JP2018157036A5 - - Google Patents

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JP2018157036A5
JP2018157036A5 JP2017051706A JP2017051706A JP2018157036A5 JP 2018157036 A5 JP2018157036 A5 JP 2018157036A5 JP 2017051706 A JP2017051706 A JP 2017051706A JP 2017051706 A JP2017051706 A JP 2017051706A JP 2018157036 A5 JP2018157036 A5 JP 2018157036A5
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Japan
Prior art keywords
cured product
pattern
mold
imprint material
workpiece
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JP2017051706A
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English (en)
Japanese (ja)
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JP6882027B2 (ja
JP2018157036A (ja
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Publication of JP2018157036A5 publication Critical patent/JP2018157036A5/ja
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JP2017051706A 2017-03-16 2017-03-16 インプリント装置、および物品製造方法 Active JP6882027B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2017051706A JP6882027B2 (ja) 2017-03-16 2017-03-16 インプリント装置、および物品製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017051706A JP6882027B2 (ja) 2017-03-16 2017-03-16 インプリント装置、および物品製造方法

Publications (3)

Publication Number Publication Date
JP2018157036A JP2018157036A (ja) 2018-10-04
JP2018157036A5 true JP2018157036A5 (enExample) 2020-03-26
JP6882027B2 JP6882027B2 (ja) 2021-06-02

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ID=63718361

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JP2017051706A Active JP6882027B2 (ja) 2017-03-16 2017-03-16 インプリント装置、および物品製造方法

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JP (1) JP6882027B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024171142A (ja) * 2023-05-29 2024-12-11 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法。

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP6304934B2 (ja) * 2012-05-08 2018-04-04 キヤノン株式会社 インプリント装置および物品の製造方法
JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
JP6497839B2 (ja) * 2013-11-07 2019-04-10 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2017005035A (ja) * 2015-06-05 2017-01-05 キヤノン株式会社 インプリント装置および物品の製造方法

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