JP2018201014A - 液体フィルタを湿潤させるための方法 - Google Patents
液体フィルタを湿潤させるための方法 Download PDFInfo
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- 239000007788 liquid Substances 0.000 title claims abstract description 89
- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000009736 wetting Methods 0.000 title claims abstract description 27
- 239000002904 solvent Substances 0.000 claims abstract description 101
- 238000010926 purge Methods 0.000 claims abstract description 97
- 238000004519 manufacturing process Methods 0.000 claims abstract description 30
- 239000004065 semiconductor Substances 0.000 claims abstract description 21
- 229920002120 photoresistant polymer Polymers 0.000 claims description 53
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 12
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 239000001273 butane Substances 0.000 claims description 6
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 6
- -1 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000001294 propane Substances 0.000 claims description 6
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 5
- 239000004677 Nylon Substances 0.000 claims description 5
- 229920001778 nylon Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 5
- 239000011800 void material Substances 0.000 claims description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 4
- 239000001569 carbon dioxide Substances 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 claims description 2
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 claims description 2
- 239000003125 aqueous solvent Substances 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 238000012545 processing Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 126
- 239000002245 particle Substances 0.000 description 19
- 238000011010 flushing procedure Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000000356 contaminant Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 229940052308 general anesthetics halogenated hydrocarbons Drugs 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- 239000012633 leachable Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 238000012993 chemical processing Methods 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 210000000416 exudates and transudate Anatomy 0.000 description 1
- YUCFVHQCAFKDQG-UHFFFAOYSA-N fluoromethane Chemical compound F[CH] YUCFVHQCAFKDQG-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003317 industrial substance Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011016 integrity testing Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 235000013847 iso-butane Nutrition 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- PQIOSYKVBBWRRI-UHFFFAOYSA-N methylphosphonyl difluoride Chemical group CP(F)(F)=O PQIOSYKVBBWRRI-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/06—Tubular membrane modules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/01—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with flat filtering elements
- B01D29/012—Making filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
- B01D29/111—Making filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
- B01D46/0035—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions by wetting, e.g. using surfaces covered with oil
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/10—Spiral-wound membrane modules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/14—Pleat-type membrane modules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/30—Polyalkenyl halides
- B01D71/32—Polyalkenyl halides containing fluorine atoms
- B01D71/36—Polytetrafluoroethene
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/10—Filtering material manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/16—Use of chemical agents
- B01D2321/168—Use of other chemical agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/18—Use of gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Filtering Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
【解決手段】方法において、フィルタカートリッジを作製するために使用される製造プロセスに由来する残留ガスを含む空隙を有するフィルタカートリッジをパージガス源に接続する。パージガスをフィルタカートリッジに流し、フィルタカートリッジを作製するために使用される製造プロセスに由来する残留ガスの少なくとも一部を少なくとも部分的に排気する。次に、液体溶媒をフィルタカートリッジにポンピングし、それによってパージガスを液体溶媒に溶解させ、少なくとも部分的に空隙を満たすことにより、フィルタカートリッジを液体溶媒で少なくとも部分的に湿潤させる。
【選択図】図3
Description
Claims (20)
- 半導体製造において使用される液体溶媒を処理するために使用されるフィルタカートリッジを湿潤させるための方法において、
前記フィルタカートリッジを作製するために使用される製造プロセスに由来する残留ガスを含む空隙を有するフィルタカートリッジを準備するステップと、
パージガスを前記フィルタカートリッジに流し、該フィルタカートリッジを作製するために使用される前記製造プロセスに由来する前記残留ガスの少なくとも一部を少なくとも部分的に排気するステップと、
前記液体溶媒を前記フィルタカートリッジにポンピングし、それによって前記パージガスを前記液体溶媒に溶解させ、少なくとも部分的に前記空隙を満たすステップと、
を有することを特徴とする、方法。 - 前記パージガスは1つ又は複数の炭素原子を有する有機非極性ガスである、請求項1記載の方法。
- 前記残留ガスの少なくとも50%が排気されるまで、前記パージガスを前記フィルタカートリッジに流す、請求項1記載の方法。
- 前記液体溶媒を0.1〜12L/分の割合で前記フィルタカートリッジに流す、請求項1記載の方法。
- 前記ガスを10〜50℃の温度で前記フィルタカートリッジに流す、請求項1記載の方法。
- 前記フィルタカートリッジにおけるフィルタはナイロン又はポリテトラフルオロエチレンから成る、請求項1記載の方法。
- 前記方法は、前記フィルタカートリッジに前記パージガスを先行して流すことなく前記フィルタカートリッジに液体溶媒がポンピングされる方法に比べて、前記液体溶媒でもって前記フィルタカートリッジを完全に湿潤させるための時間を短縮する、請求項1記載の方法。
- 前記液体溶媒はフォトレジスト液であり、該フォトレジスト液を、前記フィルタカートリッジから気泡が出なくなるまで、前記フィルタカートリッジに流す、請求項1記載の方法。
- 液体溶媒は水性の溶媒又はアルコールである、請求項1記載の方法。
- 前記パージガスは非極性有機ガスである、請求項1記載の方法。
- 前記パージガスは二酸化炭素、アンモニア、又は揮発性アミンである、請求項1記載の方法。
- 前記パージガスはメタン、エタン、プロパン、ブタン、又はフッ素化エチレンである、請求項1記載の方法。
- 前記液体溶媒はフォトレジスト液である、請求項1記載の方法。
- 前記フィルタカートリッジから気泡が出なくなるまで、前記液体溶媒を前記フィルタカートリッジに流す、請求項1記載の方法。
- 前記パージガスは少なくとも99%の純度を有する、請求項1記載の方法。
- 液体溶媒が前記フィルタカートリッジを湿潤させた後に、前記フィルタカートリッジが液体溶媒源から分離される、請求項1記載の方法。
- 前記パージガスはエタン、プロパン、ブタン、又はそれらの組み合わせである、請求項1記載の方法。
- 前記パージガスはテトラフルオロエタン、テトラフルオロメタン、ジフルオロエタン、又はそれらの組み合わせである、請求項1記載の方法。
- 前記ガスを前記フィルタカートリッジに流す前に、前記フィルタカートリッジをパージガス源に接続する、請求項1記載の方法。
- 前記液体溶媒を前記フィルタカートリッジにポンピングする前に、前記フィルタカートリッジを液体溶媒源に接続する、請求項1記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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US201762506918P | 2017-05-16 | 2017-05-16 | |
US62/506,918 | 2017-05-16 | ||
US15/661,551 US10525416B2 (en) | 2017-05-16 | 2017-07-27 | Method of liquid filter wetting |
US15/661,551 | 2017-07-27 |
Publications (2)
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JP2018201014A true JP2018201014A (ja) | 2018-12-20 |
JP7139145B2 JP7139145B2 (ja) | 2022-09-20 |
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US (1) | US10525416B2 (ja) |
JP (1) | JP7139145B2 (ja) |
KR (1) | KR102636386B1 (ja) |
CN (1) | CN108854556B (ja) |
TW (1) | TWI766995B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2020136509A (ja) * | 2019-02-20 | 2020-08-31 | 東京エレクトロン株式会社 | フィルタウェッティング方法及び処理液供給装置 |
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TW438617B (en) * | 1999-01-08 | 2001-06-07 | Vanguard Int Semiconduct Corp | Filter pre-wet system |
TWI235284B (en) * | 1999-03-17 | 2005-07-01 | Winbond Electronics Corp | Photoresist supply device |
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CN1199706C (zh) * | 2001-04-18 | 2005-05-04 | 华邦电子股份有限公司 | 过滤器的预湿装置及方法 |
CA2472478A1 (en) * | 2002-01-07 | 2003-07-17 | John Frederic Billingham | Method for cleaning an article |
KR20050032182A (ko) * | 2003-10-01 | 2005-04-07 | 동부아남반도체 주식회사 | 반도체 케미컬 필터의 웨팅 방법 및 장치 |
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JP2020136509A (ja) * | 2019-02-20 | 2020-08-31 | 東京エレクトロン株式会社 | フィルタウェッティング方法及び処理液供給装置 |
JP7161955B2 (ja) | 2019-02-20 | 2022-10-27 | 東京エレクトロン株式会社 | フィルタウェッティング方法及び処理液供給装置 |
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US10525416B2 (en) | 2020-01-07 |
JP7139145B2 (ja) | 2022-09-20 |
KR102636386B1 (ko) | 2024-02-13 |
KR20180125909A (ko) | 2018-11-26 |
TWI766995B (zh) | 2022-06-11 |
CN108854556A (zh) | 2018-11-23 |
CN108854556B (zh) | 2022-07-08 |
US20180333680A1 (en) | 2018-11-22 |
TW201906660A (zh) | 2019-02-16 |
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