JP2018166204A5 - - Google Patents

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Publication number
JP2018166204A5
JP2018166204A5 JP2018005160A JP2018005160A JP2018166204A5 JP 2018166204 A5 JP2018166204 A5 JP 2018166204A5 JP 2018005160 A JP2018005160 A JP 2018005160A JP 2018005160 A JP2018005160 A JP 2018005160A JP 2018166204 A5 JP2018166204 A5 JP 2018166204A5
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Japan
Prior art keywords
substrate
temperature
film forming
reflected light
light intensity
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JP2018005160A
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English (en)
Japanese (ja)
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JP2018166204A (ja
JP7037372B2 (ja
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Priority to TW107107295A priority Critical patent/TWI729274B/zh
Priority to US15/937,275 priority patent/US20180286719A1/en
Publication of JP2018166204A publication Critical patent/JP2018166204A/ja
Publication of JP2018166204A5 publication Critical patent/JP2018166204A5/ja
Application granted granted Critical
Publication of JP7037372B2 publication Critical patent/JP7037372B2/ja
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JP2018005160A 2017-03-28 2018-01-16 成膜装置および成膜方法 Active JP7037372B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW107107295A TWI729274B (zh) 2017-03-28 2018-03-05 成膜裝置與成膜方法
US15/937,275 US20180286719A1 (en) 2017-03-28 2018-03-27 Film forming apparatus and film forming method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017063076 2017-03-28
JP2017063076 2017-03-28

Publications (3)

Publication Number Publication Date
JP2018166204A JP2018166204A (ja) 2018-10-25
JP2018166204A5 true JP2018166204A5 (enExample) 2021-01-14
JP7037372B2 JP7037372B2 (ja) 2022-03-16

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ID=63922981

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JP2018005160A Active JP7037372B2 (ja) 2017-03-28 2018-01-16 成膜装置および成膜方法

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JP (1) JP7037372B2 (enExample)
TW (1) TWI729274B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102737498B1 (ko) 2019-12-13 2024-12-04 삼성전자주식회사 비-접촉식 온도 센서를 가진 공정 설비
DE102020126597A1 (de) * 2020-10-09 2022-04-14 Aixtron Se Verfahren zur emissivitätskorrigierten Pyrometrie

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003106902A (ja) 2001-09-27 2003-04-09 Toshiba Corp 非接触温度測定方法及びその装置
JP6279396B2 (ja) * 2014-05-12 2018-02-14 株式会社ニューフレアテクノロジー 気相成長方法及び気相成長装置
JP6479525B2 (ja) 2015-03-27 2019-03-06 株式会社ニューフレアテクノロジー 成膜装置及び温度測定方法
JP6430337B2 (ja) * 2015-07-06 2018-11-28 株式会社ニューフレアテクノロジー 気相成長方法および気相成長装置

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