JP2018157194A - エンドエフェクタ用吸引器具、サブストレート保持用エンドエフェクタ、およびエンドエフェクタ製造方法 - Google Patents
エンドエフェクタ用吸引器具、サブストレート保持用エンドエフェクタ、およびエンドエフェクタ製造方法 Download PDFInfo
- Publication number
- JP2018157194A JP2018157194A JP2018011618A JP2018011618A JP2018157194A JP 2018157194 A JP2018157194 A JP 2018157194A JP 2018011618 A JP2018011618 A JP 2018011618A JP 2018011618 A JP2018011618 A JP 2018011618A JP 2018157194 A JP2018157194 A JP 2018157194A
- Authority
- JP
- Japan
- Prior art keywords
- end effector
- suction device
- contact surface
- channel
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
- B25J15/0683—Details of suction cup structure, e.g. grooves or ridges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J19/00—Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
- B25J19/007—Means or methods for designing or fabricating manipulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S901/00—Robots
- Y10S901/30—End effector
- Y10S901/40—Vacuum or mangetic
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2018243A NL2018243B1 (en) | 2017-01-27 | 2017-01-27 | Suction apparatus for an end effector, end effector for holding substrates and method of producing an end effector |
| NL2018243 | 2017-01-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018157194A true JP2018157194A (ja) | 2018-10-04 |
| JP2018157194A5 JP2018157194A5 (enExample) | 2020-03-19 |
Family
ID=62843388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018011618A Pending JP2018157194A (ja) | 2017-01-27 | 2018-01-26 | エンドエフェクタ用吸引器具、サブストレート保持用エンドエフェクタ、およびエンドエフェクタ製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10259124B2 (enExample) |
| JP (1) | JP2018157194A (enExample) |
| KR (1) | KR102344555B1 (enExample) |
| CN (1) | CN108364903A (enExample) |
| AT (1) | AT519587B1 (enExample) |
| DE (1) | DE102018100856A1 (enExample) |
| NL (1) | NL2018243B1 (enExample) |
| SG (1) | SG10201800716YA (enExample) |
| TW (1) | TWI710438B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3657537A1 (en) * | 2018-11-23 | 2020-05-27 | ATOTECH Deutschland GmbH | End effector for slab formed substrates |
| US11276593B2 (en) | 2019-07-22 | 2022-03-15 | Rorze Automation, Inc. | Systems and methods for horizontal wafer packaging |
| EP3772089B1 (en) | 2019-07-30 | 2021-05-26 | Semsysco GmbH | Substrate handling device for a wafer |
| US20230321758A1 (en) | 2022-03-25 | 2023-10-12 | Ii-Vi Delaware, Inc. | Laser-roughened reaction-bonded silicon carbide for wafer contact surface |
| EP4273911A1 (de) * | 2022-05-03 | 2023-11-08 | Werner Lieb GmbH | Haltevorrichtung und verfahren zum halten und/oder transportieren von werkstücken und/oder bauteilen, optional mit werkzeugfrei auswechselbaren saugerelementen |
| US12348002B2 (en) | 2022-05-31 | 2025-07-01 | Ii-Vi Delaware, Inc. | Current load-controlled laser driver |
| US12337467B2 (en) * | 2022-12-09 | 2025-06-24 | Formfactor, Inc. | Wafer-handling end effectors configured to selectively lift a wafer from an upper surface of the wafer, probe systems that include the wafer-handling end effectors, and methods of utilizing the wafer-handling end effectors |
| US20250073924A1 (en) * | 2023-03-13 | 2025-03-06 | Shanghai Flexiv Robotics Technology Co., Ltd. | Adhesion device and robot |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05267433A (ja) * | 1992-03-19 | 1993-10-15 | Nec Kyushu Ltd | 吸着パッド |
| JPH0653309A (ja) * | 1992-06-10 | 1994-02-25 | Internatl Business Mach Corp <Ibm> | 基板用保持固定具 |
| JPH07273499A (ja) * | 1994-03-30 | 1995-10-20 | Matsushita Electric Ind Co Ltd | パネル保持装置 |
| JPH0817896A (ja) * | 1994-06-29 | 1996-01-19 | Canon Inc | 基板搬送装置 |
| JP2012199282A (ja) * | 2011-03-18 | 2012-10-18 | Tokyo Electron Ltd | 基板保持装置 |
| JP2016538711A (ja) * | 2014-03-06 | 2016-12-08 | カスケード マイクロテック インコーポレイテッドCascade Microtech,Incorporated | ウェーハ‐ハンドリング・エンドエフェクタ |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4131267A (en) * | 1978-06-02 | 1978-12-26 | Disco Kabushiki Kaisha | Apparatus for holding workpiece by suction |
| JP2002184835A (ja) | 2000-12-13 | 2002-06-28 | Ando Electric Co Ltd | 吸着パッド |
| US6942265B1 (en) * | 2002-10-23 | 2005-09-13 | Kla-Tencor Technologies Corporation | Apparatus comprising a flexible vacuum seal pad structure capable of retaining non-planar substrates thereto |
| US20050110292A1 (en) * | 2002-11-26 | 2005-05-26 | Axcelis Technologies, Inc. | Ceramic end effector for micro circuit manufacturing |
| US7641247B2 (en) * | 2002-12-17 | 2010-01-05 | Applied Materials, Inc. | End effector assembly for supporting a substrate |
| ATE454960T1 (de) | 2003-01-29 | 2010-01-15 | Mitsuboshi Diamond Ind Co Ltd | Vakuum saugkopf |
| US7055875B2 (en) * | 2003-07-11 | 2006-06-06 | Asyst Technologies, Inc. | Ultra low contact area end effector |
| MY157019A (en) * | 2009-03-31 | 2016-04-15 | Automation Tooling Syst | Vacuum gripper assembly |
| US8801069B2 (en) * | 2010-02-26 | 2014-08-12 | Brooks Automation, Inc. | Robot edge contact gripper |
| JP2014176914A (ja) | 2013-03-14 | 2014-09-25 | Nippon Electric Glass Co Ltd | 吸着パッド及び吸着装置 |
| JP5861677B2 (ja) * | 2013-07-08 | 2016-02-16 | 株式会社安川電機 | 吸着構造、ロボットハンドおよびロボット |
| NL2014625B1 (en) * | 2015-04-13 | 2017-01-06 | Suss Microtec Lithography Gmbh | Wafer treating device and sealing ring for a wafer treating device. |
-
2017
- 2017-01-27 NL NL2018243A patent/NL2018243B1/en active
-
2018
- 2018-01-16 DE DE102018100856.2A patent/DE102018100856A1/de active Pending
- 2018-01-19 US US15/875,713 patent/US10259124B2/en active Active
- 2018-01-22 TW TW107102181A patent/TWI710438B/zh active
- 2018-01-24 AT ATA50059/2018A patent/AT519587B1/de active
- 2018-01-26 SG SG10201800716YA patent/SG10201800716YA/en unknown
- 2018-01-26 JP JP2018011618A patent/JP2018157194A/ja active Pending
- 2018-01-26 KR KR1020180009854A patent/KR102344555B1/ko active Active
- 2018-01-29 CN CN201810084258.2A patent/CN108364903A/zh active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05267433A (ja) * | 1992-03-19 | 1993-10-15 | Nec Kyushu Ltd | 吸着パッド |
| JPH0653309A (ja) * | 1992-06-10 | 1994-02-25 | Internatl Business Mach Corp <Ibm> | 基板用保持固定具 |
| JPH07273499A (ja) * | 1994-03-30 | 1995-10-20 | Matsushita Electric Ind Co Ltd | パネル保持装置 |
| JPH0817896A (ja) * | 1994-06-29 | 1996-01-19 | Canon Inc | 基板搬送装置 |
| JP2012199282A (ja) * | 2011-03-18 | 2012-10-18 | Tokyo Electron Ltd | 基板保持装置 |
| JP2016538711A (ja) * | 2014-03-06 | 2016-12-08 | カスケード マイクロテック インコーポレイテッドCascade Microtech,Incorporated | ウェーハ‐ハンドリング・エンドエフェクタ |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102344555B1 (ko) | 2021-12-28 |
| AT519587B1 (de) | 2021-10-15 |
| AT519587A2 (de) | 2018-08-15 |
| TWI710438B (zh) | 2020-11-21 |
| US20180215049A1 (en) | 2018-08-02 |
| TW201831290A (zh) | 2018-09-01 |
| KR20180088598A (ko) | 2018-08-06 |
| CN108364903A (zh) | 2018-08-03 |
| US10259124B2 (en) | 2019-04-16 |
| DE102018100856A1 (de) | 2018-08-02 |
| SG10201800716YA (en) | 2018-08-30 |
| AT519587A3 (de) | 2020-02-15 |
| NL2018243B1 (en) | 2018-08-07 |
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