与方法 |
KR101664962B1 (ko) | 2012-05-29 | 2016-10-11 | 에이에스엠엘 네델란즈 비.브이. | 오버레이를 보정하기 위한 정렬 마크들의 유용도를 결정하는 방법, 및 리소그래피 장치 및 오버레이 측정 시스템의 조합 |
US9430593B2 (en) | 2012-10-11 | 2016-08-30 | Kla-Tencor Corporation | System and method to emulate finite element model based prediction of in-plane distortions due to semiconductor wafer chucking |
US9036157B2 (en) * | 2012-10-19 | 2015-05-19 | National Applied Research Laboratories | System of computing surface reconstruction, in-plane and out-of-plane displacements and strain distribution |
US20140152797A1 (en) * | 2012-12-04 | 2014-06-05 | Samsung Electronics Co., Ltd. | Confocal optical inspection apparatus and confocal optical inspection method |
US10401279B2 (en) | 2013-10-29 | 2019-09-03 | Kla-Tencor Corporation | Process-induced distortion prediction and feedforward and feedback correction of overlay errors |
US9087176B1 (en) | 2014-03-06 | 2015-07-21 | Kla-Tencor Corporation | Statistical overlay error prediction for feed forward and feedback correction of overlay errors, root cause analysis and process control |
US9311443B2 (en) | 2014-06-17 | 2016-04-12 | Globalfoundries Inc. | Correcting for stress induced pattern shifts in semiconductor manufacturing |
US10509329B2 (en) | 2014-09-03 | 2019-12-17 | Kla-Tencor Corporation | Breakdown analysis of geometry induced overlay and utilization of breakdown analysis for improved overlay control |
-
2016
- 2016-04-05 US US15/091,021 patent/US10024654B2/en active Active
- 2016-04-06 CN CN201680019869.8A patent/CN107431030B/zh active Active
- 2016-04-06 JP JP2017552449A patent/JP6762317B2/ja active Active
- 2016-04-06 SG SG11201708137VA patent/SG11201708137VA/en unknown
- 2016-04-06 KR KR1020177032141A patent/KR102353250B1/ko active IP Right Grant
- 2016-04-06 WO PCT/US2016/026148 patent/WO2016164415A1/en active Application Filing
- 2016-04-06 TW TW105110795A patent/TWI661175B/zh active
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