JP2018502040A5 - - Google Patents

Download PDF

Info

Publication number
JP2018502040A5
JP2018502040A5 JP2017533968A JP2017533968A JP2018502040A5 JP 2018502040 A5 JP2018502040 A5 JP 2018502040A5 JP 2017533968 A JP2017533968 A JP 2017533968A JP 2017533968 A JP2017533968 A JP 2017533968A JP 2018502040 A5 JP2018502040 A5 JP 2018502040A5
Authority
JP
Japan
Prior art keywords
energy
electromagnetic beam
less
diffusion bond
absorbing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017533968A
Other languages
English (en)
Japanese (ja)
Other versions
JP6761419B2 (ja
JP2018502040A (ja
Filing date
Publication date
Priority claimed from US14/976,475 external-priority patent/US10124559B2/en
Application filed filed Critical
Publication of JP2018502040A publication Critical patent/JP2018502040A/ja
Publication of JP2018502040A5 publication Critical patent/JP2018502040A5/ja
Application granted granted Critical
Publication of JP6761419B2 publication Critical patent/JP6761419B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017533968A 2014-12-24 2015-12-22 速度論的に制限されたナノスケールの拡散ボンド構造及び方法 Active JP6761419B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462096706P 2014-12-24 2014-12-24
US62/096,706 2014-12-24
US14/976,475 US10124559B2 (en) 2014-12-24 2015-12-21 Kinetically limited nano-scale diffusion bond structures and methods
US14/976,475 2015-12-21
PCT/US2015/067390 WO2016106323A1 (en) 2014-12-24 2015-12-22 Kinetically limited nano-scale diffusion bond structures and methods

Publications (3)

Publication Number Publication Date
JP2018502040A JP2018502040A (ja) 2018-01-25
JP2018502040A5 true JP2018502040A5 (enExample) 2020-04-16
JP6761419B2 JP6761419B2 (ja) 2020-09-23

Family

ID=55262895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017533968A Active JP6761419B2 (ja) 2014-12-24 2015-12-22 速度論的に制限されたナノスケールの拡散ボンド構造及び方法

Country Status (6)

Country Link
US (3) US10124559B2 (enExample)
EP (1) EP3237141B1 (enExample)
JP (1) JP6761419B2 (enExample)
KR (1) KR102474915B1 (enExample)
CN (1) CN107107251B (enExample)
WO (1) WO2016106323A1 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10136535B2 (en) 2014-12-24 2018-11-20 Medtronic, Inc. Hermetically-sealed packages including feedthrough assemblies
US10124559B2 (en) 2014-12-24 2018-11-13 Medtronic, Inc. Kinetically limited nano-scale diffusion bond structures and methods
US9968794B2 (en) 2014-12-24 2018-05-15 Medtronic, Inc. Implantable medical device system including feedthrough assembly and method of forming same
US9865533B2 (en) 2014-12-24 2018-01-09 Medtronic, Inc. Feedthrough assemblies
US20170100597A1 (en) 2015-10-12 2017-04-13 Medtronic, Inc. Sealed implantable medical device and method of forming same
US10772228B2 (en) 2015-11-03 2020-09-08 Medtronic, Inc. Sealed package including electronic device and power source
US10098589B2 (en) 2015-12-21 2018-10-16 Medtronic, Inc. Sealed package and method of forming same
US10252371B2 (en) * 2016-02-12 2019-04-09 The Boeing Company Diffusion-bonded metallic materials
US20190177219A1 (en) 2016-06-03 2019-06-13 Raymond Miller Karam Method and apparatus for vacuum insulated glazings
US10580544B2 (en) 2016-12-07 2020-03-03 Medtronic, Inc. Power source and method of forming same
US10542921B2 (en) 2017-04-03 2020-01-28 Medtronic, Inc. Hermetically-sealed package and method of forming same
US10463285B2 (en) 2017-04-03 2019-11-05 Medtronic, Inc. Hermetically-sealed package and method of forming same
US10918874B2 (en) 2018-06-28 2021-02-16 Medtronic, Inc. Sealed package and method of forming same
DE102018120011B4 (de) * 2018-08-16 2022-06-15 Trumpf Laser Und Systemtechnik Gmbh Schweißverfahren zum Verbinden eines transparenten, aluminiumoxidhaltigen ersten Substrats mit einem opaken zweiten Substrat
US10888009B2 (en) 2018-10-26 2021-01-05 Medtronic, Inc. Method of forming a sealed package
US11865639B2 (en) 2019-12-13 2024-01-09 Medtronic, Inc. Hermetic assembly and device including same
US11633611B2 (en) 2019-12-19 2023-04-25 Medtronic, Inc. Feedthrough assembly and device including same
US20210186422A1 (en) * 2019-12-20 2021-06-24 Medtronic, Inc. Implantable medical device with metal and polymer housing
KR20230038578A (ko) * 2020-07-22 2023-03-20 트룸프 레이저-운트 시스템테크닉 게엠베하 적어도 2개의 접합 부재를 접합하기 위한 장치 및 방법
EP4210817A1 (en) 2020-09-09 2023-07-19 Medtronic, Inc. Electronic package and implantable medical device including same
US12290693B2 (en) 2021-02-01 2025-05-06 Medtronic, Inc. Feedthrough header assembly and device including same
US12082354B2 (en) 2021-02-01 2024-09-03 Medtronic, Inc. Electronic package and device including same
US11725995B2 (en) 2021-02-01 2023-08-15 Medtronic, Inc. Pressure sensor assembly for use in implantable medical device including a substrate having via that extends through substrate along via axis between first major surface and second major surface of substrate
WO2022165297A1 (en) 2021-02-01 2022-08-04 Medtronic, Inc. Feedthrough header assembly and device including same
EP4395956A1 (en) 2021-08-30 2024-07-10 Corning Incorporated Laser bonding of glass to thin metal foil
US12485276B1 (en) 2021-12-03 2025-12-02 Greatbatch Ltd. Miniature active implantable medical device having a high-purity fused silica wafer assembly micro-bonded to a titanium power source housing
WO2023152610A1 (en) 2022-02-08 2023-08-17 Medtronic, Inc. Feedthrough assembly and implantable medical device including same
WO2025046334A1 (en) 2023-08-31 2025-03-06 Medtronic, Inc. Feedthrough assembly and device including same
WO2025158310A1 (en) 2024-01-24 2025-07-31 Medtronic, Inc. Pressure sensor assembly and implantable medical device including same
US20250263346A1 (en) 2024-02-19 2025-08-21 Greatbatch Ltd Micro-Scale Diffusion Bonding of an Optically Transparent Ceramic To a Conductive Metal
WO2025226825A1 (en) * 2024-04-23 2025-10-30 The Board Of Trustees Of The Leland Stanford Junior University Wafer-scale thin-film titanium:sapphire photonics
WO2025250759A1 (en) 2024-05-31 2025-12-04 Medtronic, Inc. Implantable medical device and enclosure including vent

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101296A (ja) 1982-12-02 1984-06-11 Mitsubishi Heavy Ind Ltd レ−ザ溶接装置
NL8303109A (nl) 1983-09-08 1985-04-01 Philips Nv Werkwijze voor het aan elkaar bevestigen van twee delen.
NL8600216A (nl) 1986-01-30 1987-08-17 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
NL8902271A (nl) 1989-09-12 1991-04-02 Philips Nv Werkwijze voor het verbinden van twee lichamen.
US5647932A (en) 1993-05-18 1997-07-15 Matsushita Electric Industrial Co., Ltd. Method of processing a piezoelectric device
NO942790D0 (no) 1994-03-28 1994-07-27 Norsk Hydro As Fremgangsmåte ved friksjonssveising og anordning for samme
JP2754461B2 (ja) 1994-07-08 1998-05-20 双葉電子工業株式会社 容器の封着方法および封着装置
US5489321A (en) 1994-07-14 1996-02-06 Midwest Research Institute Welding/sealing glass-enclosed space in a vacuum
GB9821375D0 (en) 1998-10-01 1998-11-25 Welding Inst Welding method
JP2000271769A (ja) * 1999-03-29 2000-10-03 Sanyo Electric Co Ltd 溶着方法、それを用いた電極構造の製造方法、電極構造および熱電素子の製造方法並びに熱電素子
JP2000343264A (ja) 1999-06-04 2000-12-12 Aisan Ind Co Ltd レーザ溶接装置
US6477901B1 (en) 1999-12-21 2002-11-12 Integrated Sensing Systems, Inc. Micromachined fluidic apparatus
US6555025B1 (en) 2000-01-31 2003-04-29 Candescent Technologies Corporation Tuned sealing material for sealing of a flat panel display
WO2002058551A2 (en) 2001-01-22 2002-08-01 Integrated Sensing Systems, Inc. Wireless mems capacitive sensor for physiologic parameter measurement
US6503847B2 (en) 2001-04-26 2003-01-07 Institute Of Microelectronics Room temperature wafer-to-wafer bonding by polydimethylsiloxane
DE10149140A1 (de) 2001-10-05 2003-04-17 Bosch Gmbh Robert Verfahren zur Verbindung einer Siliziumplatte mit einer weiteren Platte
JP3827071B2 (ja) 2001-11-02 2006-09-27 本田技研工業株式会社 樹脂部材のレーザ接合方法
JP2003225946A (ja) * 2002-02-01 2003-08-12 Denso Corp レーザ接着方法およびレーザ接着装置
US6762072B2 (en) 2002-03-06 2004-07-13 Robert Bosch Gmbh SI wafer-cap wafer bonding method using local laser energy, device produced by the method, and system used in the method
US6977187B2 (en) 2002-06-19 2005-12-20 Foster-Miller, Inc. Chip package sealing method
US6822326B2 (en) 2002-09-25 2004-11-23 Ziptronix Wafer bonding hermetic encapsulation
US7344901B2 (en) 2003-04-16 2008-03-18 Corning Incorporated Hermetically sealed package and method of fabricating of a hermetically sealed package
US6998776B2 (en) 2003-04-16 2006-02-14 Corning Incorporated Glass package that is hermetically sealed with a frit and method of fabrication
US7557433B2 (en) 2004-10-25 2009-07-07 Mccain Joseph H Microelectronic device with integrated energy source
DE102004004985B4 (de) 2004-01-30 2006-03-23 Lpkf Laser & Electronics Ag Verfahren und Vorrichtung zum Durchstrahlschweißen zweier thermoplastischer Bauteile
US20050284815A1 (en) 2004-06-28 2005-12-29 Integrated Sensing Systems, Inc. Medical treatment system and method
US7919112B2 (en) 2004-08-26 2011-04-05 Pathak Holdings, Llc Implantable tissue compositions and method
US7078726B2 (en) 2004-09-09 2006-07-18 Osram Opto Semiconductors Gmbh Sealing of electronic device using absorbing layer for glue line
US8323333B2 (en) 2005-03-03 2012-12-04 Icon Medical Corp. Fragile structure protective coating
US20090060782A1 (en) 2005-03-31 2009-03-05 Rohm Co., Ltd. Method for bonding substrates, method for forming chip, and chip
US7417307B2 (en) 2005-07-29 2008-08-26 Hewlett-Packard Development Company, L.P. System and method for direct-bonding of substrates
KR100654410B1 (ko) * 2005-12-22 2006-12-05 한국항공우주연구원 확산접합 및 초소성성형용 치구
KR100673765B1 (ko) 2006-01-20 2007-01-24 삼성에스디아이 주식회사 유기전계발광 표시장치 및 그 제조방법
KR100688790B1 (ko) 2006-01-27 2007-03-02 삼성에스디아이 주식회사 유기 전계 발광 표시장치 및 그 제조 방법
US7635635B2 (en) 2006-04-06 2009-12-22 Fairchild Semiconductor Corporation Method for bonding a semiconductor substrate to a metal substrate
EP1903000B1 (fr) 2006-09-25 2019-09-18 Sorin CRM SAS Composant biocompatible implantable incorporant un élément actif intégré tel qu'un capteur de mesure d'un paramètre physiologique, microsystème électromécanique ou circuit électronique
JP4714948B2 (ja) 2006-10-05 2011-07-06 岡山県 レーザー接合用中間部材及びそれを用いた接合方法
DE102007008540A1 (de) 2007-02-21 2008-08-28 Friedrich-Schiller-Universität Jena Verfahren zum Laser-gestützten Bonden, derart gebondete Substrate und deren Verwendung
US8243766B2 (en) 2007-09-21 2012-08-14 Michael Huff Means for improved implementation of laser diodes and laser diode arrays
JP4806003B2 (ja) 2007-12-25 2011-11-02 財団法人岡山県産業振興財団 レーザー接合用シート及びそれを用いた接合方法
US8304324B2 (en) 2008-05-16 2012-11-06 Corporation For National Research Initiatives Low-temperature wafer bonding of semiconductors to metals
US8448468B2 (en) 2008-06-11 2013-05-28 Corning Incorporated Mask and method for sealing a glass envelope
US20100262208A1 (en) 2009-04-08 2010-10-14 National Ict Australia Limited Electronics package for an active implantable medical device
CN102460677A (zh) 2009-04-16 2012-05-16 休斯微技术股份有限公司 用于临时晶片接合和剥离的改进装置
JP4430131B1 (ja) 2009-08-10 2010-03-10 静岡県 レーザ溶融接合用ベルト素材及びレーザ接合方法
JP2011056519A (ja) * 2009-09-07 2011-03-24 Osaka Univ 接合方法および接合体の製造方法
US9171721B2 (en) 2010-10-26 2015-10-27 Medtronic, Inc. Laser assisted direct bonding
US8666505B2 (en) 2010-10-26 2014-03-04 Medtronic, Inc. Wafer-scale package including power source
US8796109B2 (en) 2010-12-23 2014-08-05 Medtronic, Inc. Techniques for bonding substrates using an intermediate layer
US9492990B2 (en) * 2011-11-08 2016-11-15 Picosys Incorporated Room temperature glass-to-glass, glass-to-plastic and glass-to-ceramic/semiconductor bonding
CN104125870A (zh) * 2012-02-14 2014-10-29 东曹Smd有限公司 低偏转溅射靶组件及其制造方法
US10124559B2 (en) 2014-12-24 2018-11-13 Medtronic, Inc. Kinetically limited nano-scale diffusion bond structures and methods

Similar Documents

Publication Publication Date Title
JP2018502040A5 (enExample)
JP2017519703A5 (enExample)
MY172346A (en) Adhesive film and method for manufacturing semiconductor device
JP2015533222A5 (enExample)
JP2016514008A5 (enExample)
CL2014000368A1 (es) Metodo de fabricacion de un refuerzo de tela que comprende impregnar un material de tela con un agente de union en un plastisol para formar un material de tela recubierto, aplicar una capa de plastisol entre dos o mas capas de tela, alimentar la carcasa formada a una prensa de doble cinta y calentar entre 182-232°c durante 6 min.
GB201211577D0 (en) Method and apparatus for the manufacturing of sandwich structures with free flowing materials and such structures
JP2016539828A5 (enExample)
MX2015009738A (es) Dispositivo de seguridad y metodos de fabricacion de los mismos.
WO2015075471A3 (en) Ultrasound transducer and method of manufacturing
MY175390A (en) Bonds for solar cell metallization
MX376943B (es) Sonotrodo ultrasonico para transductor transversalmente alineado.
GB2610327B (en) Environmentally-friendly heat sealable aqueous barrier coating for cellulosic substrate and methods of making and using the same
JP2014165267A5 (enExample)
MY180857A (en) Apparatus and methods for creating a thermal interface bond between a semiconductor die and a passive heat exchanger
JP2014509907A5 (enExample)
JP2019054069A5 (enExample)
JP2014103109A5 (enExample)
WO2015013305A3 (en) Methods for improving securement of labels to containers
CN106166883B (zh) 一种隔热膜及制备方法
JP2011135054A5 (ja) Soi基板の作製方法
MX2016017122A (es) Sellado de la cola y sus metodos.
RU2010144108A (ru) Способ изготовления слоистого композиционного материала титановый сплав-алюминид титана
WO2007047790A3 (en) Process and composition for laser welding
JP2012160713A5 (enExample)