JP2018501224A5 - - Google Patents
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- Publication number
- JP2018501224A5 JP2018501224A5 JP2017530658A JP2017530658A JP2018501224A5 JP 2018501224 A5 JP2018501224 A5 JP 2018501224A5 JP 2017530658 A JP2017530658 A JP 2017530658A JP 2017530658 A JP2017530658 A JP 2017530658A JP 2018501224 A5 JP2018501224 A5 JP 2018501224A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- moiety
- holographic medium
- group
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims 15
- 125000004432 carbon atom Chemical group C* 0.000 claims 13
- -1 Acryl Chemical group 0.000 claims 7
- 239000011159 matrix material Substances 0.000 claims 7
- 229920000642 polymer Polymers 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 150000003857 carboxamides Chemical group 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229920006395 saturated elastomer Polymers 0.000 claims 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000004414 alkyl thio group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000001733 carboxylic acid esters Chemical class 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 238000009472 formulation Methods 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000001072 heteroaryl group Chemical group 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 229920000768 polyamine Polymers 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- 229940124530 sulfonamide Drugs 0.000 claims 2
- 150000003456 sulfonamides Chemical class 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims 1
- 150000002170 ethers Chemical class 0.000 claims 1
- VUUAEBBAUMJPRE-UHFFFAOYSA-N ethyl n-fluorocarbamate Chemical compound CCOC(=O)NF VUUAEBBAUMJPRE-UHFFFAOYSA-N 0.000 claims 1
- 229920000570 polyether Polymers 0.000 claims 1
- 229920002635 polyurethane Polymers 0.000 claims 1
- 239000004814 polyurethane Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14197565 | 2014-12-12 | ||
| EP14197565.6 | 2014-12-12 | ||
| EP15173157 | 2015-06-22 | ||
| EP15173157.7 | 2015-06-22 | ||
| PCT/EP2015/079152 WO2016091965A1 (de) | 2014-12-12 | 2015-12-09 | Naphthylacrylate als schreibmonomere für photopolymere |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018501224A JP2018501224A (ja) | 2018-01-18 |
| JP2018501224A5 true JP2018501224A5 (OSRAM) | 2020-01-16 |
| JP6700280B2 JP6700280B2 (ja) | 2020-05-27 |
Family
ID=54843835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017530658A Active JP6700280B2 (ja) | 2014-12-12 | 2015-12-09 | フォトポリマーのための書込モノマーとしてのナフチルアクリレート |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10241402B2 (OSRAM) |
| EP (1) | EP3230261B1 (OSRAM) |
| JP (1) | JP6700280B2 (OSRAM) |
| KR (1) | KR102583200B1 (OSRAM) |
| CN (1) | CN107001246B (OSRAM) |
| TW (1) | TWI679189B (OSRAM) |
| WO (1) | WO2016091965A1 (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10329244B2 (en) * | 2014-12-19 | 2019-06-25 | Covestro Deutschland Ag | Moisture-stable holographic media |
| US11640136B2 (en) | 2017-05-09 | 2023-05-02 | Covestro Deutschland Ag | System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite |
| WO2018206503A1 (de) | 2017-05-09 | 2018-11-15 | Covestro Deutschland Ag | Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| EP3401910A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| TW201906882A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構 |
| EP3401909A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| US10947408B2 (en) | 2018-06-27 | 2021-03-16 | Prc-Desoto International, Inc. | Electrodepositable coating composition |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| US11313048B2 (en) | 2019-06-27 | 2022-04-26 | Prc-Desoto International, Inc. | Addition polymer for electrodepositable coating compositions |
| US11274167B2 (en) * | 2019-06-27 | 2022-03-15 | Prc-Desoto International, Inc. | Carbamate functional monomers and polymers and use thereof |
| US11485874B2 (en) | 2019-06-27 | 2022-11-01 | Prc-Desoto International, Inc. | Addition polymer for electrodepositable coating compositions |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| US20220153693A1 (en) * | 2020-11-13 | 2022-05-19 | Facebook Technologies, Llc | Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings |
| CN115386046A (zh) * | 2021-05-24 | 2022-11-25 | 华为技术有限公司 | 全息记录介质、全息高分子材料及其制备方法、显示设备 |
| JP2025532501A (ja) | 2022-09-07 | 2025-10-01 | コベストロ、ドイチュラント、アクチエンゲゼルシャフト | フォトポリマー組成物のための染料としての特定のベンゾピリリウム塩 |
| CN119874583A (zh) * | 2024-12-25 | 2025-04-25 | 珠海莫界科技有限公司 | （甲基）丙烯酸酯类单体及其制备方法和应用 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4576998A (en) * | 1984-12-07 | 1986-03-18 | The Dow Chemical Company | Vinyl urethane composite polymer containing vinyl terminated urethane oligomers |
| DE3677527D1 (de) | 1985-11-20 | 1991-03-21 | Mead Corp | Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien. |
| US4965152A (en) * | 1988-01-15 | 1990-10-23 | E. I. Du Pont De Nemours And Company | Holographic notch filters |
| US5153237A (en) * | 1991-09-09 | 1992-10-06 | Isp Investments Inc. | Radiation curable propenyl ether resins |
| GB9618604D0 (en) * | 1996-09-06 | 1996-10-16 | Dow Deutschland Inc | Thermoset resins based on epoxy vinyl ester and urethane vinyl ester resins mixtures |
| AU2003232438A1 (en) * | 2002-05-29 | 2003-12-19 | Inphase Technologies, Inc. | Holographic data storage media comprising an aluminum salt compound and an asymetric acrylate compound |
| US7498394B2 (en) * | 2003-02-24 | 2009-03-03 | The Regents Of The University Of Colorado | (Meth)acrylic and (meth)acrylamide monomers, polymerizable compositions, and polymers obtained |
| JP5076414B2 (ja) * | 2005-11-29 | 2012-11-21 | Ｊｎｃ株式会社 | 重合性の光学活性化合物およびその組成物 |
| TW200920785A (en) * | 2007-09-06 | 2009-05-16 | Nippon Paint Co Ltd | Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium |
| US20090174919A1 (en) | 2007-12-28 | 2009-07-09 | Gaylord Moss | Directed illumination diffraction optics auto-stereo display |
| JP2009185192A (ja) * | 2008-02-07 | 2009-08-20 | Dic Corp | 硬化性樹脂組成物、アルカリ現像型感光性樹脂組成物、これらの硬化物、ビニルエステル樹脂、及び酸基含有ビニルエステル樹脂 |
| JP5402266B2 (ja) * | 2008-06-10 | 2014-01-29 | 三菱化学株式会社 | 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体 |
| DE502008002161D1 (de) | 2008-08-08 | 2011-02-10 | Bayer Materialscience Ag | Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex |
| EP2376573B1 (en) * | 2008-10-22 | 2019-12-18 | 3M Innovative Properties Company | Dental composition comprising biphenyl di(meth)acrylate monomer comprising urethane moieties |
| WO2010095475A1 (ja) * | 2009-02-18 | 2010-08-26 | Dic株式会社 | （メタ）アクリレート樹脂、その製造方法、硬化性樹脂組成物、その硬化物、及びプラスチックレンズ |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| CN102666469B (zh) * | 2009-11-03 | 2016-03-02 | 拜尔材料科学股份公司 | 新型非结晶甲基丙烯酸酯、其的制备和应用 |
| WO2011054797A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Photopolymer-formulierung mit verschiedenen schreibcomonomeren |
| TWI488877B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像膜之方法 |
| WO2011091550A1 (en) * | 2010-01-28 | 2011-08-04 | Bayer Materialscience Ag | High speed dvds |
| CN102763037A (zh) * | 2010-02-02 | 2012-10-31 | 拜耳知识产权有限责任公司 | 具有三嗪基书写单体的光聚合物配制品 |
| EP2354845B1 (de) * | 2010-02-02 | 2015-12-23 | Covestro Deutschland AG | Photopolymer-Formulierung zur Herstellung holographischer Medien |
| WO2012020061A1 (de) * | 2010-08-11 | 2012-02-16 | Bayer Materialscience Ag | Difunktionelle (meth)-acrylat-schreibmonomere |
| EP2431786A1 (de) | 2010-09-17 | 2012-03-21 | Bayer MaterialScience AG | Autostereoskopisches 3D-Display |
| EP2450893A1 (de) | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| JP2013014533A (ja) * | 2011-07-02 | 2013-01-24 | Kawasaki Kasei Chem Ltd | 縮合多環芳香族骨格を有するウレタン（メタ）アクリレート化合物及び連鎖移動剤並びにこれを用いたポリマー |
| TWI664447B (zh) | 2014-02-18 | 2019-07-01 | 德商拜耳材料科學股份有限公司 | 使用全像光學元件之裸視３ｄ顯示裝置 |
| US9921473B2 (en) * | 2014-04-25 | 2018-03-20 | Covestro Deutschland Ag | Aromatic glycol ethers as writing monomers in holographic photopolymer formulations |
| US10329244B2 (en) * | 2014-12-19 | 2019-06-25 | Covestro Deutschland Ag | Moisture-stable holographic media |
-
2015
- 2015-12-09 WO PCT/EP2015/079152 patent/WO2016091965A1/de not_active Ceased
- 2015-12-09 US US15/535,086 patent/US10241402B2/en active Active
- 2015-12-09 KR KR1020177015767A patent/KR102583200B1/ko active Active
- 2015-12-09 EP EP15807900.4A patent/EP3230261B1/de active Active
- 2015-12-09 CN CN201580067579.6A patent/CN107001246B/zh active Active
- 2015-12-09 JP JP2017530658A patent/JP6700280B2/ja active Active
- 2015-12-10 TW TW104141447A patent/TWI679189B/zh active
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